JP6006261B2 - 金属表面の高放射性酸化物層を除去するための酸化除染剤およびその製造方法、当該酸化除染剤を用いた酸化除染方法 - Google Patents
金属表面の高放射性酸化物層を除去するための酸化除染剤およびその製造方法、当該酸化除染剤を用いた酸化除染方法 Download PDFInfo
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- 238000005202 decontamination Methods 0.000 title claims description 197
- 230000003588 decontaminative effect Effects 0.000 title claims description 176
- 230000001590 oxidative effect Effects 0.000 title claims description 165
- 230000002285 radioactive effect Effects 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 229910052751 metal Inorganic materials 0.000 title description 68
- 239000002184 metal Substances 0.000 title description 68
- 239000003795 chemical substances by application Substances 0.000 claims description 63
- 239000003153 chemical reaction reagent Substances 0.000 claims description 46
- 229910021645 metal ion Inorganic materials 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 23
- 239000007800 oxidant agent Substances 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 7
- 239000012153 distilled water Substances 0.000 claims description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims description 7
- 229910001026 inconel Inorganic materials 0.000 claims description 6
- 229910000831 Steel Inorganic materials 0.000 claims 5
- 239000010959 steel Substances 0.000 claims 5
- 238000005260 corrosion Methods 0.000 description 43
- 230000007797 corrosion Effects 0.000 description 43
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 30
- 150000007522 mineralic acids Chemical class 0.000 description 22
- 239000000956 alloy Substances 0.000 description 17
- 229910045601 alloy Inorganic materials 0.000 description 15
- 229910052759 nickel Inorganic materials 0.000 description 14
- 239000002699 waste material Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 239000010949 copper Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000012857 radioactive material Substances 0.000 description 9
- 239000010935 stainless steel Substances 0.000 description 9
- 229910001220 stainless steel Inorganic materials 0.000 description 9
- 230000002829 reductive effect Effects 0.000 description 8
- 239000011701 zinc Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009390 chemical decontamination Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 230000004580 weight loss Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- -1 organic acid anions Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910000851 Alloy steel Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 229910001055 inconels 600 Inorganic materials 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- 239000012286 potassium permanganate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical class Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 229910000604 Ferrochrome Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
- G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
- G21F9/004—Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/04—Treating liquids
- G21F9/06—Processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F15/00—Other methods of preventing corrosion or incrustation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/085—Iron or steel solutions containing HNO3
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/28—Treating solids
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Electrochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Food Science & Technology (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Detergent Compositions (AREA)
Description
本願は、韓国特許庁に2013年6月13日に提出した韓国特許出願第10-2013-0070500号に基づく優先権の利益を主張し、その内容は、その全体が参照として本明細書に組み込まれる。
本発明はまた、次のステップ:
蒸留水に酸化剤を溶解し、溶液を調製すること(ステップ1)、
ステップ1で調製した溶液に無機酸を加えること(ステップ2)、および、
ステップ2で調製した無機酸含有溶液に金属イオンを加えること(ステップ3)
を含む、酸化除染剤の製造方法を提供する。
放射性酸化物層が付着した金属部分を酸化除染剤を含む溶液に浸けること(ステップ1)、
ステップ1の金属部分を浸けた溶液に還元剤を加えること(ステップ2)、および、
ステップ2で還元し、除染した金属部分を排除した後に溶液を精製すること(ステップ3)
を含む、主要なシステム部分のためのマルチステップ除染方法を提供する。
蒸留水に酸化剤を溶解し、溶液を調製すること(ステップ1)、
ステップ1で調製した溶液に無機酸を加えること(ステップ2)、および、
ステップ2で調製した無機酸含有溶液に金属イオンを加えること(ステップ3)
を含む、酸化除染剤の製造方法を提供する。
放射性酸化物層が付着した金属部分を酸化除染剤を含む溶液に浸けること(ステップ1)、
ステップ1の金属部分を浸けた溶液に還元剤(HYBRID)を加えること(ステップ2)、および、
ステップ2で還元し、除染した金属部分を排除した後に溶液を精製すること(ステップ3)
