FR2989294B1 - Dispositif et methode de nano-usinage par laser - Google Patents

Dispositif et methode de nano-usinage par laser Download PDF

Info

Publication number
FR2989294B1
FR2989294B1 FR1253404A FR1253404A FR2989294B1 FR 2989294 B1 FR2989294 B1 FR 2989294B1 FR 1253404 A FR1253404 A FR 1253404A FR 1253404 A FR1253404 A FR 1253404A FR 2989294 B1 FR2989294 B1 FR 2989294B1
Authority
FR
France
Prior art keywords
focusing
plasma
nano
machining
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1253404A
Other languages
English (en)
French (fr)
Other versions
FR2989294A1 (fr
Inventor
Francois Courvoisier
Pierre-Ambroise Lacourt
Maxime Jacquot
Luca Furfaro
John Dudley
Labachelerie Michel De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite de Franche-Comte
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite de Franche-Comte
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite de Franche-Comte filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR1253404A priority Critical patent/FR2989294B1/fr
Priority to PCT/EP2013/057673 priority patent/WO2013153195A1/fr
Priority to US14/394,159 priority patent/US10131017B2/en
Priority to LTEP13723418.3T priority patent/LT2836332T/lt
Priority to JP2015504967A priority patent/JP6224074B2/ja
Priority to EP13723418.3A priority patent/EP2836332B1/fr
Publication of FR2989294A1 publication Critical patent/FR2989294A1/fr
Application granted granted Critical
Publication of FR2989294B1 publication Critical patent/FR2989294B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0613Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/55Working by transmitting the laser beam through or within the workpiece for creating voids inside the workpiece, e.g. for forming flow passages or flow patterns
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0038Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0436Apparatus for thermal treatment mainly by radiation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90Thermal treatments, e.g. annealing or sintering
    • H10P95/906Thermal treatments, e.g. annealing or sintering for altering the shape of semiconductors, e.g. smoothing the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/30Organic materials
    • B23K2103/40Paper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic materials other than metals or composite materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic materials other than metals or composite materials
    • B23K2103/52Ceramics

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Laser Beam Processing (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lasers (AREA)
FR1253404A 2012-04-13 2012-04-13 Dispositif et methode de nano-usinage par laser Active FR2989294B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1253404A FR2989294B1 (fr) 2012-04-13 2012-04-13 Dispositif et methode de nano-usinage par laser
PCT/EP2013/057673 WO2013153195A1 (fr) 2012-04-13 2013-04-12 Dispositif et methode de nano-usinage par laser
US14/394,159 US10131017B2 (en) 2012-04-13 2013-04-12 Laser nanomachining device and method
LTEP13723418.3T LT2836332T (lt) 2012-04-13 2013-04-12 Lazerinio nano-apdirbimo prietaisas ir būdas
JP2015504967A JP6224074B2 (ja) 2012-04-13 2013-04-12 レーザナノ加工装置および方法
EP13723418.3A EP2836332B1 (fr) 2012-04-13 2013-04-12 Dispositif et methode de nano-usinage par laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1253404A FR2989294B1 (fr) 2012-04-13 2012-04-13 Dispositif et methode de nano-usinage par laser

Publications (2)

Publication Number Publication Date
FR2989294A1 FR2989294A1 (fr) 2013-10-18
FR2989294B1 true FR2989294B1 (fr) 2022-10-14

Family

ID=48463923

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1253404A Active FR2989294B1 (fr) 2012-04-13 2012-04-13 Dispositif et methode de nano-usinage par laser

Country Status (6)

