JPS5275669A - Spattering apparatus - Google Patents

Spattering apparatus

Info

Publication number
JPS5275669A
JPS5275669A JP51125438A JP12543876A JPS5275669A JP S5275669 A JPS5275669 A JP S5275669A JP 51125438 A JP51125438 A JP 51125438A JP 12543876 A JP12543876 A JP 12543876A JP S5275669 A JPS5275669 A JP S5275669A
Authority
JP
Japan
Prior art keywords
spattering apparatus
spattering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51125438A
Other languages
Japanese (ja)
Other versions
JPS6035429B2 (en
Inventor
Rudorufu Kuenru Manfuretsudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KUURUTAA INFUOOMEESHIYON SHISUTEMUZU Inc
Coulter Information Systems Inc
Original Assignee
KUURUTAA INFUOOMEESHIYON SHISUTEMUZU Inc
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by KUURUTAA INFUOOMEESHIYON SHISUTEMUZU Inc, Coulter Information Systems Inc filed Critical KUURUTAA INFUOOMEESHIYON SHISUTEMUZU Inc
Publication of JPS5275669A publication Critical patent/JPS5275669A/en
Publication of JPS6035429B2 publication Critical patent/JPS6035429B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3438Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP51125438A 1975-12-17 1976-10-19 sputtering equipment Expired JPS6035429B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US641481 1975-12-17
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus

Publications (2)

Publication Number Publication Date
JPS5275669A true JPS5275669A (en) 1977-06-24
JPS6035429B2 JPS6035429B2 (en) 1985-08-14

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51125438A Expired JPS6035429B2 (en) 1975-12-17 1976-10-19 sputtering equipment

Country Status (17)

Country Link
JP (1) JPS6035429B2 (en)
AT (1) AT344501B (en)
AU (1) AU511961B2 (en)
BE (1) BE847413A (en)
CA (1) CA1077437A (en)
CH (1) CH617965A5 (en)
DD (1) DD127637A5 (en)
DE (1) DE2647149C2 (en)
DK (1) DK149926C (en)
FR (1) FR2335615A1 (en)
GB (1) GB1503301A (en)
IL (1) IL50722A (en)
IT (1) IT1066543B (en)
LU (1) LU76026A1 (en)
MX (1) MX145314A (en)
NL (1) NL7611563A (en)
SE (1) SE429108B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (en) * 1982-05-24 1983-11-25 Asu Composants Sa Plant for depositing coating on substrate - with removable walls for introducing substrates and target
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
FR2548589B1 (en) * 1983-07-07 1987-02-20 Aerospatiale METHOD AND DEVICE FOR METALLIC IMPREGNATION OF A SUBSTRATE IN THE FORM OF A PATCH OF FIBERS CONDUCTING ELECTRIC CURRENT
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
EP0157991A1 (en) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Apparatus for the continuous and selective metallization of parts, especially for electronics
JPS6162117A (en) * 1984-09-03 1986-03-31 Brother Ind Ltd Keyboard
FR2940321B1 (en) * 2008-12-19 2011-12-23 Carewave Shielding Technologies VACUUM DEPOSITION MACHINE ON SUBSTRATE OF THIN LAYER MATERIALS BY CATHODIC SPRAYING.
JP5969953B2 (en) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 Deposition equipment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (en) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means

Also Published As

Publication number Publication date
LU76026A1 (en) 1978-05-16
DK149926B (en) 1986-10-27
MX145314A (en) 1982-01-27
DK149926C (en) 1987-09-28
DE2647149C2 (en) 1983-08-25
AU2059876A (en) 1978-06-22
AT344501B (en) 1978-07-25
NL7611563A (en) 1977-06-21
DK469976A (en) 1977-06-18
AU511961B2 (en) 1980-09-18
SE429108B (en) 1983-08-15
CH617965A5 (en) 1980-06-30
DD127637A5 (en) 1977-10-05
CA1077437A (en) 1980-05-13
ATA776076A (en) 1977-11-15
BE847413A (en) 1977-04-19
DE2647149A1 (en) 1977-06-30
IT1066543B (en) 1985-03-12
JPS6035429B2 (en) 1985-08-14
FR2335615A1 (en) 1977-07-15
FR2335615B1 (en) 1981-12-04
SE7611581L (en) 1977-06-18
IL50722A (en) 1979-05-31
GB1503301A (en) 1978-03-08
IL50722A0 (en) 1976-12-31

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