FR2356742A1 - Procede pour obtenir une couche magnetique mince - Google Patents

Procede pour obtenir une couche magnetique mince

Info

Publication number
FR2356742A1
FR2356742A1 FR7720202A FR7720202A FR2356742A1 FR 2356742 A1 FR2356742 A1 FR 2356742A1 FR 7720202 A FR7720202 A FR 7720202A FR 7720202 A FR7720202 A FR 7720202A FR 2356742 A1 FR2356742 A1 FR 2356742A1
Authority
FR
France
Prior art keywords
obtaining
magnetic layer
thin magnetic
atom
approximately
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7720202A
Other languages
English (en)
Other versions
FR2356742B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of FR2356742A1 publication Critical patent/FR2356742A1/fr
Application granted granted Critical
Publication of FR2356742B1 publication Critical patent/FR2356742B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/90—Magnetic feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Compounds Of Iron (AREA)

Abstract

Ce procédé consiste à déposer sur un substrat en alliage d'aluminium placé face à elle une composition comprenant environ 1 à 10 % en atomes de Ti et environ 0,5 à 5 % en atomes de cobalt et le reste étant le fer par une technique de dépôt sous vide réactif, puis à faire subir un traitement thermique à ce dépôt afin de transformer en milieu d'enregistrement pour disque magnétique. Ce procédé est utilisé pour former une couche mince et continue de gamma -Fe2 O3 servant de milieu d'enregistrement pour disque magnétique.
FR7720202A 1976-07-01 1977-06-30 Procede pour obtenir une couche magnetique mince Granted FR2356742A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7861176A JPS533977A (en) 1976-07-01 1976-07-01 Production of magnetic film

Publications (2)

Publication Number Publication Date
FR2356742A1 true FR2356742A1 (fr) 1978-01-27
FR2356742B1 FR2356742B1 (fr) 1980-02-01

Family

ID=13666666

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7720202A Granted FR2356742A1 (fr) 1976-07-01 1977-06-30 Procede pour obtenir une couche magnetique mince

Country Status (7)

Country Link
US (1) US4232071A (fr)
JP (1) JPS533977A (fr)
CA (1) CA1102183A (fr)
DE (1) DE2729486C3 (fr)
FR (1) FR2356742A1 (fr)
GB (1) GB1583898A (fr)
NL (1) NL180053C (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0394159A1 (fr) * 1989-04-18 1990-10-24 USINOR SACILOR Société Anonyme Procédé de coloration de la surface de matériaux métalliques et produits obtenus par sa mise en oeuvre
FR2648478A1 (fr) * 1989-06-15 1990-12-21 Siderurgie Fse Inst Rech Procede de coloration de la surface de materiaux metalliques et produits obtenus par sa mise en oeuvre
EP1521245A1 (fr) * 2003-10-03 2005-04-06 Fuji Photo Film Co., Ltd. Moyen d'enregistrement magnétique et procédé pour sa fabrication

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775414A (en) * 1980-10-28 1982-05-12 Fuji Photo Film Co Ltd Manufacture of magneti substance thin film target for sputtering
US4544612A (en) * 1982-09-22 1985-10-01 Nippon Telegraph & Telephone Public Corporation Iron oxide magnetic film and process for fabrication thereof
JPS59111929A (ja) * 1982-12-15 1984-06-28 Masanori Abe フエライト膜作製方法
JPS6042493U (ja) * 1983-08-31 1985-03-26 東京焼結金属株式会社 粉末圧縮成形用パンチ
JPS60101711A (ja) * 1983-11-05 1985-06-05 Konishiroku Photo Ind Co Ltd 磁気記録媒体の製造方法
JPS60193126A (ja) * 1984-03-13 1985-10-01 Anelva Corp 垂直磁化フレキシブルデイスク
US4547276A (en) * 1984-04-30 1985-10-15 The United States Of America As Represented By The Secretary Of The Army Method of directly crystallizing a (Sm+Ti):Fe=1:5 compound
JPS61186595A (ja) * 1985-02-08 1986-08-20 三菱重工業株式会社 スクリ−ンシリンダの製作方法
DE3616492A1 (de) * 1985-05-20 1986-12-18 Masako Akimitsu Orthogonal magnetisierter anisotroper duenner film auf eisen-sauerstoff-basis
US4975324A (en) * 1986-10-21 1990-12-04 Matsushita Electric Industrial Co., Ltd. Perpendicular magnetic film of spinel type iron oxide compound and its manufacturing process
JP2840966B2 (ja) * 1989-11-08 1998-12-24 ティーディーケイ株式会社 磁気記録媒体および磁気記録再生方法
EP0461834A2 (fr) * 1990-06-11 1991-12-18 Matsushita Electric Industrial Co., Ltd. Milieu d'enregistrement magnétique et son procédé de fabrication
SG87798A1 (en) * 1998-03-20 2002-04-16 Toda Kogyo Corp Magnetic recording medium and process for producing the same
US20050177073A1 (en) * 2003-06-17 2005-08-11 Samuel Shiber Guidewire system with a deflectable distal tip
JP4728916B2 (ja) * 2006-08-31 2011-07-20 国立大学法人 東京大学 磁性材料

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148079A (en) * 1961-10-12 1964-09-08 Polytechnic Inst Brooklyn Process for producing thin film ferrimagnetic oxides
US3374113A (en) * 1965-01-13 1968-03-19 Bell Telephone Labor Inc Method for controlled aging of thin magnetic films by means of an easy axis annealing treatment
US3795542A (en) * 1971-06-09 1974-03-05 Corning Glass Works Method of making a magnetic recording and storage device
US3996395A (en) * 1972-05-26 1976-12-07 Corning Glass Works Method of increasing the coercivity of magnetite films
JPS604566B2 (ja) * 1974-06-28 1985-02-05 富士写真フイルム株式会社 強磁性粉末及びこれを使用した磁気記録体の安定化方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0394159A1 (fr) * 1989-04-18 1990-10-24 USINOR SACILOR Société Anonyme Procédé de coloration de la surface de matériaux métalliques et produits obtenus par sa mise en oeuvre
FR2648478A1 (fr) * 1989-06-15 1990-12-21 Siderurgie Fse Inst Rech Procede de coloration de la surface de materiaux metalliques et produits obtenus par sa mise en oeuvre
EP1521245A1 (fr) * 2003-10-03 2005-04-06 Fuji Photo Film Co., Ltd. Moyen d'enregistrement magnétique et procédé pour sa fabrication

Also Published As

Publication number Publication date
GB1583898A (en) 1981-02-04
JPS533977A (en) 1978-01-14
DE2729486B2 (de) 1979-12-20
DE2729486A1 (de) 1978-01-05
NL180053C (nl) 1986-12-16
NL180053B (nl) 1986-07-16
FR2356742B1 (fr) 1980-02-01
JPS5623296B2 (fr) 1981-05-30
DE2729486C3 (de) 1980-08-28
CA1102183A (fr) 1981-06-02
US4232071A (en) 1980-11-04
NL7707343A (nl) 1978-01-03

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