FR3007569B1 - Reactif de decontamination oxydative pour l'elimination de la couche d'oxyde radioactif dense sur une surface metallique et procede de decontamination oxydative l'utilisant - Google Patents

Reactif de decontamination oxydative pour l'elimination de la couche d'oxyde radioactif dense sur une surface metallique et procede de decontamination oxydative l'utilisant Download PDF

Info

Publication number
FR3007569B1
FR3007569B1 FR1455587A FR1455587A FR3007569B1 FR 3007569 B1 FR3007569 B1 FR 3007569B1 FR 1455587 A FR1455587 A FR 1455587A FR 1455587 A FR1455587 A FR 1455587A FR 3007569 B1 FR3007569 B1 FR 3007569B1
Authority
FR
France
Prior art keywords
oxidative decontamination
reagent
oxide layer
metal
oxidative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1455587A
Other languages
English (en)
Other versions
FR3007569A1 (fr
Inventor
Sang Yoon Park
Hui-Jun Won
Wangkyu Choi
Jeikwon Moon
Chong-Hun Jung
In-ho Yoon
Jun-Young Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Atomic Energy Research Institute KAERI
Original Assignee
Korea Atomic Energy Research Institute KAERI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Atomic Energy Research Institute KAERI filed Critical Korea Atomic Energy Research Institute KAERI
Publication of FR3007569A1 publication Critical patent/FR3007569A1/fr
Application granted granted Critical
Publication of FR3007569B1 publication Critical patent/FR3007569B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/002Decontamination of the surface of objects with chemical or electrochemical processes
    • G21F9/004Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/04Treating liquids
    • G21F9/06Processing
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F15/00Other methods of preventing corrosion or incrustation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/08Iron or steel
    • C23G1/085Iron or steel solutions containing HNO3
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/10Other heavy metals
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/28Treating solids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Food Science & Technology (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Detergent Compositions (AREA)

Abstract

La présente invention concerne un réactif de décontamination oxydative pour l'élimination de la couche d'oxyde radioactif dense sur la surface métallique, le réactif comprenant un agent d'oxydation, un ion métallique, et un acide inorganique. Le réactif de décontamination oxydative de la présente invention est caractéristiquement préparé par ajout d'un ion métallique au réactif de décontamination oxydative classique contenant un agent d'oxydation et un acide inorganique. Lorsque le réactif de décontamination oxydative de la présente invention est utilisé, le potentiel électrique des parties métalliques du système primaire de la centrale nucléaire peut être régulé comme un potentiel passif en raison de l'ion métallique ajouté pendant la décontamination oxydative de la partie métallique primaire de la centrale nucléaire. Il est par conséquent possible d'inhiber la corrosion locale tout en réduisant significativement les déchets secondaires par le maintien du potentiel électrique de la partie métallique à un potentiel passif.
FR1455587A 2013-06-19 2014-06-18 Reactif de decontamination oxydative pour l'elimination de la couche d'oxyde radioactif dense sur une surface metallique et procede de decontamination oxydative l'utilisant Active FR3007569B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020130070500A KR101523763B1 (ko) 2013-06-19 2013-06-19 금속 표면 고착성 방사능 오염 산화막 제거를 위한 산화 제염제 및 이를 이용한 산화 제염방법
KR1020130070500 2013-06-19

Publications (2)

Publication Number Publication Date
FR3007569A1 FR3007569A1 (fr) 2014-12-26
FR3007569B1 true FR3007569B1 (fr) 2020-06-12

Family

ID=52016925

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1455587A Active FR3007569B1 (fr) 2013-06-19 2014-06-18 Reactif de decontamination oxydative pour l'elimination de la couche d'oxyde radioactif dense sur une surface metallique et procede de decontamination oxydative l'utilisant

Country Status (4)

