FR2468981A1 - Composition pour resistance a base de nickel, de chrome et de silicium et procede de fabrication d'une resistance - Google Patents

Composition pour resistance a base de nickel, de chrome et de silicium et procede de fabrication d'une resistance

Info

Publication number
FR2468981A1
FR2468981A1 FR8023522A FR8023522A FR2468981A1 FR 2468981 A1 FR2468981 A1 FR 2468981A1 FR 8023522 A FR8023522 A FR 8023522A FR 8023522 A FR8023522 A FR 8023522A FR 2468981 A1 FR2468981 A1 FR 2468981A1
Authority
FR
France
Prior art keywords
resistance
chromium
nickel
silicon
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8023522A
Other languages
English (en)
French (fr)
Other versions
FR2468981B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
William Gurney Dorfeld
Robert John Settzo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Glass Works
Original Assignee
Corning Glass Works
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Glass Works filed Critical Corning Glass Works
Publication of FR2468981A1 publication Critical patent/FR2468981A1/fr
Application granted granted Critical
Publication of FR2468981B1 publication Critical patent/FR2468981B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C3/00—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49101—Applying terminal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Physical Vapour Deposition (AREA)
FR8023522A 1979-11-05 1980-11-04 Composition pour resistance a base de nickel, de chrome et de silicium et procede de fabrication d'une resistance Granted FR2468981A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/091,375 US4298505A (en) 1979-11-05 1979-11-05 Resistor composition and method of manufacture thereof

Publications (2)

Publication Number Publication Date
FR2468981A1 true FR2468981A1 (fr) 1981-05-08
FR2468981B1 FR2468981B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1985-02-08

Family

ID=22227440

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8023522A Granted FR2468981A1 (fr) 1979-11-05 1980-11-04 Composition pour resistance a base de nickel, de chrome et de silicium et procede de fabrication d'une resistance

Country Status (8)

Country Link
US (1) US4298505A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (2) JPS606521B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR830001873B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1157298A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3039927A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2468981A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2062676B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8006025A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088599A3 (en) * 1982-03-08 1984-08-08 Tsuyoshi Masumoto Ni-cr type alloy material

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof
US4591821A (en) * 1981-06-30 1986-05-27 Motorola, Inc. Chromium-silicon-nitrogen thin film resistor and apparatus
US4510178A (en) * 1981-06-30 1985-04-09 Motorola, Inc. Thin film resistor material and method
US4392992A (en) * 1981-06-30 1983-07-12 Motorola, Inc. Chromium-silicon-nitrogen resistor material
JPS5884406A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 薄膜抵抗体の製造方法
JPS5884401A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 抵抗体
JPS58119601A (ja) * 1982-01-08 1983-07-16 株式会社東芝 抵抗体
JPS597234A (ja) * 1982-07-05 1984-01-14 Aisin Seiki Co Ltd 圧力センサ
US4433269A (en) * 1982-11-22 1984-02-21 Burroughs Corporation Air fireable ink
JPS6212325U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1985-07-08 1987-01-26
JPH03148945A (ja) * 1989-11-06 1991-06-25 Nitsuko Corp コードレス電話機
DE4207220A1 (de) * 1992-03-07 1993-09-09 Philips Patentverwaltung Festkoerperelement fuer eine thermionische kathode
US5354509A (en) * 1993-10-26 1994-10-11 Cts Corporation Base metal resistors
US5518521A (en) * 1993-11-08 1996-05-21 Cts Corporation Process of producing a low TCR surge resistor using a nickel chromium alloy
JP2000500295A (ja) * 1996-09-13 2000-01-11 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 薄膜抵抗及び薄膜抵抗用の抵抗材料
DE10153217B4 (de) * 2001-10-31 2007-01-18 Heraeus Sensor Technology Gmbh Manteldraht, insbesondere Anschlussdraht für elektrische Temperatursensoren
US20040091255A1 (en) * 2002-11-11 2004-05-13 Eastman Kodak Company Camera flash circuit with adjustable flash illumination intensity
JP4760177B2 (ja) * 2005-07-14 2011-08-31 パナソニック株式会社 薄膜チップ形電子部品およびその製造方法
US10427277B2 (en) 2011-04-05 2019-10-01 Ingersoll-Rand Company Impact wrench having dynamically tuned drive components and method thereof
US9879339B2 (en) * 2012-03-20 2018-01-30 Southwest Research Institute Nickel-chromium-silicon based coatings
JP6219977B2 (ja) * 2014-08-18 2017-10-25 株式会社村田製作所 電子部品および電子部品の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462723A (en) * 1966-03-23 1969-08-19 Mallory & Co Inc P R Metal-alloy film resistor and method of making same
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765091C3 (de) * 1968-04-01 1974-06-06 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung eines hochkonstanten Metallschichtwiderstandselementes
US3591479A (en) * 1969-05-08 1971-07-06 Ibm Sputtering process for preparing stable thin film resistors
NL7102290A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-02-20 1972-08-22
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
US4073971A (en) * 1973-07-31 1978-02-14 Nobuo Yasujima Process of manufacturing terminals of a heat-proof metallic thin film resistor
US4204935A (en) * 1976-02-10 1980-05-27 Resista Fabrik Elektrischer Widerstande G.M.B.H. Thin-film resistor and process for the production thereof
US4100524A (en) * 1976-05-06 1978-07-11 Gould Inc. Electrical transducer and method of making
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462723A (en) * 1966-03-23 1969-08-19 Mallory & Co Inc P R Metal-alloy film resistor and method of making same
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
REVIEW OF THE ELECTRICAL COMMUNICATION LABORATORIES, volume 22, numéros 1-2, janvier - février 1974, TOKYO (JP); R. KANEOYA et al.: "Studies of a High Accuracy Ni-Cr-Si Thin Film Resistor for PCM-120 System", pages 82-91 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088599A3 (en) * 1982-03-08 1984-08-08 Tsuyoshi Masumoto Ni-cr type alloy material

Also Published As

Publication number Publication date
JPS606521B2 (ja) 1985-02-19
US4298505A (en) 1981-11-03
DE3039927A1 (de) 1981-05-14
JPS5693303A (en) 1981-07-28
NL8006025A (nl) 1981-06-01
KR830001873B1 (ko) 1983-09-15
JPS61179501A (ja) 1986-08-12
JPS647483B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-09
GB2062676B (en) 1983-11-09
FR2468981B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1985-02-08
GB2062676A (en) 1981-05-28
CA1157298A (en) 1983-11-22
KR830004650A (ko) 1983-07-16

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