JPS6210521U - - Google Patents
Info
- Publication number
- JPS6210521U JPS6210521U JP1985102360U JP10236085U JPS6210521U JP S6210521 U JPS6210521 U JP S6210521U JP 1985102360 U JP1985102360 U JP 1985102360U JP 10236085 U JP10236085 U JP 10236085U JP S6210521 U JPS6210521 U JP S6210521U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- piezoelectric thin
- wave device
- view
- propagation direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 4
- 238000010897 surface acoustic wave method Methods 0.000 claims description 4
- 230000003247 decreasing effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Description
第1図は本考案に係る表面波装置のガラス基板
とその上に形成されたインターデイジタル電極お
よび圧電薄膜の部分断面図、第2図は第1図の表
面波装置の圧電薄膜部分の拡大断面図、第3図は
第1図の表面波装置の圧電薄膜の平面図、第4図
は圧電薄膜形成用のマスクの平面図、第5図aは
第4図のマスクのスパツタリング用のユニツト部
分の拡大図、第5図bは第5図aの―線に沿
う断面図、第6図は圧電薄膜の端部形状の変形例
の平面図、第7図aおよび第7図bは夫々圧電薄
膜の端部の厚みの変化の2つの例を示す説明図、
第8図は従来の表面波装置の平面図、第9図は第
8図の表面波装置の圧電薄膜の拡大断面図である
。
21…ガラス基板、24…圧電薄膜、25…マ
スク、26…ステンレス板、25…ユニツト、2
7a…窓、27b,27c…段部。
FIG. 1 is a partial cross-sectional view of the glass substrate, interdigital electrodes and piezoelectric thin film formed on the glass substrate of the surface acoustic wave device according to the present invention, and FIG. 2 is an enlarged cross-sectional view of the piezoelectric thin film portion of the surface acoustic wave device of FIG. Fig. 3 is a plan view of the piezoelectric thin film of the surface acoustic wave device shown in Fig. 1, Fig. 4 is a plan view of a mask for forming the piezoelectric thin film, and Fig. 5a is a sputtering unit part of the mask shown in Fig. 4. 5b is a cross-sectional view taken along the line - in FIG. 5a, FIG. 6 is a plan view of a modified example of the end shape of the piezoelectric thin film, and FIGS. Explanatory diagrams showing two examples of changes in thickness at the edge of a thin film,
FIG. 8 is a plan view of a conventional surface wave device, and FIG. 9 is an enlarged cross-sectional view of the piezoelectric thin film of the surface wave device of FIG. 21... Glass substrate, 24... Piezoelectric thin film, 25... Mask, 26... Stainless steel plate, 25... Unit, 2
7a...window, 27b, 27c...stepped portion.
Claims (1)
において、上記圧電薄膜はインターデイジタル電
極で発生された表面波の伝播方向の端部の幅およ
び厚さが表面波の伝播方向に漸減されていること
を特徴とする表面波装置。 In a surface acoustic wave device in which a piezoelectric thin film is formed on a substrate, the width and thickness of the piezoelectric thin film at an end in the propagation direction of the surface waves generated by the interdigital electrodes are gradually decreased in the propagation direction of the surface waves. A surface wave device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985102360U JPS6210521U (en) | 1985-07-03 | 1985-07-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985102360U JPS6210521U (en) | 1985-07-03 | 1985-07-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6210521U true JPS6210521U (en) | 1987-01-22 |
Family
ID=30973939
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985102360U Pending JPS6210521U (en) | 1985-07-03 | 1985-07-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6210521U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01231512A (en) * | 1988-03-11 | 1989-09-14 | Murata Mfg Co Ltd | Surface wave element |
JPH01166154U (en) * | 1988-04-27 | 1989-11-21 | ||
WO2008114854A1 (en) * | 2007-03-15 | 2008-09-25 | Olympus Corporation | Mixer and automatic analyzer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5452958A (en) * | 1977-10-04 | 1979-04-25 | Matsushita Electric Ind Co Ltd | Elastic surface wave device |
JPS56100512A (en) * | 1980-01-17 | 1981-08-12 | Victor Co Of Japan Ltd | Elastic surface wave element and its production |
-
1985
- 1985-07-03 JP JP1985102360U patent/JPS6210521U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5452958A (en) * | 1977-10-04 | 1979-04-25 | Matsushita Electric Ind Co Ltd | Elastic surface wave device |
JPS56100512A (en) * | 1980-01-17 | 1981-08-12 | Victor Co Of Japan Ltd | Elastic surface wave element and its production |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01231512A (en) * | 1988-03-11 | 1989-09-14 | Murata Mfg Co Ltd | Surface wave element |
JPH01166154U (en) * | 1988-04-27 | 1989-11-21 | ||
WO2008114854A1 (en) * | 2007-03-15 | 2008-09-25 | Olympus Corporation | Mixer and automatic analyzer |
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