FR2413124A1 - Procede de preparation de monocristaux de silicium tres purs - Google Patents

Procede de preparation de monocristaux de silicium tres purs

Info

Publication number
FR2413124A1
FR2413124A1 FR7836883A FR7836883A FR2413124A1 FR 2413124 A1 FR2413124 A1 FR 2413124A1 FR 7836883 A FR7836883 A FR 7836883A FR 7836883 A FR7836883 A FR 7836883A FR 2413124 A1 FR2413124 A1 FR 2413124A1
Authority
FR
France
Prior art keywords
single crystals
silicon single
preparing
pure silicon
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7836883A
Other languages
English (en)
Other versions
FR2413124B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of FR2413124A1 publication Critical patent/FR2413124A1/fr
Application granted granted Critical
Publication of FR2413124B1 publication Critical patent/FR2413124B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30—Mechanisms for rotating or moving either the melt or the crystal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

L'INVENTION CONCERNE UN PROCEDE DE FABRICATION DE MONOCRISTAUX DE SILICIUM TRES PURS, CONTENANT UNE TRES FAIBLE PROPORTION D'OXYGENE, D'APRES LE PROCEDE DE CZOCHRALZKI. LE PROCEDE SELON L'INVENTION EST CARACTERISE EN CE QUE, APRES AVOIR MIS LE GERME CRISTALLIN EN CONTACT AVEC LA MASSE FONDUE, ON TIRE LE BARREAU DE SILICIUM A PARTIR DE CETTE MASSE FONDUE TOUT EN LE FAISANT TOURNER A RAISON DE 3 A 6TRMN. CES MONOCRISTAUX DE SILICIUM SONT DESTINES A LA FABRICATION DE COMPOSANTS SEMI-CONDUCTEURS DE CARACTERISTIQUES AUSSI CONSTANTES QUE POSSIBLE.
FR7836883A 1977-12-30 1978-12-29 Procede de preparation de monocristaux de silicium tres purs Granted FR2413124A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2758888A DE2758888C2 (de) 1977-12-30 1977-12-30 Verfahren zur Herstellung reinster Siliciumeinkristalle

Publications (2)

Publication Number Publication Date
FR2413124A1 true FR2413124A1 (fr) 1979-07-27
FR2413124B1 FR2413124B1 (fr) 1983-12-30

Family

ID=6027734

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7836883A Granted FR2413124A1 (fr) 1977-12-30 1978-12-29 Procede de preparation de monocristaux de silicium tres purs

Country Status (8)

Country Link
US (1) US4239585A (fr)
JP (1) JPS5494478A (fr)
DE (1) DE2758888C2 (fr)
DK (1) DK586678A (fr)
FR (1) FR2413124A1 (fr)
GB (1) GB2014871B (fr)
IT (1) IT1109399B (fr)
NL (1) NL7812363A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0042901A1 (fr) * 1980-06-26 1982-01-06 International Business Machines Corporation Procédé pour contrôler la teneur en oxygène des barreaux de silicium tirés selon la méthode de Czochralski
EP0055619A1 (fr) * 1980-12-29 1982-07-07 Monsanto Company Méthode pour régler la concentration et distribution en oxygène dans du silicium tiré selon la méthode Czochralski
EP0429847A1 (fr) * 1989-10-23 1991-06-05 Shin-Etsu Handotai Company Limited Procédé pour le tirage de silicium monocristallin

