FR2506790A1 - Bain et procede de depot electrolytique de ruthenium - Google Patents

Bain et procede de depot electrolytique de ruthenium

Info

Publication number
FR2506790A1
FR2506790A1 FR8209399A FR8209399A FR2506790A1 FR 2506790 A1 FR2506790 A1 FR 2506790A1 FR 8209399 A FR8209399 A FR 8209399A FR 8209399 A FR8209399 A FR 8209399A FR 2506790 A1 FR2506790 A1 FR 2506790A1
Authority
FR
France
Prior art keywords
ruthenium
baths
metal
bath
metal ruthenium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8209399A
Other languages
English (en)
Other versions
FR2506790B1 (fr
Inventor
Kenneth Derek Baker
Yvonne Rymwid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Occidental Chemical Corp
Original Assignee
Hooker Chemicals and Plastics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hooker Chemicals and Plastics Corp filed Critical Hooker Chemicals and Plastics Corp
Publication of FR2506790A1 publication Critical patent/FR2506790A1/fr
Application granted granted Critical
Publication of FR2506790B1 publication Critical patent/FR2506790B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

L'INVENTION CONCERNE DES BAINS PERFECTIONNES POUR LE DEPOT ELECTROLYTIQUE DE RUTHENIUM METALLIQUE SUR DES SUBSTRATS DIVERS. LES BAINS DE RUTHENIUM METALLIQUE SONT FORMULES AVEC UN COMPLEXE DE RUTHENIUM METALLIQUE ET D'ACIDE SULFAMIQUE OU LE RAPPORT MOLAIRE EST DE 1 MOLE DE RUTHENIUM METALLIQUE A ENTRE ENVIRON 4 A 10 MOLES D'ACIDE SULFAMIQUE. POUR LA PLUPART DES APPLICATIONS CERTAINS METAUX SELECTIFS SONT EGALEMENT PRESENTS DANS LES BAINS, QUI SONT MAINTENUS A UN PH COMPRIS ENTRE ENVIRON 1,0 ET 2,2. UN PROCEDE D'UTILISATION DES BAINS POUR REVETIR DES SUBSTRATS DE RUTHENIUM METALLIQUE ESSENTIELLEMENT PUR EST EGALEMENT DECRIT.
FR8209399A 1981-06-02 1982-05-28 Bain et procede de depot electrolytique de ruthenium Expired FR2506790B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/269,444 US4375392A (en) 1981-06-02 1981-06-02 Bath and process for the electrodeposition of ruthenium

Publications (2)

Publication Number Publication Date
FR2506790A1 true FR2506790A1 (fr) 1982-12-03
FR2506790B1 FR2506790B1 (fr) 1987-05-29

Family

ID=23027275

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8209399A Expired FR2506790B1 (fr) 1981-06-02 1982-05-28 Bain et procede de depot electrolytique de ruthenium

Country Status (12)

Country Link
US (1) US4375392A (fr)
JP (1) JPS581081A (fr)
AU (1) AU530963B2 (fr)
BE (1) BE893395A (fr)
CA (1) CA1195948A (fr)
DE (1) DE3219666C2 (fr)
ES (1) ES512662A0 (fr)
FR (1) FR2506790B1 (fr)
GB (1) GB2101633B (fr)
IT (1) IT1149326B (fr)
NL (1) NL8202237A (fr)
SE (1) SE8203084L (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19741990C1 (de) * 1997-09-24 1999-04-29 Degussa Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung
DE502007002036D1 (de) * 2007-03-28 2009-12-31 Umicore Galvanotechnik Gmbh Elektolyt und Verfahren zur Abscheidung von dekoraium
DE102011105207B4 (de) 2011-06-17 2015-09-10 Umicore Galvanotechnik Gmbh Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel
WO2021199087A1 (fr) * 2020-03-30 2021-10-07 Italfimet Srl Procédé galvanique pour l'électrodéposition d'une couche de protection, et bain associé
DE102020131371A1 (de) 2020-11-26 2022-06-02 Umicore Galvanotechnik Gmbh Rutheniumlegierungsschicht und deren Schichtkombinationen
CN112695339B (zh) * 2020-12-15 2022-05-27 世能氢电科技有限公司 一种析氢催化电极、其制备方法及其应用
CN113106507B (zh) * 2021-04-15 2022-03-08 电子科技大学 一种用于微纳沟槽和盲孔填充的电镀钌镀液及配制方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2037241A1 (fr) * 1969-03-21 1970-12-31 Sel Rex Corp
JPH0844534A (ja) * 1994-07-29 1996-02-16 Matsushita Electric Ind Co Ltd 画像圧縮伸長装置及びその制御方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2600175A (en) * 1946-09-11 1952-06-10 Metals & Controls Corp Electrical contact
US3625840A (en) * 1970-01-19 1971-12-07 Engelhard Ind Ltd Electrodeposition of ruthenium
JPS497780A (fr) * 1972-05-12 1974-01-23
US3892638A (en) * 1973-06-21 1975-07-01 Oxy Metal Industries Corp Electrolyte and method for electrodepositing rhodium-ruthenium alloys

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2037241A1 (fr) * 1969-03-21 1970-12-31 Sel Rex Corp
JPH0844534A (ja) * 1994-07-29 1996-02-16 Matsushita Electric Ind Co Ltd 画像圧縮伸長装置及びその制御方法

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
CHEMICAL ABSTRACTS, volume 74, no. 4, 25 janvier 1971, page 418, abrégé 18740d (COLUMBUS OHIO, US) & Elektrolit. Osazhdenic Splavov 1968, 2, 43-50, L.I. KADANER et al. "Electrochemical deposition of ruthenium-cobalt, ruthenium-nickel, ruthenium-cobalt-nickel, and platinum-nickel alloys" *
CHEMICAL ABSTRACTS, volume 93, no. 5, septembre 1980, page 558, abrégé 103832x (COLUMBUS OHIO, US) & JP-A- 8044534 (NIPPON ELECTRO PLATING ENGINEERS K.K.) 28-03-1980 *
GALVANOTECHNIK, volume 67, no. 2, 1976, (SAULGAU, DE) A.F. BOGENSCHUTZ et al. "Galvanische Abscheidung von Rutheniumschichten zur Oberfl{chenverg}tun g elektrischer Kontakte", pages 98-105 *
PRODUCT LICENSING INDEX, août 1968, volume 52, Electrodeposition of ruthenium, page 31 *

Also Published As

Publication number Publication date
GB2101633B (en) 1985-03-20
IT8248546A0 (it) 1982-05-31
CA1195948A (fr) 1985-10-29
ES8306807A1 (es) 1983-06-01
GB2101633A (en) 1983-01-19
JPH0156157B2 (fr) 1989-11-29
BE893395A (fr) 1982-12-02
DE3219666A1 (de) 1982-12-16
NL8202237A (nl) 1983-01-03
IT1149326B (it) 1986-12-03
AU530963B2 (en) 1983-08-04
DE3219666C2 (de) 1986-09-25
SE8203084L (sv) 1982-12-03
AU8419882A (en) 1983-01-13
FR2506790B1 (fr) 1987-05-29
JPS581081A (ja) 1983-01-06
US4375392A (en) 1983-03-01
ES512662A0 (es) 1983-06-01

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