Country Link
US (1) US10131017B2 (enExample)
EP (1) EP2836332B1 (enExample)
JP (1) JP6224074B2 (enExample)
FR (1) FR2989294B1 (enExample)
LT (1) LT2836332T (enExample)
WO (1) WO2013153195A1 (enExample)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012010708B4 (de) * 2012-05-30 2021-12-23 Carl Zeiss Microscopy Gmbh Kombiniertes bearbeitungssystem zur bearbeitung mittels laser und fokussierten ionenstrahlen
US8945731B2 (en) 2012-06-29 2015-02-03 Seagate Technology Llc Interlayer for device including NFT and cladding layers
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
US9701564B2 (en) 2013-01-15 2017-07-11 Corning Incorporated Systems and methods of glass cutting by inducing pulsed laser perforations into glass articles
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US10124439B2 (en) 2013-03-27 2018-11-13 Hamamatsu Photonics K.K. Laser machining device and laser machining method
JP6272302B2 (ja) * 2013-03-27 2018-01-31 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
JP6272301B2 (ja) * 2013-03-27 2018-01-31 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
DE112014001653B4 (de) 2013-03-27 2024-06-06 Hamamatsu Photonics K.K. Laserbearbeitungsvorrichtung und Laserbearbeitungsverfahren
FR3012059B1 (fr) * 2013-10-17 2016-01-08 Centre Nat Rech Scient Methode et dispositif de micro-usinage par laser
US10005152B2 (en) * 2013-11-19 2018-06-26 Rofin-Sinar Technologies Llc Method and apparatus for spiral cutting a glass tube using filamentation by burst ultrafast laser pulses
KR101407993B1 (ko) * 2013-12-10 2014-06-18 주식회사 엘티에스 기판 절단방법
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9687936B2 (en) 2013-12-17 2017-06-27 Corning Incorporated Transparent material cutting with ultrafast laser and beam optics
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
JP2015188939A (ja) * 2014-03-31 2015-11-02 アイシン精機株式会社 レーザ接合方法、レーザ接合品及びレーザ接合装置
US10239155B1 (en) * 2014-04-30 2019-03-26 The Boeing Company Multiple laser beam processing
JP6355194B2 (ja) * 2014-05-30 2018-07-11 国立研究開発法人理化学研究所 半導体基材における除去加工装置およびその方法
KR102445217B1 (ko) 2014-07-08 2022-09-20 코닝 인코포레이티드 재료를 레이저 가공하는 방법 및 장치
RU2017104427A (ru) * 2014-07-11 2018-08-13 Корнинг Инкорпорейтед Системы и методы резки стекла путем создания перфорации в стеклянных изделиях с применением импульсного оптического квантового генератора
WO2016010949A1 (en) 2014-07-14 2016-01-21 Corning Incorporated Method and system for forming perforations
LT3169477T (lt) 2014-07-14 2020-05-25 Corning Incorporated Skaidrių medžiagų apdorojimo sistema ir būdas, naudojant lazerio pluošto židinio linijas, kurių ilgis ir skersmuo yra reguliuojami
EP3536440A1 (en) 2014-07-14 2019-09-11 Corning Incorporated Glass article with a defect pattern
WO2016010991A1 (en) 2014-07-14 2016-01-21 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
US9617180B2 (en) 2014-07-14 2017-04-11 Corning Incorporated Methods and apparatuses for fabricating glass articles
DE102014116958B9 (de) 2014-11-19 2017-10-05 Trumpf Laser- Und Systemtechnik Gmbh Optisches System zur Strahlformung eines Laserstrahls, Laserbearbeitungsanlage, Verfahren zur Materialbearbeitung und Verwenden einer gemeinsamen langgezogenen Fokuszone zur Lasermaterialbearbeitung
KR102251985B1 (ko) 2014-11-19 2021-05-17 트룸프 레이저-운트 시스템테크닉 게엠베하 비대칭 광학 빔 정형을 위한 시스템
DE102014116957A1 (de) 2014-11-19 2016-05-19 Trumpf Laser- Und Systemtechnik Gmbh Optisches System zur Strahlformung
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
JP2018507154A (ja) 2015-01-12 2018-03-15 コーニング インコーポレイテッド マルチフォトン吸収方法を用いた熱強化基板のレーザー切断
WO2016154284A1 (en) 2015-03-24 2016-09-29 Corning Incorporated Laser cutting and processing of display glass compositions
CN107666983B (zh) 2015-03-27 2020-10-02 康宁股份有限公司 可透气窗及其制造方法
KR102499697B1 (ko) 2015-07-10 2023-02-14 코닝 인코포레이티드 유연한 기판 시트에서의 홀의 연속 제조 방법 및 이에 관한 물품
CN105081565A (zh) * 2015-08-10 2015-11-25 武汉华工激光工程有限责任公司 一种用整形光束进行材料加工的系统及方法
DE102015218564B4 (de) 2015-09-28 2020-07-30 Trumpf Laser Gmbh Laserbearbeitungsmaschine und Verfahren zum Laserschweißen von Werkstücken
US10494290B2 (en) * 2016-01-14 2019-12-03 Corning Incorporated Dual-airy-beam systems and methods for processing glass substrates
DE102016102768A1 (de) 2016-02-17 2017-08-17 Schott Ag Verfahren zur Kantenbearbeitung von Glaselementen und verfahrensgemäß bearbeitetes Glaselement
KR102405144B1 (ko) 2016-05-06 2022-06-07 코닝 인코포레이티드 투명 기판들로부터의 윤곽 형상들의 레이저 절단 및 제거
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
JP7190631B2 (ja) * 2016-07-25 2022-12-16 アンプリテュード システム マルチビームフェムト秒レーザによって材料を切断する方法及び器具
FR3054151B1 (fr) * 2016-07-25 2018-07-13 Amplitude Systemes Procede et appareil pour la decoupe de materiaux par multi-faisceaux laser femtoseconde
JP7090594B2 (ja) 2016-07-29 2022-06-24 コーニング インコーポレイテッド レーザ加工するための装置および方法
US10522963B2 (en) 2016-08-30 2019-12-31 Corning Incorporated Laser cutting of materials with intensity mapping optical system
EP3311947B1 (en) 2016-09-30 2019-11-20 Corning Incorporated Methods for laser processing transparent workpieces using non-axisymmetric beam spots
WO2018064409A1 (en) 2016-09-30 2018-04-05 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
CN107876971A (zh) * 2016-09-30 2018-04-06 上海微电子装备(集团)股份有限公司 一种激光切割装置及方法
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
DE102016120244A1 (de) * 2016-10-24 2018-04-26 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur additiven Herstellung dreidimensionaler Objekte
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
KR102406333B1 (ko) * 2016-11-18 2022-06-08 아이피지 포토닉스 코포레이션 재료 가공 레이저 시스템 및 방법
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
WO2021262537A1 (en) * 2020-06-25 2021-12-30 Corning Incorporated Methods for laser processing transparent workpieces using radially variable laser beam focal columns
KR102375235B1 (ko) * 2020-09-08 2022-03-16 주식회사 필옵틱스 레이저 가공 시스템 및 방법
US12434331B2 (en) * 2020-09-11 2025-10-07 Corning Incorporated Laser forming non-square edges in transparent workpieces using modified airy beams
FR3121349B1 (fr) * 2021-04-01 2024-08-16 Keranova Systeme de decoupe d’un tissu en portions par generation de bulles de gaz oblongues
JP7730722B2 (ja) 2021-10-25 2025-08-28 ギガフォトン株式会社 極端紫外光生成方法、極端紫外光生成装置、及び電子デバイスの製造方法
KR20230064664A (ko) 2021-11-03 2023-05-11 삼성디스플레이 주식회사 광학 시스템