Country Link
US (1) US9390822B2 (fr)
JP (1) JP6006261B2 (fr)
KR (1) KR101523763B1 (fr)
FR (1) FR3007569B1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10340050B2 (en) 2015-02-05 2019-07-02 Framatome Gmbh Method of decontaminating metal surfaces in a cooling system of a nuclear reactor
CA2996975C (fr) * 2015-08-28 2022-02-15 Serpin Pharma, Llc Methodes de traitement de maladies
KR101883895B1 (ko) 2016-10-12 2018-08-02 한국원자력연구원 방사성 폐기물을 혁신적으로 줄일 수 있는 제염방법 및 이를 위한 키트
DE102017107584A1 (de) 2017-04-07 2018-10-11 Rwe Power Aktiengesellschaft Zinkdosierung zur Dekontamination von Leichtwasserreaktoren
KR102278944B1 (ko) * 2019-08-19 2021-07-21 한국원자력연구원 금속 제염용 식각 조성물 및 이를 이용한 금속 제염방법
CN113105955A (zh) * 2021-03-31 2021-07-13 山东核电有限公司 一种用于ap1000反应堆一回路部件放射性污染沉积氧化物的去污配方和去污方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5224137A (en) 1975-08-20 1977-02-23 Babcock Hitachi Kk Anticorrosion method for structural steel
US4226640A (en) * 1978-10-26 1980-10-07 Kraftwerk Union Aktiengesellschaft Method for the chemical decontamination of nuclear reactor components
DE3270078D1 (en) 1981-06-17 1986-04-30 Central Electr Generat Board Process for the chemical dissolution of oxide deposits
JPS63188799A (ja) * 1987-01-30 1988-08-04 日立プラント建設株式会社 放射性金属廃棄物の除染方法
JPH03219092A (ja) 1990-01-24 1991-09-26 Sumitomo Chem Co Ltd 装置の防蝕法
JP3874830B2 (ja) * 1996-01-29 2007-01-31 株式会社東芝 除染方法とその除染システム
JP2000346988A (ja) * 1999-06-07 2000-12-15 Toshiba Corp 再処理関連施設の金属構造材の化学除染方法
AU6337700A (en) * 1999-06-24 2001-01-09 University Of Chicago, The Method for the decontamination of metallic surfaces
JP2003511709A (ja) 1999-10-12 2003-03-25 ゼネラル・エレクトリック・カンパニイ 原子力発電プラントの除染方法
JP3849925B2 (ja) * 2000-12-21 2006-11-22 株式会社東芝 化学除染方法
KR100505470B1 (ko) * 2002-08-08 2005-08-03 한전기공주식회사 방사성 물질에 오염된 스테인레스스틸304계열 재질의기기에 대한 농축식 화학 제염 방법 및 희석식 화학 제염방법
JP4083607B2 (ja) 2003-03-19 2008-04-30 株式会社東芝 放射能の化学除染方法および装置
WO2007091559A1 (fr) * 2006-02-09 2007-08-16 Kabushiki Kaisha Toshiba Appareil de decontamination chimique et procede de decontamination dans celui-ci
KR100856944B1 (ko) 2006-12-19 2008-09-04 한전케이피에스 주식회사 방사성 물질에 오염된 원자로냉각재펌프 내장품 희석식 화학제염 방법
JP5415857B2 (ja) 2009-07-22 2014-02-12 Dowaメタルテック株式会社 ステンレス部材の腐食抑制方法
DE102009047524A1 (de) * 2009-12-04 2011-06-09 Areva Np Gmbh Verfahren zur Oberflächen-Dekontamination
DE102010028457A1 (de) * 2010-04-30 2011-11-03 Areva Np Gmbh Verfahren zur Oberflächen-Dekontamination

Also Published As

Publication number Publication date
JP2015004675A (ja) 2015-01-08
US20140378733A1 (en) 2014-12-25
KR101523763B1 (ko) 2015-06-01
KR20140147382A (ko) 2014-12-30
FR3007569A1 (fr) 2014-12-26
US9390822B2 (en) 2016-07-12
JP6006261B2 (ja) 2016-10-12

Similar Documents

Publication Publication Date Title
FR3007569B1 (fr) Reactif de decontamination oxydative pour l'elimination de la couche d'oxyde radioactif dense sur une surface metallique et procede de decontamination oxydative l'utilisant
TW200620446A (en) Removing liquid and removing method of copper deteriorated layer containing copper oxide
TW200729233A (en) A procedure for removing the oxide layer on the system surface or device surface of the nuclear equipment
Wang et al. Effect of connection methods on lead release from galvanic corrosion
CN104562019A (zh) 一种环保型酸性化学抛光液及化学抛光方法
KR20140095266A (ko) 금속 표면 고착성 방사능 오염 산화막 제거를 위한 무착화성 화학 제염제 및 이를 이용한 화학 제염방법
DE60129819D1 (de) Verfahren zur reinigung einer metalloberfläche
JP2008207071A (ja) 汚染水中のヒ素除去法およびそれに用いる処理剤
JP6125824B2 (ja) 重金属類汚染土壌用洗浄液組成物及び重金属類汚染土壌の洗浄方法
CN103864239A (zh) 循环净化水
JP2014134404A (ja) セシウム汚染物の除染方法
CL2012000646A1 (es) Metodo para oxidar iones fe (ii) en solucion acida que contiene iones yoduro e iones fe (ii), que comprende la etapa (a) en que los iones fe(ii) en lasolucion acida que contiene iones yoduro e iones fe(ii) son oxidados por microbios inmovilizados en un vehiculo, la etapa (b) comprende la sedimentacion de la solucion que contiene iones yoduro, iones ferricos y vehiculo inmovilizador con microbios adheridos y la etapa (c) de reintroducir en el reactor en la etapa (a).
JP6216240B2 (ja) 汚水の処理方法
AR072698A1 (es) Procedimiento para acondicionar sustancias organicas y metales que se presentan en forma ionica en la solucion de desecho que se obtiene en la limpieza por via quimica humeda de instalaciones de tecnica convencional o de tecnica nuclear
CN204655579U (zh) 一种水质自动监测站除臭装置
Lositska Innovative technologies: Essence and importance of galvanic production development
KR20150048681A (ko) 금속 표면 고착성 방사능 오염 산화막 제거를 위한 무착화성 화학 제염제 및 이를 이용한 화학 제염방법
JP2008194590A (ja) フェントン反応を利用した汚染地盤又は汚染地下水の原位置浄化方法
TW200624386A (en) Method of water treatment
CN106430880B (zh) 一种含油污泥处理剂的制备方法和使用方法
JPS5337578A (en) Collecting method for heavy metals
JP3776901B2 (ja) 有機ハロゲン化合物と重金属による複合汚染土壌の処理方法
JP2016042059A (ja) 放射性廃棄物処理方法
Ng et al. Investigation of Lead Levels in Potable Water from Faucets, Water Fountains and Water Dispensers Using Various Sampling Protocols in Schools
CN204644074U (zh) 一种新型磷化废水处理装置

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLSC Publication of the preliminary search report

Effective date: 20180504

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6

PLFP Fee payment

Year of fee payment: 7

PLFP Fee payment

Year of fee payment: 8

PLFP Fee payment

Year of fee payment: 9

PLFP Fee payment

Year of fee payment: 10

PLFP Fee payment

Year of fee payment: 11