FR2345209A2 - Growing large diameter crystals esp. for semiconductor substrates - by Verneuil method with additional flame heating of flame deflector - Google Patents

Growing large diameter crystals esp. for semiconductor substrates - by Verneuil method with additional flame heating of flame deflector

Info

Publication number
FR2345209A2
FR2345209A2 FR7705914A FR7705914A FR2345209A2 FR 2345209 A2 FR2345209 A2 FR 2345209A2 FR 7705914 A FR7705914 A FR 7705914A FR 7705914 A FR7705914 A FR 7705914A FR 2345209 A2 FR2345209 A2 FR 2345209A2
Authority
FR
France
Prior art keywords
flame
esp
crystal
large diameter
semiconductor substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7705914A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2345209A2 publication Critical patent/FR2345209A2/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The Parent Patent described an appts. for monocrystal prodn. by the Verneuil process utilising a seed crystal, mounted on an axially movable support and subjected at its top to a downward flame; powdered material is projected downwards onto the seed crystal and fused there by means of the flame. A hollow inert for "torpedo" is coaxially mounted around the crystal and has a conical end directed against the flow of the flame in the region of the crystal, thus directing the flame outwards. In the Patent of Addition, additional heating of this insert or torpedo is provided by an auxiliary heating appts., which supplies flame gases into the furnace space at a level below the upper end of the inserts so that the flames spread downwards and along the insert. Esp. used for prodn. of sapphire and spinel crystals of large cross-section, for slicing into discs used as substrates in semiconductors. Enables diameters of 35-40 mm. to be attained and even larger diameters e.g. of 50-60 mm. may be achieved.
FR7705914A 1976-03-26 1977-03-01 Growing large diameter crystals esp. for semiconductor substrates - by Verneuil method with additional flame heating of flame deflector Pending FR2345209A2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762613006 DE2613006A1 (en) 1976-03-26 1976-03-26 DEVICE FOR THE PRODUCTION OF SINGLE CRYSTALS ACCORDING TO VERNEUIL

Publications (1)

Publication Number Publication Date
FR2345209A2 true FR2345209A2 (en) 1977-10-21

Family

ID=5973554

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7705914A Pending FR2345209A2 (en) 1976-03-26 1977-03-01 Growing large diameter crystals esp. for semiconductor substrates - by Verneuil method with additional flame heating of flame deflector

Country Status (5)

Country Link
JP (1) JPS52117289A (en)
CH (1) CH597906A5 (en)
DE (1) DE2613006A1 (en)
FR (1) FR2345209A2 (en)
IT (1) IT1115509B (en)

Also Published As

Publication number Publication date
CH597906A5 (en) 1978-04-14
JPS52117289A (en) 1977-10-01
IT1115509B (en) 1986-02-03
DE2613006A1 (en) 1977-09-29

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