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3341795B2 (ja) 1994-01-13 2002-11-05 富士写真フイルム株式会社 レーザ走査発振装置
US5394411A (en) * 1994-02-16 1995-02-28 University Of Maryland, College Park Method for producing high intensity optical through x-ray waveguide and applications
KR970008386A (ko) * 1995-07-07 1997-02-24 하라 세이지 기판의 할단(割斷)방법 및 그 할단장치
US6181463B1 (en) * 1997-03-21 2001-01-30 Imra America, Inc. Quasi-phase-matched parametric chirped pulse amplification systems
JP3982136B2 (ja) 2000-02-04 2007-09-26 セイコーエプソン株式会社 レーザ加工方法及びその装置
ATE427181T1 (de) * 2000-10-25 2009-04-15 Iruvis Ltd Verfahren zum laserschneiden von optischen fasern oder wellenleitern
US6756563B2 (en) * 2002-03-07 2004-06-29 Orbotech Ltd. System and method for forming holes in substrates containing glass
JP4158481B2 (ja) * 2002-10-21 2008-10-01 セイコーエプソン株式会社 レーザー加工方法およびその装置、並びにその装置を用いた穴あけ加工方法
JP2004154813A (ja) * 2002-11-06 2004-06-03 National Institute Of Advanced Industrial & Technology レーザ加工方法および装置
JP3726136B2 (ja) * 2002-11-22 2005-12-14 独立行政法人産業技術総合研究所 ベッセルビーム生成方法および装置
JP2005028438A (ja) * 2003-07-11 2005-02-03 Disco Abrasive Syst Ltd レーザ光線を利用する加工装置
US7486705B2 (en) * 2004-03-31 2009-02-03 Imra America, Inc. Femtosecond laser processing system with process parameters, controls and feedback
JP2006123228A (ja) * 2004-10-27 2006-05-18 Disco Abrasive Syst Ltd レーザ加工方法およびレーザ加工装置
US7303977B2 (en) * 2004-11-10 2007-12-04 Intel Corporation Laser micromachining method
JP4618719B2 (ja) * 2005-03-25 2011-01-26 財団法人電力中央研究所 超短パルスレーザビームのフィラメントの形成方法および発生装置
JP4838531B2 (ja) 2005-04-27 2011-12-14 サイバーレーザー株式会社 板状体切断方法並びにレーザ加工装置
JP4800661B2 (ja) * 2005-05-09 2011-10-26 株式会社ディスコ レーザ光線を利用する加工装置
US7626138B2 (en) * 2005-09-08 2009-12-01 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
US9138913B2 (en) * 2005-09-08 2015-09-22 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
JP4483793B2 (ja) * 2006-01-27 2010-06-16 セイコーエプソン株式会社 微細構造体の製造方法及び製造装置
JP4833773B2 (ja) * 2006-08-31 2011-12-07 本田技研工業株式会社 微細穴開け加工方法
JP5068596B2 (ja) 2007-07-30 2012-11-07 公益財団法人高輝度光科学研究センター パルス整形装置、パルス整形方法、及び電子銃
JP4467633B2 (ja) * 2008-03-24 2010-05-26 丸文株式会社 ビーム加工装置、ビーム加工方法およびビーム加工基板
JP5531261B2 (ja) * 2009-03-27 2014-06-25 国立大学法人 千葉大学 レーザー加工方法、円偏光光渦レーザービームを用いたレーザー加工方法、針状体を有する部材の製造方法、および針状体を有する部材
JP6050684B2 (ja) * 2010-01-22 2016-12-21 ニューポート コーポレーション 広範に同調可能な光パラメトリック発振器
WO2012006736A2 (en) * 2010-07-12 2012-01-19 Filaser Inc. Method of material processing by laser filamentation

