FR2451636A1 - Procede de production d'un materiau composite semi-conducteur-verre - Google Patents
Procede de production d'un materiau composite semi-conducteur-verreInfo
- Publication number
- FR2451636A1 FR2451636A1 FR8005827A FR8005827A FR2451636A1 FR 2451636 A1 FR2451636 A1 FR 2451636A1 FR 8005827 A FR8005827 A FR 8005827A FR 8005827 A FR8005827 A FR 8005827A FR 2451636 A1 FR2451636 A1 FR 2451636A1
- Authority
- FR
- France
- Prior art keywords
- semiconductor
- composite material
- producing
- layer
- glass composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002131 composite material Substances 0.000 title abstract 3
- 239000011521 glass Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000005498 polishing Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/233—Manufacture of photoelectric screens or charge-storage screens
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/977—Thinning or removal of substrate
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Joining Of Glass To Other Materials (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2909985A DE2909985C3 (de) | 1979-03-14 | 1979-03-14 | Verfahren zur Herstellung eines Halbleiter-Glas-Verbundwerkstoffs und Verwendung eines solchen Verbundwerkstoffes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2451636A1 true FR2451636A1 (fr) | 1980-10-10 |
| FR2451636B1 FR2451636B1 (enExample) | 1985-03-08 |
Family
ID=6065356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8005827A Granted FR2451636A1 (fr) | 1979-03-14 | 1980-03-14 | Procede de production d'un materiau composite semi-conducteur-verre |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4295923A (enExample) |
| DE (1) | DE2909985C3 (enExample) |
| FR (1) | FR2451636A1 (enExample) |
| GB (1) | GB2046178B (enExample) |
| NL (1) | NL8001297A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4401367A (en) * | 1980-11-03 | 1983-08-30 | United Technologies Corporation | Method for pattern masking objects and the products thereof |
| DE3242737A1 (de) * | 1982-11-19 | 1984-05-24 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer halbleiter-photokathode |
| US4539687A (en) * | 1982-12-27 | 1985-09-03 | At&T Bell Laboratories | Semiconductor laser CRT |
| JPS59180525A (ja) * | 1983-03-31 | 1984-10-13 | Citizen Watch Co Ltd | カラ−液晶表示パネル |
| DE3321535A1 (de) * | 1983-04-22 | 1984-10-25 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer halbleiterphotokathode |
| DE3524765A1 (de) * | 1985-07-11 | 1987-01-22 | Licentia Gmbh | Verfahren zum herstellen einer durchsichtphotokathode |
| US4992135A (en) * | 1990-07-24 | 1991-02-12 | Micron Technology, Inc. | Method of etching back of tungsten layers on semiconductor wafers, and solution therefore |
| US5127984A (en) * | 1991-05-02 | 1992-07-07 | Avantek, Inc. | Rapid wafer thinning process |
| US6276996B1 (en) | 1998-11-10 | 2001-08-21 | Micron Technology, Inc. | Copper chemical-mechanical polishing process using a fixed abrasive polishing pad and a copper layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
| US6206756B1 (en) | 1998-11-10 | 2001-03-27 | Micron Technology, Inc. | Tungsten chemical-mechanical polishing process using a fixed abrasive polishing pad and a tungsten layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
| RU2670498C1 (ru) * | 2017-10-16 | 2018-10-23 | Общество с ограниченной ответственностью "Катод" | Устройство для изготовления заготовки фотокатода фотоэлектронного прибора термокомпрессионным соединением полупроводниковой пластины со стеклянной заготовкой |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1145488A (en) * | 1965-04-30 | 1969-03-12 | Texas Instruments Inc | Semiconductor device fabrication |
| FR2291610A1 (fr) * | 1974-11-18 | 1976-06-11 | Varian Associates | Procede de fabrication d'un composant dit iii-v et produit obtenu |