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511428A (en) * 1982-07-09 1985-04-16 International Business Machines Corporation Method of controlling oxygen content and distribution in grown silicon crystals
DE3333960A1 (de) * 1983-09-20 1985-04-04 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur herstellung von versetzungsfreien einkristallstaeben aus silicium
JPS6262520U (fr) * 1985-10-11 1987-04-18
US4659423A (en) * 1986-04-28 1987-04-21 International Business Machines Corporation Semiconductor crystal growth via variable melt rotation
US5215620A (en) * 1989-09-19 1993-06-01 Shin-Etsu Handotai Co. Ltd. Method for pulling a silicon single crystal by imposing a periodic rotation rate on a constant rotation rate
JPH0777999B2 (ja) * 1989-11-24 1995-08-23 信越半導体株式会社 アンチモンドープ単結晶シリコンの育成方法
JP3341378B2 (ja) * 1993-08-25 2002-11-05 富士通株式会社 シリコン結晶中の水素濃度測定方法及びシリコン結晶の製造方法
US5593498A (en) * 1995-06-09 1997-01-14 Memc Electronic Materials, Inc. Apparatus for rotating a crucible of a crystal pulling machine
US5911825A (en) * 1997-09-30 1999-06-15 Seh America, Inc. Low oxygen heater
EP1560951B1 (fr) * 2002-11-12 2010-10-27 MEMC Electronic Materials, Inc. Procede de preparation de silicium monocristallin au moyen de la rotation d'un creuset pour reguler le gradient de temperature

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB838848A (en) * 1955-11-30 1960-06-22 Rauland Corp Improvements in or relating to methods of manufacturing crystalline material
DE1519922A1 (de) * 1966-06-10 1970-03-12 Halbleiterwerk Frankfurt Oder Verfahren und Vorrichtung zum Ziehen von Kristallen aus einem Schmelztiegel

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB797377A (en) 1955-10-18 1958-07-02 Gen Electric Co Ltd Improvements in or relating to the production of semi-conductor bodies
US3275417A (en) * 1963-10-15 1966-09-27 Texas Instruments Inc Production of dislocation-free silicon single crystals
DE1644020A1 (de) * 1967-10-04 1971-03-25 Siemens Ag Verfahren zum Herstellen von tiegelgezogenen Einkristallstaeben mit homogener Dotierung
US3929557A (en) * 1973-06-11 1975-12-30 Us Air Force Periodically and alternately accelerating and decelerating rotation rate of a feed crystal
DE2438852C3 (de) * 1974-08-13 1980-02-07 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von homogen-dotierten Halbleitereinkristallstäben
US4010064A (en) 1975-05-27 1977-03-01 International Business Machines Corporation Controlling the oxygen content of Czochralski process of silicon crystals by sandblasting silica vessel
US4040895A (en) * 1975-10-22 1977-08-09 International Business Machines Corporation Control of oxygen in silicon crystals

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB838848A (en) * 1955-11-30 1960-06-22 Rauland Corp Improvements in or relating to methods of manufacturing crystalline material
DE1519922A1 (de) * 1966-06-10 1970-03-12 Halbleiterwerk Frankfurt Oder Verfahren und Vorrichtung zum Ziehen von Kristallen aus einem Schmelztiegel

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/73 *
EXBK/75 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0042901A1 (fr) * 1980-06-26 1982-01-06 International Business Machines Corporation Procédé pour contrôler la teneur en oxygène des barreaux de silicium tirés selon la méthode de Czochralski
EP0055619A1 (fr) * 1980-12-29 1982-07-07 Monsanto Company Méthode pour régler la concentration et distribution en oxygène dans du silicium tiré selon la méthode Czochralski
EP0429847A1 (fr) * 1989-10-23 1991-06-05 Shin-Etsu Handotai Company Limited Procédé pour le tirage de silicium monocristallin

Also Published As

Publication number Publication date
DK586678A (da) 1979-07-01
NL7812363A (nl) 1979-07-03
DE2758888A1 (de) 1979-07-05
DE2758888C2 (de) 1983-09-22
JPS5727077B2 (fr) 1982-06-08
IT1109399B (it) 1985-12-16
JPS5494478A (en) 1979-07-26
IT7852468A0 (it) 1978-12-28
FR2413124B1 (fr) 1983-12-30
US4239585A (en) 1980-12-16
GB2014871B (en) 1982-04-21
GB2014871A (en) 1979-09-05

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Legal Events

Date Code Title Description
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