IL50722A - Cathode sputtering apparatus - Google Patents
Cathode sputtering apparatusInfo
- Publication number
- IL50722A IL50722A IL50722A IL5072276A IL50722A IL 50722 A IL50722 A IL 50722A IL 50722 A IL50722 A IL 50722A IL 5072276 A IL5072276 A IL 5072276A IL 50722 A IL50722 A IL 50722A
- Authority
- IL
- Israel
- Prior art keywords
- sputtering apparatus
- cathode sputtering
- cathode
- sputtering
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3438—Electrodes other than cathode
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Electrostatic Spraying Apparatus (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/641,481 US4014779A (en) | 1974-11-01 | 1975-12-17 | Sputtering apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL50722A0 IL50722A0 (en) | 1976-12-31 |
| IL50722A true IL50722A (en) | 1979-05-31 |
Family
ID=24572585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL50722A IL50722A (en) | 1975-12-17 | 1976-10-19 | Cathode sputtering apparatus |
Country Status (17)
| Country | Link |
|---|---|
| JP (1) | JPS6035429B2 (da) |
| AT (1) | AT344501B (da) |
| AU (1) | AU511961B2 (da) |
| BE (1) | BE847413A (da) |
| CA (1) | CA1077437A (da) |
| CH (1) | CH617965A5 (da) |
| DD (1) | DD127637A5 (da) |
| DE (1) | DE2647149C2 (da) |
| DK (1) | DK149926C (da) |
| FR (1) | FR2335615A1 (da) |
| GB (1) | GB1503301A (da) |
| IL (1) | IL50722A (da) |
| IT (1) | IT1066543B (da) |
| LU (1) | LU76026A1 (da) |
| MX (1) | MX145314A (da) |
| NL (1) | NL7611563A (da) |
| SE (1) | SE429108B (da) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4151059A (en) * | 1977-12-27 | 1979-04-24 | Coulter Stork U.S.A., Inc. | Method and apparatus for sputtering multiple cylinders simultaneously |
| FR2527233A1 (fr) * | 1982-05-24 | 1983-11-25 | Asu Composants Sa | Installation pour le depot d'un revetement sur des substrats |
| US4417968A (en) * | 1983-03-21 | 1983-11-29 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| FR2548589B1 (fr) * | 1983-07-07 | 1987-02-20 | Aerospatiale | Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique |
| US4443318A (en) * | 1983-08-17 | 1984-04-17 | Shatterproof Glass Corporation | Cathodic sputtering apparatus |
| EP0157991A1 (fr) * | 1984-04-10 | 1985-10-16 | INTERPATENT ANSTALT (INDELEC Abteilung) | Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique |
| JPS6162117A (ja) * | 1984-09-03 | 1986-03-31 | Brother Ind Ltd | キーボードの製造方法 |
| FR2940321B1 (fr) * | 2008-12-19 | 2011-12-23 | Carewave Shielding Technologies | Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique. |
| JP5969953B2 (ja) * | 2013-05-31 | 2016-08-17 | 株式会社神戸製鋼所 | 成膜装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL136984C (da) * | 1964-06-04 | |||
| DE2115590A1 (en) * | 1971-03-31 | 1972-10-05 | Leybold Heraeus Gmbh & Co Kg | Cathode sputtering device - has cathode with projecting rim |
| US3829373A (en) * | 1973-01-12 | 1974-08-13 | Coulter Information Systems | Thin film deposition apparatus using segmented target means |
| US3905887A (en) * | 1973-01-12 | 1975-09-16 | Coulter Information Systems | Thin film deposition method using segmented plasma |
-
1976
- 1976-10-18 MX MX166694A patent/MX145314A/es unknown
- 1976-10-19 AT AT776076A patent/AT344501B/de not_active IP Right Cessation
- 1976-10-19 BE BE171612A patent/BE847413A/xx not_active IP Right Cessation
- 1976-10-19 IL IL50722A patent/IL50722A/xx unknown
- 1976-10-19 GB GB43369/76A patent/GB1503301A/en not_active Expired
- 1976-10-19 JP JP51125438A patent/JPS6035429B2/ja not_active Expired
- 1976-10-19 SE SE7611581A patent/SE429108B/xx unknown
- 1976-10-19 LU LU76026A patent/LU76026A1/xx unknown
- 1976-10-19 CH CH1321176A patent/CH617965A5/fr not_active IP Right Cessation
- 1976-10-19 FR FR7631399A patent/FR2335615A1/fr active Granted
- 1976-10-19 DE DE2647149A patent/DE2647149C2/de not_active Expired
- 1976-10-19 CA CA263,664A patent/CA1077437A/en not_active Expired
- 1976-10-19 NL NL7611563A patent/NL7611563A/xx not_active Application Discontinuation
- 1976-10-19 DK DK469976A patent/DK149926C/da not_active IP Right Cessation
- 1976-10-19 IT IT51804/76A patent/IT1066543B/it active
- 1976-10-22 DD DD195409A patent/DD127637A5/xx unknown
- 1976-12-16 AU AU20598/76A patent/AU511961B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2647149A1 (de) | 1977-06-30 |
| IT1066543B (it) | 1985-03-12 |
| JPS5275669A (en) | 1977-06-24 |
| DE2647149C2 (de) | 1983-08-25 |
| DK149926C (da) | 1987-09-28 |
| CA1077437A (en) | 1980-05-13 |
| FR2335615A1 (fr) | 1977-07-15 |
| FR2335615B1 (da) | 1981-12-04 |
| DK469976A (da) | 1977-06-18 |
| DD127637A5 (da) | 1977-10-05 |
| AU2059876A (en) | 1978-06-22 |
| MX145314A (es) | 1982-01-27 |
| CH617965A5 (en) | 1980-06-30 |
| BE847413A (nl) | 1977-04-19 |
| SE7611581L (sv) | 1977-06-18 |
| AT344501B (de) | 1978-07-25 |
| IL50722A0 (en) | 1976-12-31 |
| JPS6035429B2 (ja) | 1985-08-14 |
| DK149926B (da) | 1986-10-27 |
| ATA776076A (de) | 1977-11-15 |
| GB1503301A (en) | 1978-03-08 |
| SE429108B (sv) | 1983-08-15 |
| NL7611563A (nl) | 1977-06-21 |
| LU76026A1 (da) | 1978-05-16 |
| AU511961B2 (en) | 1980-09-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1550890A (en) | Sprayyed cathodes | |
| JPS5256084A (en) | Cathodic spattering apparatus | |
| JPS524959A (en) | Screwwfixing apparatus | |
| GB1553367A (en) | Activated cathode | |
| GB2002036A (en) | Cathode sputtering apparatus | |
| AU501490B2 (en) | Electrowinning | |
| CA1020983A (en) | Load-retaining apparatus | |
| JPS5221762A (en) | Magnetron | |
| GB1555810A (en) | Electricalconnector apparatus | |
| GB1538166A (en) | Chlorella-culturing apparatus | |
| JPS51128859A (en) | Electrode | |
| IL50722A (en) | Cathode sputtering apparatus | |
| AU502496B2 (en) | Ion-nitriding apparatus | |
| JPS51111446A (en) | Plasma tobch | |
| CA1025675A (en) | Tube-driving apparatus | |
| JPS51121663A (en) | Takeeup apparatus | |
| JPS5228117A (en) | Antiiearthquake apparatus | |
| SU657784A1 (ru) | Початкоотдел ющее устройство | |
| JPS5267737A (en) | Electrode | |
| JPS5252071A (en) | Spindleenut apparatus | |
| SU590375A1 (ru) | Анодное устройство | |
| SU617262A1 (ru) | Устройство дл изготовлени изделий | |
| SU625653A1 (ru) | Початкоотдел ющий аппарат | |
| IL50535A0 (en) | Substituted tetrahydroiminobenzo(b)thien-4-ylureas | |
| ZA765655B (en) | Substituted tetrahydroiminobenzo(b)thien-4-ylureas |