FR2335615A1 - Dispositif de pulverisation de materiaux sur un substrat, notamment de substances photoconductrices sur un substrat mince et flexible - Google Patents

Dispositif de pulverisation de materiaux sur un substrat, notamment de substances photoconductrices sur un substrat mince et flexible

Info

Publication number
FR2335615A1
FR2335615A1 FR7631399A FR7631399A FR2335615A1 FR 2335615 A1 FR2335615 A1 FR 2335615A1 FR 7631399 A FR7631399 A FR 7631399A FR 7631399 A FR7631399 A FR 7631399A FR 2335615 A1 FR2335615 A1 FR 2335615A1
Authority
FR
France
Prior art keywords
substrate
thin
spraying materials
flexible substrate
photoconducting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7631399A
Other languages
English (en)
French (fr)
Other versions
FR2335615B1 (sv
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Information Systems Inc
Original Assignee
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by Coulter Information Systems Inc filed Critical Coulter Information Systems Inc
Publication of FR2335615A1 publication Critical patent/FR2335615A1/fr
Application granted granted Critical
Publication of FR2335615B1 publication Critical patent/FR2335615B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR7631399A 1975-12-17 1976-10-19 Dispositif de pulverisation de materiaux sur un substrat, notamment de substances photoconductrices sur un substrat mince et flexible Granted FR2335615A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus

Publications (2)

Publication Number Publication Date
FR2335615A1 true FR2335615A1 (fr) 1977-07-15
FR2335615B1 FR2335615B1 (sv) 1981-12-04

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7631399A Granted FR2335615A1 (fr) 1975-12-17 1976-10-19 Dispositif de pulverisation de materiaux sur un substrat, notamment de substances photoconductrices sur un substrat mince et flexible

Country Status (17)

Country Link
JP (1) JPS6035429B2 (sv)
AT (1) AT344501B (sv)
AU (1) AU511961B2 (sv)
BE (1) BE847413A (sv)
CA (1) CA1077437A (sv)
CH (1) CH617965A5 (sv)
DD (1) DD127637A5 (sv)
DE (1) DE2647149C2 (sv)
DK (1) DK149926C (sv)
FR (1) FR2335615A1 (sv)
GB (1) GB1503301A (sv)
IL (1) IL50722A (sv)
IT (1) IT1066543B (sv)
LU (1) LU76026A1 (sv)
MX (1) MX145314A (sv)
NL (1) NL7611563A (sv)
SE (1) SE429108B (sv)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413478A1 (fr) * 1977-12-27 1979-07-27 Coulter Systems Corp Methode et dispositif pour l'application simultanee d'un revetement sur plusieurs cylindres par pulverisation cathodique
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
FR2548589A1 (fr) * 1983-07-07 1985-01-11 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
JPS6162117A (ja) * 1984-09-03 1986-03-31 Brother Ind Ltd キーボードの製造方法
FR2940321B1 (fr) * 2008-12-19 2011-12-23 Carewave Shielding Technologies Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique.
JP5969953B2 (ja) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 成膜装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (sv) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413478A1 (fr) * 1977-12-27 1979-07-27 Coulter Systems Corp Methode et dispositif pour l'application simultanee d'un revetement sur plusieurs cylindres par pulverisation cathodique
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
FR2548589A1 (fr) * 1983-07-07 1985-01-11 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
EP0131513A1 (fr) * 1983-07-07 1985-01-16 AEROSPATIALE Société Nationale Industrielle Procédé et dispositif d'imprégnation métallique d'un substrat se présentant sous la forme d'une nappe de fibres conductrices du courant électrique
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique

Also Published As

Publication number Publication date
AT344501B (de) 1978-07-25
CA1077437A (en) 1980-05-13
BE847413A (nl) 1977-04-19
SE7611581L (sv) 1977-06-18
DK469976A (da) 1977-06-18
NL7611563A (nl) 1977-06-21
ATA776076A (de) 1977-11-15
CH617965A5 (en) 1980-06-30
AU2059876A (en) 1978-06-22
IL50722A (en) 1979-05-31
GB1503301A (en) 1978-03-08
JPS5275669A (en) 1977-06-24
FR2335615B1 (sv) 1981-12-04
SE429108B (sv) 1983-08-15
DD127637A5 (sv) 1977-10-05
DE2647149A1 (de) 1977-06-30
MX145314A (es) 1982-01-27
JPS6035429B2 (ja) 1985-08-14
IL50722A0 (en) 1976-12-31
DK149926C (da) 1987-09-28
LU76026A1 (sv) 1978-05-16
AU511961B2 (en) 1980-09-18
DE2647149C2 (de) 1983-08-25
IT1066543B (it) 1985-03-12
DK149926B (da) 1986-10-27

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Legal Events

Date Code Title Description
CD Change of name or company name
ST Notification of lapse