FR2357931A1 - Compositions durcissables utilisables comme materiaux photoresistants - Google Patents

Compositions durcissables utilisables comme materiaux photoresistants

Info

Publication number
FR2357931A1
FR2357931A1 FR7721089A FR7721089A FR2357931A1 FR 2357931 A1 FR2357931 A1 FR 2357931A1 FR 7721089 A FR7721089 A FR 7721089A FR 7721089 A FR7721089 A FR 7721089A FR 2357931 A1 FR2357931 A1 FR 2357931A1
Authority
FR
France
Prior art keywords
curing compositions
photoresistant
materials
photoresistant materials
solvents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7721089A
Other languages
English (en)
French (fr)
Other versions
FR2357931B1 (enrdf_load_html_response
Inventor
James Vincent Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2357931A1 publication Critical patent/FR2357931A1/fr
Application granted granted Critical
Publication of FR2357931B1 publication Critical patent/FR2357931B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
FR7721089A 1976-07-09 1977-07-08 Compositions durcissables utilisables comme materiaux photoresistants Granted FR2357931A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (2)

Publication Number Publication Date
FR2357931A1 true FR2357931A1 (fr) 1978-02-03
FR2357931B1 FR2357931B1 (enrdf_load_html_response) 1983-11-25

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7721089A Granted FR2357931A1 (fr) 1976-07-09 1977-07-08 Compositions durcissables utilisables comme materiaux photoresistants

Country Status (8)

Country Link
JP (1) JPS6035930B2 (enrdf_load_html_response)
AU (1) AU517415B2 (enrdf_load_html_response)
BR (1) BR7704527A (enrdf_load_html_response)
DE (1) DE2730725A1 (enrdf_load_html_response)
FR (1) FR2357931A1 (enrdf_load_html_response)
GB (1) GB1554389A (enrdf_load_html_response)
MX (2) MX145409A (enrdf_load_html_response)
NL (1) NL183948C (enrdf_load_html_response)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
WO2003064529A1 (en) * 2002-02-01 2003-08-07 Shell Solar Gmbh Barrier layer made of a curable resin containing polymeric polyol
SG10201405425XA (en) 2009-10-01 2014-10-30 Hitachi Chemical Co Ltd Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
KR20140108701A (ko) 2010-04-22 2014-09-12 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치
EP2966942A4 (en) 2013-03-08 2016-12-07 Hitachi Chemical Co Ltd TREATMENT SOLUTION WITH IONIC COMPOUND, ORGANIC ELECTRONIC ELEMENT AND METHOD FOR PRODUCING AN ORGANIC ELECTRONIC ELEMENT

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
FR1082297A (fr) * 1952-08-19 1954-12-28 Philips Nv Procédé d'obtention d'images tannées
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR2269551A1 (enrdf_load_html_response) * 1974-05-02 1975-11-28 Gen Electric
FR2269552A1 (enrdf_load_html_response) * 1974-05-02 1975-11-28 Gen Electric
FR2270269A1 (enrdf_load_html_response) * 1974-05-08 1975-12-05 Minnesota Mining & Mfg
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
FR1082297A (fr) * 1952-08-19 1954-12-28 Philips Nv Procédé d'obtention d'images tannées
DE972998C (de) * 1952-08-19 1959-11-12 Philips Nv Verfahren zur Herstellung von Gerbbildern aus Kunststoffen zur Verwendung als Druckformen
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
FR2269551A1 (enrdf_load_html_response) * 1974-05-02 1975-11-28 Gen Electric
FR2269552A1 (enrdf_load_html_response) * 1974-05-02 1975-11-28 Gen Electric
FR2270269A1 (enrdf_load_html_response) * 1974-05-08 1975-12-05 Minnesota Mining & Mfg
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
JPS6035930B2 (ja) 1985-08-17
DE2730725C2 (enrdf_load_html_response) 1990-08-16
NL183948C (nl) 1989-03-01
MX145409A (es) 1982-02-04
NL183948B (nl) 1988-10-03
AU2553177A (en) 1978-11-30
MX159499A (es) 1989-06-20
JPS5322597A (en) 1978-03-02
DE2730725A1 (de) 1978-01-12
AU517415B2 (en) 1981-07-30
BR7704527A (pt) 1978-04-25
FR2357931B1 (enrdf_load_html_response) 1983-11-25
GB1554389A (en) 1979-10-17
NL7707609A (nl) 1978-01-11

Similar Documents

Publication Publication Date Title
ES8705302A1 (es) Un procedimiento para preparar un elemento fotosensible
ATE40482T1 (de) Lichtempfindliches material mit sichtbarer belichtungsindikation.
SE7505838L (sv) Skyddsoverdrag och anordning derav.
JPS5314800A (en) Curable resin composition
AU2623884A (en) Water based epoxy compositions
JPS5280022A (en) Light solubilizable composition
FR2357931A1 (fr) Compositions durcissables utilisables comme materiaux photoresistants
FR2359437A1 (fr) Composition de photo-reserve amelioree
JPS5228875A (en) Mask
DE3473357D1 (de) Photopolymerizable laminate
ATE2288T1 (de) Photopolymerisierbares gemisch.
JPS6432255A (en) Image forming layer
EP0366333A3 (en) Solder mask resins having improved stability
ATE56828T1 (de) Photolackzusammensetzung und hieraus hergestellte gedruckte schaltungsplatte.
JPS5212830A (en) Exposure warning circuit
JPS5416591A (en) Photosensitive resin composition
JPS56121031A (en) Photosensitive composition
JPS52150493A (en) Ultraviolet light curing resin compositions
JPS5622312A (en) Photosensitive polyamide composition
JPS56150741A (en) Photosensitive resin composition
EP0113034A3 (en) A method for producing a resist image involving the use of polystyrene-tetrathiafulvalene polymer as a deep-ultraviolet printing mask
JPS5466830A (en) Printing plate photosensitive resin composition
KR960029359A (ko) 산-분해성 보호 그룹을 갖는 페놀 수지
EP0147596A3 (en) A positive lithographic resist composition
JPS5382503A (en) Photosensitive resin composition for flexographic printing plate

Legal Events

Date Code Title Description
ST Notification of lapse