GB1503301A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
GB1503301A
GB1503301A GB43369/76A GB4336976A GB1503301A GB 1503301 A GB1503301 A GB 1503301A GB 43369/76 A GB43369/76 A GB 43369/76A GB 4336976 A GB4336976 A GB 4336976A GB 1503301 A GB1503301 A GB 1503301A
Authority
GB
United Kingdom
Prior art keywords
target
drum
anode
shields
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB43369/76A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Information Systems Inc
Original Assignee
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by Coulter Information Systems Inc filed Critical Coulter Information Systems Inc
Publication of GB1503301A publication Critical patent/GB1503301A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
GB43369/76A 1975-12-17 1976-10-19 Sputtering apparatus Expired GB1503301A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus

Publications (1)

Publication Number Publication Date
GB1503301A true GB1503301A (en) 1978-03-08

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
GB43369/76A Expired GB1503301A (en) 1975-12-17 1976-10-19 Sputtering apparatus

Country Status (17)

Country Link
JP (1) JPS6035429B2 (sv)
AT (1) AT344501B (sv)
AU (1) AU511961B2 (sv)
BE (1) BE847413A (sv)
CA (1) CA1077437A (sv)
CH (1) CH617965A5 (sv)
DD (1) DD127637A5 (sv)
DE (1) DE2647149C2 (sv)
DK (1) DK149926C (sv)
FR (1) FR2335615A1 (sv)
GB (1) GB1503301A (sv)
IL (1) IL50722A (sv)
IT (1) IT1066543B (sv)
LU (1) LU76026A1 (sv)
MX (1) MX145314A (sv)
NL (1) NL7611563A (sv)
SE (1) SE429108B (sv)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010076421A3 (fr) * 2008-12-19 2011-01-20 Carewave Shielding Technologies (Sas) Module de pulvérisation cathodique
EP3006596A4 (en) * 2013-05-31 2017-03-01 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Film forming device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
FR2548589B1 (fr) * 1983-07-07 1987-02-20 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique
JPS6162117A (ja) * 1984-09-03 1986-03-31 Brother Ind Ltd キーボードの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (sv) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010076421A3 (fr) * 2008-12-19 2011-01-20 Carewave Shielding Technologies (Sas) Module de pulvérisation cathodique
EP3006596A4 (en) * 2013-05-31 2017-03-01 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Film forming device

Also Published As

Publication number Publication date
AT344501B (de) 1978-07-25
CA1077437A (en) 1980-05-13
BE847413A (nl) 1977-04-19
SE7611581L (sv) 1977-06-18
DK469976A (da) 1977-06-18
NL7611563A (nl) 1977-06-21
ATA776076A (de) 1977-11-15
CH617965A5 (en) 1980-06-30
AU2059876A (en) 1978-06-22
IL50722A (en) 1979-05-31
JPS5275669A (en) 1977-06-24
FR2335615A1 (fr) 1977-07-15
FR2335615B1 (sv) 1981-12-04
SE429108B (sv) 1983-08-15
DD127637A5 (sv) 1977-10-05
DE2647149A1 (de) 1977-06-30
MX145314A (es) 1982-01-27
JPS6035429B2 (ja) 1985-08-14
IL50722A0 (en) 1976-12-31
DK149926C (da) 1987-09-28
LU76026A1 (sv) 1978-05-16
AU511961B2 (en) 1980-09-18
DE2647149C2 (de) 1983-08-25
IT1066543B (it) 1985-03-12
DK149926B (da) 1986-10-27

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19941019