Also Published As

Publication number Publication date
WO2013153195A1 (fr) 2013-10-17
US20150158120A1 (en) 2015-06-11
JP6224074B2 (ja) 2017-11-01
EP2836332A1 (fr) 2015-02-18
FR2989294A1 (fr) 2013-10-18
US10131017B2 (en) 2018-11-20
JP2015520938A (ja) 2015-07-23
LT2836332T (lt) 2017-06-12
EP2836332B1 (fr) 2016-12-28

Similar Documents

Publication Publication Date Title
JP2016509540A5 (enExample)
CY1118267T1 (el) Μεθοδοι εστιασης και οπτικα συστηματα και διαταξεις που χρησιμοποιουν τα ιδια
WO2011127400A3 (en) Laser beam analysis apparatus
MX2016007974A (es) Corte de material transparente con laser ultrarrapido y optica de haces.
PE20150791A1 (es) Analizador de espectroscopia de plasma inducido por laser
WO2009095679A3 (en) Device and method for measuring scattering of radiation
WO2012064791A3 (en) Measuring crystal site lifetime in a non-linear optical crystal
EP4306036A3 (en) Confocal laser eye surgery system
WO2013093459A3 (en) Chormatic confocal metrological apparatus
WO2011026251A8 (fr) Dispositif pour horloge atomique
MX340570B (es) Aparato de imagen estereoscopica.
WO2016010943A3 (en) Method of and system for arresting crack propagation
JP2015524047A5 (enExample)
JP2012245285A5 (enExample)
WO2016018478A3 (en) Athermalized optics for laser wind sensing
WO2009050993A1 (ja) 非接触膜厚測定方法及び装置
FR3039298B1 (fr) Dispositif et procede de codage optique d'une image
JP2014503842A5 (ja) 共焦点レーザー走査顕微鏡
CN104914645B (zh) 多色飞秒激光产生装置
EP2058688A3 (en) Beam-adjusting optics
MX392157B (es) Sistema para realizar una espectroscopia.
GB201103814D0 (en) Laser fabrication system and method
JP2010534356A5 (enExample)
WO2011123250A3 (en) Method for accomplishing high-speed intensity variation of a polarized output laser beam
WO2014023498A3 (de) Messsystem zur bestimmung von reflexionscharakteristiken von solarspiegelmaterialien und verfahren zur qualitätsbestimmung einer spiegelmaterialprobe

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6

PLFP Fee payment

Year of fee payment: 7

PLFP Fee payment

Year of fee payment: 8

PLFP Fee payment

Year of fee payment: 9

PLFP Fee payment

Year of fee payment: 10

PLFP Fee payment

Year of fee payment: 11

PLFP Fee payment

Year of fee payment: 12

PLFP Fee payment

Year of fee payment: 13

PLFP Fee payment

Year of fee payment: 14

PLFP Fee payment

Year of fee payment: 15