FR2365824A1 - Procede pour realiser l'ajustement de masque d'exposition par rapport a une pastille de substrat - Google Patents
Procede pour realiser l'ajustement de masque d'exposition par rapport a une pastille de substratInfo
- Publication number
- FR2365824A1 FR2365824A1 FR7726943A FR7726943A FR2365824A1 FR 2365824 A1 FR2365824 A1 FR 2365824A1 FR 7726943 A FR7726943 A FR 7726943A FR 7726943 A FR7726943 A FR 7726943A FR 2365824 A1 FR2365824 A1 FR 2365824A1
- Authority
- FR
- France
- Prior art keywords
- adjustment
- marks
- substrate
- achieving
- relation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Projection-Type Copiers In General (AREA)
Abstract
L'invention concerne un procédé pour réaliser l'ajustement de masques d'exposition par rapport à une pastille de substrat Selon ce procédé on réalise sur un substrat des structures d'ajustement 110 comportant deux rangées 111, 112 de marques d'ajustement 101 à 108, et sur lesquelles on forme en recouvrement coïncidant l'image de structures d'ajustement correspondantes de masques successifs de photolithographie, la disposition spatiale des marques d'ajustement du substrat et des masques successifs étant telle qu'a chaque couple de marques d'ajustement du substrat correspond de façon précise un couple de marques correspondantes d'ajustement des masques. Application notamment à la fabrication de composants à semi-conducteurs et de circuits intégrés.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762642634 DE2642634A1 (de) | 1976-09-22 | 1976-09-22 | Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2365824A1 true FR2365824A1 (fr) | 1978-04-21 |
FR2365824B1 FR2365824B1 (fr) | 1981-05-08 |
Family
ID=5988556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7726943A Granted FR2365824A1 (fr) | 1976-09-22 | 1977-09-06 | Procede pour realiser l'ajustement de masque d'exposition par rapport a une pastille de substrat |
Country Status (8)
Country | Link |
---|---|
US (1) | US4118230A (fr) |
JP (1) | JPS5341984A (fr) |
BE (1) | BE858958A (fr) |
DE (1) | DE2642634A1 (fr) |
FR (1) | FR2365824A1 (fr) |
GB (1) | GB1551631A (fr) |
IT (1) | IT1086953B (fr) |
NL (1) | NL7710358A (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2066487B (en) * | 1979-12-18 | 1983-11-23 | Philips Electronic Associated | Alignment of exposure masks |
JPS5764921A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
US4343878A (en) * | 1981-01-02 | 1982-08-10 | Amdahl Corporation | System for providing photomask alignment keys in semiconductor integrated circuit processing |
US4883359A (en) * | 1984-02-28 | 1989-11-28 | Canon Kabushiki Kaisha | Alignment method and pattern forming method using the same |
DE3910048A1 (de) * | 1989-03-28 | 1990-08-30 | Heidelberg Instr Gmbh Laser Un | Verfahren zur herstellung oder inspektion von mikrostrukturen auf grossflaechigen substraten |
JP3163666B2 (ja) * | 1991-07-29 | 2001-05-08 | ソニー株式会社 | 位相シフトマスクを用いたパターン形成方法 |
US5316984A (en) * | 1993-03-25 | 1994-05-31 | Vlsi Technology, Inc. | Bright field wafer target |
US6576529B1 (en) * | 1999-12-07 | 2003-06-10 | Agere Systems Inc. | Method of forming an alignment feature in or on a multilayered semiconductor structure |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3690881A (en) * | 1970-09-28 | 1972-09-12 | Bell Telephone Labor Inc | Moire pattern aligning of photolithographic mask |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3477848A (en) * | 1964-12-14 | 1969-11-11 | Texas Instruments Inc | Method for producing sets of photomask having accurate registration |
US3607267A (en) * | 1967-10-09 | 1971-09-21 | Motorola Inc | Precision alignment of photographic masks |
US3506442A (en) * | 1968-09-27 | 1970-04-14 | Bell Telephone Labor Inc | Photomask modification and registration test methods |
US3963489A (en) * | 1975-04-30 | 1976-06-15 | Western Electric Company, Inc. | Method of precisely aligning pattern-defining masks |
US4060643A (en) * | 1976-02-02 | 1977-11-29 | Blanks William L | Method and apparatus for identifying color separation film |
-
1976
- 1976-09-22 DE DE19762642634 patent/DE2642634A1/de not_active Withdrawn
-
1977
- 1977-09-06 FR FR7726943A patent/FR2365824A1/fr active Granted
- 1977-09-21 NL NL7710358A patent/NL7710358A/xx not_active Application Discontinuation
- 1977-09-21 GB GB39312/77A patent/GB1551631A/en not_active Expired
- 1977-09-21 IT IT27767/77A patent/IT1086953B/it active
- 1977-09-22 US US05/835,746 patent/US4118230A/en not_active Expired - Lifetime
- 1977-09-22 BE BE181125A patent/BE858958A/fr unknown
- 1977-09-22 JP JP11450977A patent/JPS5341984A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3690881A (en) * | 1970-09-28 | 1972-09-12 | Bell Telephone Labor Inc | Moire pattern aligning of photolithographic mask |
Non-Patent Citations (1)
Title |
---|
EXBK/70 * |
Also Published As
Publication number | Publication date |
---|---|
NL7710358A (nl) | 1978-03-28 |
US4118230A (en) | 1978-10-03 |
GB1551631A (en) | 1979-08-30 |
IT1086953B (it) | 1985-05-31 |
JPS5341984A (en) | 1978-04-15 |
BE858958A (fr) | 1978-01-16 |
FR2365824B1 (fr) | 1981-05-08 |
DE2642634A1 (de) | 1978-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |