DK469976A - Katodeforstovningsapparat - Google Patents

Katodeforstovningsapparat

Info

Publication number
DK469976A
DK469976A DK469976A DK469976A DK469976A DK 469976 A DK469976 A DK 469976A DK 469976 A DK469976 A DK 469976A DK 469976 A DK469976 A DK 469976A DK 469976 A DK469976 A DK 469976A
Authority
DK
Denmark
Prior art keywords
spray appliance
cathode spray
cathode
appliance
spray
Prior art date
Application number
DK469976A
Other languages
English (en)
Other versions
DK149926B (da
DK149926C (da
Inventor
M R Kuehnle
Original Assignee
Coulter Inf Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by Coulter Inf Systems Inc filed Critical Coulter Inf Systems Inc
Publication of DK469976A publication Critical patent/DK469976A/da
Publication of DK149926B publication Critical patent/DK149926B/da
Application granted granted Critical
Publication of DK149926C publication Critical patent/DK149926C/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3438Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DK469976A 1975-12-17 1976-10-19 Katodeforstoevningsapparat DK149926C (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64148175 1975-12-17
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus

Publications (3)

Publication Number Publication Date
DK469976A true DK469976A (da) 1977-06-18
DK149926B DK149926B (da) 1986-10-27
DK149926C DK149926C (da) 1987-09-28

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
DK469976A DK149926C (da) 1975-12-17 1976-10-19 Katodeforstoevningsapparat

Country Status (17)

Country Link
JP (1) JPS6035429B2 (da)
AT (1) AT344501B (da)
AU (1) AU511961B2 (da)
BE (1) BE847413A (da)
CA (1) CA1077437A (da)
CH (1) CH617965A5 (da)
DD (1) DD127637A5 (da)
DE (1) DE2647149C2 (da)
DK (1) DK149926C (da)
FR (1) FR2335615A1 (da)
GB (1) GB1503301A (da)
IL (1) IL50722A (da)
IT (1) IT1066543B (da)
LU (1) LU76026A1 (da)
MX (1) MX145314A (da)
NL (1) NL7611563A (da)
SE (1) SE429108B (da)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
FR2548589B1 (fr) * 1983-07-07 1987-02-20 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique
JPS6162117A (ja) * 1984-09-03 1986-03-31 Brother Ind Ltd キーボードの製造方法
FR2940321B1 (fr) * 2008-12-19 2011-12-23 Carewave Shielding Technologies Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique.
JP5969953B2 (ja) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (da) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma

Also Published As

Publication number Publication date
IL50722A0 (en) 1976-12-31
MX145314A (es) 1982-01-27
DE2647149C2 (de) 1983-08-25
SE429108B (sv) 1983-08-15
FR2335615B1 (da) 1981-12-04
NL7611563A (nl) 1977-06-21
DK149926B (da) 1986-10-27
LU76026A1 (da) 1978-05-16
AU2059876A (en) 1978-06-22
DD127637A5 (da) 1977-10-05
IT1066543B (it) 1985-03-12
GB1503301A (en) 1978-03-08
AU511961B2 (en) 1980-09-18
BE847413A (nl) 1977-04-19
IL50722A (en) 1979-05-31
DE2647149A1 (de) 1977-06-30
JPS6035429B2 (ja) 1985-08-14
AT344501B (de) 1978-07-25
FR2335615A1 (fr) 1977-07-15
ATA776076A (de) 1977-11-15
JPS5275669A (en) 1977-06-24
DK149926C (da) 1987-09-28
SE7611581L (sv) 1977-06-18
CH617965A5 (en) 1980-06-30
CA1077437A (en) 1980-05-13

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Legal Events

Date Code Title Description
PBP Patent lapsed