| DE2842492A1 (de) * | 1978-09-29 | 1980-04-03 | Licentia Gmbh | Halbleiter-glas-verbundwerkstoff und verfahren zu seiner herstellung |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1138401A (en) * | 1965-05-06 | 1969-01-01 | Mallory & Co Inc P R | Bonding |
| US3951707A (en) * | 1973-04-02 | 1976-04-20 | Kulite Semiconductor Products, Inc. | Method for fabricating glass-backed transducers and glass-backed structures |
| US4069094A (en) * | 1976-12-30 | 1978-01-17 | Rca Corporation | Method of manufacturing apertured aluminum oxide substrates |
-
1979
- 1979-03-14 DE DE2909985A patent/DE2909985C3/de not_active Expired
-
1980
- 1980-03-04 NL NL8001297A patent/NL8001297A/nl not_active Application Discontinuation
- 1980-03-13 US US06/130,122 patent/US4295923A/en not_active Expired - Lifetime
- 1980-03-14 FR FR8005827A patent/FR2451636A1/fr active Granted
- 1980-03-14 GB GB8008834A patent/GB2046178B/en not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1145488A (en) * | 1965-04-30 | 1969-03-12 | Texas Instruments Inc | Semiconductor device fabrication |
| FR2291610A1 (fr) * | 1974-11-18 | 1976-06-11 | Varian Associates | Procede de fabrication d'un composant dit iii-v et produit obtenu |
| DE2842492A1 (de) * | 1978-09-29 | 1980-04-03 | Licentia Gmbh | Halbleiter-glas-verbundwerkstoff und verfahren zu seiner herstellung |
Also Published As
| Publication number | Publication date |
|---|---|
| NL8001297A (nl) | 1980-09-16 |
| GB2046178A (en) | 1980-11-12 |
| DE2909985B2 (de) | 1981-01-22 |
| FR2451636B1 (enExample) | 1985-03-08 |
| DE2909985C3 (de) | 1981-10-22 |
| GB2046178B (en) | 1983-01-26 |
| DE2909985A1 (de) | 1980-09-18 |
| US4295923A (en) | 1981-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| FR2451636A1 (fr) | Procede de production d'un materiau composite semi-conducteur-verre | |
| EP0866493A3 (en) | Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate | |
| JPS5762539A (en) | Mounting method for semiconductor element | |
| FR2454182A1 (fr) | Procede pour fabriquer des corps semi-conducteurs constitues par du silicium amorphe, au moyen d'une decharge par effluves | |
| JPS5678155A (en) | Semiconductor device and manufacture thereof | |
| GB1498925A (en) | Method of manufacturing semiconductor devices in which a layer of semiconductor material is provided on a substrate apparatus for use in carrying out said method and semiconductor devices thus manufactured | |
| JPS54112977A (en) | Plastic-lined metal tube and its manufacture | |
| FR2451635A1 (fr) | Materiau composite semi-conducteur-verre | |
| JPS55104931A (en) | Forming method for cover glass for display tube | |
| JPS6481116A (en) | Superconductor | |
| JPS5683073A (en) | Semiconductor device | |
| JPS5522863A (en) | Manufacturing method for semiconductor device | |
| JPS54114256A (en) | Construction of liquid crystal cell and production of the same | |
| KR860009499A (ko) | 규소웨이퍼 보강재 및 보강방법 | |
| JPS5710224A (en) | Forming method for silicone single crystalline film | |
| WO1987004854A3 (en) | Liquid epitaxial process for producing three-dimensional semiconductor structures | |
| SU1097908A1 (ru) | Устройство дл изготовлени образца дл рентгеноспектрального анализа | |
| JPS53146299A (en) | Production of silicon carbide substrate | |
| JPS56100512A (en) | Elastic surface wave element and its production | |
| KR910013486A (ko) | 결함-없는 단결정 박막층 제조방법 | |
| FR2423865A1 (fr) | Procede pour l'application d'une couche epitaxiale sur un substrat a partir d'une phase gazeuse | |
| JPS57191617A (en) | Liquid crystal cell and its production | |
| FR2383728A1 (fr) | Perfectionnement a un procede de realisation d'un lingot de materiau cristallin | |
| JPS5740923A (en) | Manufacture of semiconductor device | |
| JPS54113253A (en) | Bonding method of semiconductor pellet |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |