AU511961B2 - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
AU511961B2
AU511961B2 AU20598/76A AU2059876A AU511961B2 AU 511961 B2 AU511961 B2 AU 511961B2 AU 20598/76 A AU20598/76 A AU 20598/76A AU 2059876 A AU2059876 A AU 2059876A AU 511961 B2 AU511961 B2 AU 511961B2
Authority
AU
Australia
Prior art keywords
sputtering apparatus
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU20598/76A
Other languages
English (en)
Other versions
AU2059876A (en
Inventor
MR Kuehnle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stork Colorproofing BV
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Publication of AU2059876A publication Critical patent/AU2059876A/en
Application granted granted Critical
Publication of AU511961B2 publication Critical patent/AU511961B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU20598/76A 1975-12-17 1976-12-16 Sputtering apparatus Expired AU511961B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus
USUS641481 1975-12-17

Publications (2)

Publication Number Publication Date
AU2059876A AU2059876A (en) 1978-06-22
AU511961B2 true AU511961B2 (en) 1980-09-18

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
AU20598/76A Expired AU511961B2 (en) 1975-12-17 1976-12-16 Sputtering apparatus

Country Status (17)

Country Link
JP (1) JPS6035429B2 (sv)
AT (1) AT344501B (sv)
AU (1) AU511961B2 (sv)
BE (1) BE847413A (sv)
CA (1) CA1077437A (sv)
CH (1) CH617965A5 (sv)
DD (1) DD127637A5 (sv)
DE (1) DE2647149C2 (sv)
DK (1) DK149926C (sv)
FR (1) FR2335615A1 (sv)
GB (1) GB1503301A (sv)
IL (1) IL50722A (sv)
IT (1) IT1066543B (sv)
LU (1) LU76026A1 (sv)
MX (1) MX145314A (sv)
NL (1) NL7611563A (sv)
SE (1) SE429108B (sv)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU575056B2 (en) * 1983-08-17 1988-07-21 Boc Group Plc, The Cathodic sputtering apparatus

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
FR2548589B1 (fr) * 1983-07-07 1987-02-20 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique
JPS6162117A (ja) * 1984-09-03 1986-03-31 Brother Ind Ltd キーボードの製造方法
FR2940321B1 (fr) * 2008-12-19 2011-12-23 Carewave Shielding Technologies Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique.
JP5969953B2 (ja) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (sv) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU575056B2 (en) * 1983-08-17 1988-07-21 Boc Group Plc, The Cathodic sputtering apparatus

Also Published As

Publication number Publication date
AT344501B (de) 1978-07-25
CA1077437A (en) 1980-05-13
BE847413A (nl) 1977-04-19
SE7611581L (sv) 1977-06-18
DK469976A (da) 1977-06-18
NL7611563A (nl) 1977-06-21
ATA776076A (de) 1977-11-15
CH617965A5 (en) 1980-06-30
AU2059876A (en) 1978-06-22
IL50722A (en) 1979-05-31
GB1503301A (en) 1978-03-08
JPS5275669A (en) 1977-06-24
FR2335615A1 (fr) 1977-07-15
FR2335615B1 (sv) 1981-12-04
SE429108B (sv) 1983-08-15
DD127637A5 (sv) 1977-10-05
DE2647149A1 (de) 1977-06-30
MX145314A (es) 1982-01-27
JPS6035429B2 (ja) 1985-08-14
IL50722A0 (en) 1976-12-31
DK149926C (da) 1987-09-28
LU76026A1 (sv) 1978-05-16
DE2647149C2 (de) 1983-08-25
IT1066543B (it) 1985-03-12
DK149926B (da) 1986-10-27

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