FR2406897A1 - Plaquette de microcircuit en couche mince et methode de fabrication - Google Patents

Plaquette de microcircuit en couche mince et methode de fabrication

Info

Publication number
FR2406897A1
FR2406897A1 FR7830090A FR7830090A FR2406897A1 FR 2406897 A1 FR2406897 A1 FR 2406897A1 FR 7830090 A FR7830090 A FR 7830090A FR 7830090 A FR7830090 A FR 7830090A FR 2406897 A1 FR2406897 A1 FR 2406897A1
Authority
FR
France
Prior art keywords
thin layer
thin
manufacturing
layer
laminated structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7830090A
Other languages
English (en)
Other versions
FR2406897B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP52126730A external-priority patent/JPS6041812B2/ja
Priority claimed from JP13252477A external-priority patent/JPS5466343A/ja
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of FR2406897A1 publication Critical patent/FR2406897A1/fr
Application granted granted Critical
Publication of FR2406897B1 publication Critical patent/FR2406897B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/01—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
    • H01L27/016—Thin-film circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0112—Absorbing light, e.g. dielectric layer with carbon filler for laser processing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0302—Properties and characteristics in general
    • H05K2201/0317—Thin film conductor layer; Thin film passive component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/032—Materials
    • H05K2201/0326—Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Insulated Conductors (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

L'invention concerne une plaquette de microcircuit en couche mince. Selon l'invention, elle comporte un substrat diélectrique 1 et une structure laminée en couche mince formée sur le substrat, cette structure laminée comprenant une couche mince 2 d'un métal dispersible et évaporable lors de l'application d'une énergie supérieure à un seul et une couche mince 3 impartissant des propriétés électriques pas facile à disperser par l'application d'énergie et capable de produire une couche conductrice et/ou une couche résistive. L'invention s'applique notamment à l'industrie des circuits imprimés.
FR7830090A 1977-10-24 1978-10-23 Plaquette de microcircuit en couche mince et methode de fabrication Granted FR2406897A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP52126730A JPS6041812B2 (ja) 1977-10-24 1977-10-24 透明電極の製造方法
JP13252477A JPS5466343A (en) 1977-11-07 1977-11-07 Forming method for noble metal pattern

Publications (2)

Publication Number Publication Date
FR2406897A1 true FR2406897A1 (fr) 1979-05-18
FR2406897B1 FR2406897B1 (fr) 1983-10-21

Family

ID=26462860

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7830090A Granted FR2406897A1 (fr) 1977-10-24 1978-10-23 Plaquette de microcircuit en couche mince et methode de fabrication

Country Status (5)

Country Link
US (1) US4227039A (fr)
AU (1) AU512418B2 (fr)
DE (1) DE2845891C2 (fr)
FR (1) FR2406897A1 (fr)
GB (1) GB2006538B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374179A (en) * 1980-12-18 1983-02-15 Honeywell Inc. Plasma polymerized ethane for interlayer dielectric
JPS59185801U (ja) * 1983-05-26 1984-12-10 アルプス電気株式会社 チツプ抵抗
US4613313A (en) * 1983-12-27 1986-09-23 General Electric Company Ionization detector
JPS6130994U (ja) * 1984-07-28 1986-02-25 アルプス電気株式会社 透明電極シ−ト
JP2554358B2 (ja) * 1988-05-25 1996-11-13 沖電気工業株式会社 配線基板及び配線基板の製造方法
JPH06103787B2 (ja) * 1988-07-26 1994-12-14 日本碍子株式会社 導電性膜付ガラスセラミック基板
US5183973A (en) * 1989-08-14 1993-02-02 Santa Barbara Research Center Flexible cable for interconnecting electronic components
WO1991016805A1 (fr) * 1990-04-16 1991-10-31 Denki Kagaku Kogyo Kabushiki Kaisha Carte a circuits en ceramique
US5134248A (en) * 1990-08-15 1992-07-28 Advanced Temperature Devices, Inc. Thin film flexible electrical connector
US5543775A (en) * 1994-03-03 1996-08-06 Mannesmann Aktiengesellschaft Thin-film measurement resistor and process for producing same
DE19603971A1 (de) * 1996-01-26 1997-07-31 Emi Tec Elektronische Material Verfahren zur Herstellung einer Dateneingabevorrichtung
US7714432B2 (en) * 2002-07-26 2010-05-11 Intel Corporation Ceramic/organic hybrid substrate
US20140054065A1 (en) * 2012-08-21 2014-02-27 Abner D. Joseph Electrical circuit trace manufacturing for electro-chemical sensors

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1949850A1 (de) * 1968-10-03 1970-04-23 Nat Res Dev Verfahren und Einrichtung zum Fromen von Werkstuecken
DE2523982A1 (de) * 1975-05-30 1976-12-16 Ibm Deutschland Maskenlose mikromaterialbeschichtung

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL257531A (fr) * 1960-03-30
US3379568A (en) * 1964-12-21 1968-04-23 North American Rockwell Process for forming holes and multilayer interconnections through a dielectric
US3772631A (en) * 1969-08-12 1973-11-13 Litton Systems Inc Resistor and method of making and trimming same
US3918796A (en) * 1971-02-09 1975-11-11 Hoffmann La Roche Liquid-crystal non-linear light modulators using electric and magnetic fields
US3801366A (en) * 1971-02-16 1974-04-02 J Lemelson Method of making an electrical circuit
US4000334A (en) * 1971-07-15 1976-12-28 Energy Conversion Devices, Inc. Thermal imaging involving imagewise melting to form spaced apart globules
FR2201542B1 (fr) * 1972-10-02 1977-09-09 Bendix Corp
GB1422993A (en) * 1973-03-08 1976-01-28 Marconi Co Ltd Liquid crystal display arrangements
US3920485A (en) * 1973-05-21 1975-11-18 Us Navy Thin insulating film containing metallic particles
JPS5061124A (fr) * 1973-09-28 1975-05-26
US3947801A (en) * 1975-01-23 1976-03-30 Rca Corporation Laser-trimmed resistor
US4121007A (en) * 1975-08-19 1978-10-17 Asahi Kasei Kogyo Kabushiki Kaisha Printed circuit board made by dispersion imaging
US4082861A (en) * 1976-09-23 1978-04-04 Energy Conversion Devices, Inc. Continuous tone imaging film
FR2391538A1 (fr) * 1977-05-16 1978-12-15 Asahi Chemical Ind Resistance en couche mince et procede de fabrication

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1949850A1 (de) * 1968-10-03 1970-04-23 Nat Res Dev Verfahren und Einrichtung zum Fromen von Werkstuecken
DE2523982A1 (de) * 1975-05-30 1976-12-16 Ibm Deutschland Maskenlose mikromaterialbeschichtung

Also Published As

Publication number Publication date
DE2845891C2 (de) 1982-05-27
US4227039A (en) 1980-10-07
GB2006538B (en) 1982-03-17
FR2406897B1 (fr) 1983-10-21
AU4091678A (en) 1980-04-24
DE2845891A1 (de) 1979-04-26
AU512418B2 (en) 1980-10-09
GB2006538A (en) 1979-05-02

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Legal Events

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