を含む、主要システム部分のためのマルチステップ除染方法を提供する。
[反応式1]
Fe3O4 + 2e− + 8H+ → 3Fe2+ + 4H2O
(Fe3O4は酸化鉄を示し、金属表面の放射性酸化物層の例である)
酸化除染剤を次のステップで製造した:
従来の酸化除染剤の1つを次のステップで製造した:
本発明の酸化除染剤の抗腐食効果を調査するために、次のように、実施例1および比較例1において調製された酸化除染剤を用いて全体的な腐食率試験を行い、結果を図5に示した。
本発明の酸化除染剤の局部腐食を防止する効果を調査するため、実施例1および比較例1で調製した酸化除染剤で次の実験を行い、結果を図6に示した。
本発明の酸化除染剤の除染効果を調査するため、原子力発電プラントの主要システムサンプルの複製である汚染サンプルを調製した。酸化−還元−酸化−還元除染を段階的に行い、続いて、除染効果を評価した。結果を図7に示す。
Claims (11)
- インコネル鋼表面の高放射性酸化物層を除去するための酸化除染剤であって、酸化剤、濃度が2×10−5〜2×10−3MのCu2+の金属イオンおよび硝酸(HNO3)を含む、前記酸化除染剤。
- 酸化剤が、KMnO4、NaMnO4、H2CrO4およびHMnO4からなる群から選択される1または2以上である、請求項1に記載の酸化除染剤。
- 原子力発電プラントシステムの内部で発生するインコネル鋼表面の高放射性酸化物層を除去するための請求項1に記載の酸化除染剤。
- 酸化剤の濃度が、1×10−5〜1×10−2Mである、請求項1に記載の酸化除染剤。
- 硝酸の濃度が、2×10−5〜3×10−2Mである、請求項1に記載の酸化除染剤。
- 酸化除染剤のpHが1.5〜4.8である、請求項1に記載の酸化除染剤。
- 以下のステップ:
蒸留水に酸化剤を溶解し、溶液を調製すること(ステップ1)、
ステップ1で調製した溶液に硝酸を加えること(ステップ2)、および、
ステップ2で調製した硝酸含有溶液に2×10−5〜2×10−3M濃度のCu2+の金属イオンを加えること(ステップ3)
を含む、インコネル鋼表面の高放射性酸化物層を除去するための酸化除染剤の製造方法。 - 酸化除染剤のpHが、ステップ2の硝酸によって、1.5〜4.8に調節されている、請求項7に記載の酸化除染剤の製造方法。
- 原子力発電プラントシステムの主要システムの酸化除染方法であって、高放射性酸化物層が付着した主要システムのインコネル鋼部分と請求項1に記載の酸化除染剤とを接触させるステップを含む、前記酸化除染方法。
- 酸化除染方法が、高放射性酸化物層が付着したインコネル鋼部分を請求項1に記載の酸化除染剤中に浸すことによって行われる、請求項9に記載の原子力発電プラントシステムの主要部の酸化除染方法。
- 酸化除染方法が、70〜110℃で、2〜10時間行われる、請求項9に記載の原子力発電プラントシステムの主要部の酸化除染方法。
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KR1020130070500A KR101523763B1 (ko) | 2013-06-19 | 2013-06-19 | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 산화 제염제 및 이를 이용한 산화 제염방법 |
KR10-2013-0070500 | 2013-06-19 |
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US (1) | US9390822B2 (ja) |
JP (1) | JP6006261B2 (ja) |
KR (1) | KR101523763B1 (ja) |
FR (1) | FR3007569B1 (ja) |
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US10340050B2 (en) | 2015-02-05 | 2019-07-02 | Framatome Gmbh | Method of decontaminating metal surfaces in a cooling system of a nuclear reactor |
CA2996975C (en) * | 2015-08-28 | 2022-02-15 | Serpin Pharma, Llc | Methods for treatment of diseases |
KR101883895B1 (ko) | 2016-10-12 | 2018-08-02 | 한국원자력연구원 | 방사성 폐기물을 혁신적으로 줄일 수 있는 제염방법 및 이를 위한 키트 |
DE102017107584A1 (de) | 2017-04-07 | 2018-10-11 | Rwe Power Aktiengesellschaft | Zinkdosierung zur Dekontamination von Leichtwasserreaktoren |
KR102278944B1 (ko) * | 2019-08-19 | 2021-07-21 | 한국원자력연구원 | 금속 제염용 식각 조성물 및 이를 이용한 금속 제염방법 |
CN113105955A (zh) * | 2021-03-31 | 2021-07-13 | 山东核电有限公司 | 一种用于ap1000反应堆一回路部件放射性污染沉积氧化物的去污配方和去污方法 |
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DE3270078D1 (en) | 1981-06-17 | 1986-04-30 | Central Electr Generat Board | Process for the chemical dissolution of oxide deposits |
JPS63188799A (ja) * | 1987-01-30 | 1988-08-04 | 日立プラント建設株式会社 | 放射性金属廃棄物の除染方法 |
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JP3874830B2 (ja) * | 1996-01-29 | 2007-01-31 | 株式会社東芝 | 除染方法とその除染システム |
JP2000346988A (ja) * | 1999-06-07 | 2000-12-15 | Toshiba Corp | 再処理関連施設の金属構造材の化学除染方法 |
AU6337700A (en) * | 1999-06-24 | 2001-01-09 | University Of Chicago, The | Method for the decontamination of metallic surfaces |
JP2003511709A (ja) | 1999-10-12 | 2003-03-25 | ゼネラル・エレクトリック・カンパニイ | 原子力発電プラントの除染方法 |
JP3849925B2 (ja) * | 2000-12-21 | 2006-11-22 | 株式会社東芝 | 化学除染方法 |
KR100505470B1 (ko) * | 2002-08-08 | 2005-08-03 | 한전기공주식회사 | 방사성 물질에 오염된 스테인레스스틸304계열 재질의기기에 대한 농축식 화학 제염 방법 및 희석식 화학 제염방법 |
JP4083607B2 (ja) | 2003-03-19 | 2008-04-30 | 株式会社東芝 | 放射能の化学除染方法および装置 |
WO2007091559A1 (ja) * | 2006-02-09 | 2007-08-16 | Kabushiki Kaisha Toshiba | 化学除染装置およびその除染方法 |
KR100856944B1 (ko) | 2006-12-19 | 2008-09-04 | 한전케이피에스 주식회사 | 방사성 물질에 오염된 원자로냉각재펌프 내장품 희석식 화학제염 방법 |
JP5415857B2 (ja) | 2009-07-22 | 2014-02-12 | Dowaメタルテック株式会社 | ステンレス部材の腐食抑制方法 |
DE102009047524A1 (de) * | 2009-12-04 | 2011-06-09 | Areva Np Gmbh | Verfahren zur Oberflächen-Dekontamination |
DE102010028457A1 (de) * | 2010-04-30 | 2011-11-03 | Areva Np Gmbh | Verfahren zur Oberflächen-Dekontamination |
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JP2015004675A (ja) | 2015-01-08 |
US20140378733A1 (en) | 2014-12-25 |
KR101523763B1 (ko) | 2015-06-01 |
KR20140147382A (ko) | 2014-12-30 |
FR3007569A1 (fr) | 2014-12-26 |
US9390822B2 (en) | 2016-07-12 |
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