JPS56100512A - Elastic surface wave element and its production - Google Patents
Elastic surface wave element and its productionInfo
- Publication number
- JPS56100512A JPS56100512A JP306580A JP306580A JPS56100512A JP S56100512 A JPS56100512 A JP S56100512A JP 306580 A JP306580 A JP 306580A JP 306580 A JP306580 A JP 306580A JP S56100512 A JPS56100512 A JP S56100512A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- surface wave
- elastic surface
- wave element
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Abstract
PURPOSE:To prevent lowering of the characteristic due to the influence of the undesired wave, by inclining the end part of the thin film, which is formed in the electrode part of the elastic surface wave element, into a taper form. CONSTITUTION:After forming comb line electrodes 21 on substrate 20, piezoelectric thin film 23 having taper-shaped inclined part 23' is formed at the end part. In case of formation of this piezoelectric thin film 23, the mask which has thickness (t) to satisfy relation 0.01<=h/t<=0.05 for thickness (h) of this film 23 to be formed and has little thermal expansion and contraction is arranged on substrate 20, and thin film 23 is vapor-deposited through this mask in the degree of evacuation of approximately 1-10X10<-4> Torrs.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP306580A JPS56100512A (en) | 1980-01-17 | 1980-01-17 | Elastic surface wave element and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP306580A JPS56100512A (en) | 1980-01-17 | 1980-01-17 | Elastic surface wave element and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56100512A true JPS56100512A (en) | 1981-08-12 |
Family
ID=11546922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP306580A Pending JPS56100512A (en) | 1980-01-17 | 1980-01-17 | Elastic surface wave element and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56100512A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210521U (en) * | 1985-07-03 | 1987-01-22 | ||
JPH0346233U (en) * | 1989-09-12 | 1991-04-30 | ||
WO2012127793A1 (en) * | 2011-03-22 | 2012-09-27 | パナソニック株式会社 | Elastic wave element |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131967A (en) * | 1972-11-24 | 1974-12-18 | ||
JPS5087794A (en) * | 1973-12-08 | 1975-07-15 |
-
1980
- 1980-01-17 JP JP306580A patent/JPS56100512A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131967A (en) * | 1972-11-24 | 1974-12-18 | ||
JPS5087794A (en) * | 1973-12-08 | 1975-07-15 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210521U (en) * | 1985-07-03 | 1987-01-22 | ||
JPH0346233U (en) * | 1989-09-12 | 1991-04-30 | ||
WO2012127793A1 (en) * | 2011-03-22 | 2012-09-27 | パナソニック株式会社 | Elastic wave element |
JPWO2012127793A1 (en) * | 2011-03-22 | 2014-07-24 | パナソニック株式会社 | Elastic wave element |
US9136458B2 (en) | 2011-03-22 | 2015-09-15 | Skyworks Panasonic Filter Solutions Japan Co., Ltd. | Elastic wave element |
US9748924B2 (en) | 2011-03-22 | 2017-08-29 | Skyworks Filter Solutions Japan Co., Ltd. | Elastic wave element with interdigital transducer electrode |
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