JPS5670448A - Oxygen sensor - Google Patents

Oxygen sensor

Info

Publication number
JPS5670448A
JPS5670448A JP14794179A JP14794179A JPS5670448A JP S5670448 A JPS5670448 A JP S5670448A JP 14794179 A JP14794179 A JP 14794179A JP 14794179 A JP14794179 A JP 14794179A JP S5670448 A JPS5670448 A JP S5670448A
Authority
JP
Japan
Prior art keywords
electrode
gas
film
oxygen
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14794179A
Other languages
Japanese (ja)
Inventor
Kozo Ariga
Satoshi Sekido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14794179A priority Critical patent/JPS5670448A/en
Publication of JPS5670448A publication Critical patent/JPS5670448A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable optional selection of the partial pressure of oxygen causing the change in current by using an electrode having a nonohmic barrier such as schottky barrier and the gas-transmitting property as an electrode on one side at least.
CONSTITUTION: On a substrate 1 made of insulating ceramics such as glass are formed one electrode 2 formed of a thin metal film and the like, a semiconductor oxide layer 3 of N type and the other gas-transmitting electrode 4 for forming the nonohmic barrier against the semiconductor layer 3. As this electrode 4, a thin film fitted by plasma flame spraying or, as an ultraparticulate film, fitted under the reduced pressure of about 10Torr of inactive gas or oxygen is desirable for making the film transmissible for gas. When a fixed voltage is given between both electrodes, sharp increase in current is caused at the place where the partial pressure of oxygen, i.e. A/F is near 18. Due to the carrier density near the surface of the semiconductor layer 3, the point where the current increases sharply changes and thus the setting at an optional A/F value becomes possible.
COPYRIGHT: (C)1981,JPO&Japio
JP14794179A 1979-11-14 1979-11-14 Oxygen sensor Pending JPS5670448A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14794179A JPS5670448A (en) 1979-11-14 1979-11-14 Oxygen sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14794179A JPS5670448A (en) 1979-11-14 1979-11-14 Oxygen sensor

Publications (1)

Publication Number Publication Date
JPS5670448A true JPS5670448A (en) 1981-06-12

Family

ID=15441517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14794179A Pending JPS5670448A (en) 1979-11-14 1979-11-14 Oxygen sensor

Country Status (1)

Country Link
JP (1) JPS5670448A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59131152A (en) * 1983-01-16 1984-07-27 Esutetsuku:Kk Reducing gas sensor
US4836012A (en) * 1988-05-26 1989-06-06 Ametek, Inc. Gas sensor
JP2006329802A (en) * 2005-05-26 2006-12-07 Kyushu Univ Carbon nanotube sensor and its manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59131152A (en) * 1983-01-16 1984-07-27 Esutetsuku:Kk Reducing gas sensor
JPH0358060B2 (en) * 1983-01-16 1991-09-04 S Tec Inc
US4836012A (en) * 1988-05-26 1989-06-06 Ametek, Inc. Gas sensor
JP2006329802A (en) * 2005-05-26 2006-12-07 Kyushu Univ Carbon nanotube sensor and its manufacturing method

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