FR2197301B1 - - Google Patents

Info

Publication number
FR2197301B1
FR2197301B1 FR7330716A FR7330716A FR2197301B1 FR 2197301 B1 FR2197301 B1 FR 2197301B1 FR 7330716 A FR7330716 A FR 7330716A FR 7330716 A FR7330716 A FR 7330716A FR 2197301 B1 FR2197301 B1 FR 2197301B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7330716A
Other versions
FR2197301A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of FR2197301A1 publication Critical patent/FR2197301A1/fr
Application granted granted Critical
Publication of FR2197301B1 publication Critical patent/FR2197301B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0571—Dual purpose resist, e.g. etch resist used as solder resist, solder resist used as plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
FR7330716A 1972-08-25 1973-08-24 Expired FR2197301B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1265872A CH576739A5 (fr) 1972-08-25 1972-08-25

Publications (2)

Publication Number Publication Date
FR2197301A1 FR2197301A1 (fr) 1974-03-22
FR2197301B1 true FR2197301B1 (fr) 1978-12-29

Family

ID=4385183

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7330716A Expired FR2197301B1 (fr) 1972-08-25 1973-08-24

Country Status (15)

Country Link
US (1) US3956043A (fr)
JP (1) JPS5513437B2 (fr)
AU (1) AU524785B2 (fr)
BE (1) BE804003A (fr)
CA (1) CA1007098A (fr)
CH (1) CH576739A5 (fr)
DD (1) DD105906A5 (fr)
DE (1) DE2342407C3 (fr)
FR (1) FR2197301B1 (fr)
GB (2) GB1446322A (fr)
IL (1) IL42978A (fr)
NL (1) NL170485C (fr)
SE (1) SE403879B (fr)
SU (1) SU634699A3 (fr)
ZA (1) ZA735831B (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179577A (en) * 1974-11-30 1979-12-18 Ciba-Geigy Corporation Polymerisable esters derived from a phenolic unsaturated ketone
US4181807A (en) * 1974-11-30 1980-01-01 Ciba-Geigy Corporation Polymerizable esters derived from a glycidyl ether of a phenolic unsaturated ketone
JPS5337120B2 (fr) * 1974-12-20 1978-10-06
CH613556A5 (en) * 1975-03-05 1979-09-28 Bbc Brown Boveri & Cie Process for photolithographic patterning of resistor tracks in hybrid circuits
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins
US4217168A (en) * 1977-09-16 1980-08-12 Data Recording Instruments Limited Magnetic core formed from laminations
CA1119447A (fr) * 1978-09-06 1982-03-09 John P. Vikesland Composition photoresistante a action positive, renfermant une resine d'urethane a liaison transversale, une resine epoxyde vulcanisee, et un photosensibilisateur
US4247616A (en) * 1979-07-27 1981-01-27 Minnesota Mining And Manufacturing Company Positive-acting photoresist composition
US4502957A (en) * 1981-11-24 1985-03-05 Ciba-Geigy Corporation Process for purifying organic solutions
DE3214807C1 (en) * 1982-04-21 1983-10-06 Siemens Ag Process for producing etched printed circuit boards
EP0099856B1 (fr) * 1982-06-24 1987-11-11 Ciba-Geigy Ag Composition de revêtement photopolymérisable, matière photopolymérisable et son utilisation
US4552815A (en) * 1982-10-01 1985-11-12 Ciba Geigy Corporation Prestressing elements coated with plastic material and process for making them
EP0142463B1 (fr) * 1983-08-24 1989-09-20 Ciba-Geigy Ag Procédé de préparation d'un préimprégné et matériaux composites qui en sont renforcés
DE3412992A1 (de) * 1984-04-06 1985-10-24 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht
FR2566418A1 (fr) * 1984-06-22 1985-12-27 Ebauchesfabrik Eta Ag Procede d'assemblage de pieces par collage
ATE37889T1 (de) * 1984-06-29 1988-10-15 Siemens Ag Thermostabiles, durch bestrahlung vernetzbares polymersystem auf der basis von bisphenolen und epichlorhydrin sowie verfahren zu seiner verwendung.
US4828961A (en) * 1986-07-02 1989-05-09 W. R. Grace & Co.-Conn. Imaging process for forming ceramic electronic circuits
EP0281807B1 (fr) * 1987-03-09 1993-06-23 Siemens Nixdorf Informationssysteme Aktiengesellschaft Technique additive pour la fabrication de câblages multicouches
JP2530718B2 (ja) * 1989-06-13 1996-09-04 東レ株式会社 配電基盤用ポリエステルフィルム
US5074035A (en) * 1989-07-19 1991-12-24 Excello Circuits Method of making thin film laminate printed circuit
US5928839A (en) * 1992-05-15 1999-07-27 Morton International, Inc. Method of forming a multilayer printed circuit board and product thereof
TW290583B (fr) * 1993-10-14 1996-11-11 Alpha Metals Ltd
JP2775585B2 (ja) * 1994-03-25 1998-07-16 日本メクトロン株式会社 両面配線基板の製造法
US5693691A (en) * 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
US8580672B2 (en) 2011-10-25 2013-11-12 Globalfoundries Inc. Methods of forming bump structures that include a protection layer
CN114340160A (zh) * 2021-12-17 2022-04-12 鹤山市中富兴业电路有限公司 喷锡字符设计工艺

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3410824A (en) * 1965-03-19 1968-11-12 Ralph B. Atkinson Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer
US3418295A (en) * 1965-04-27 1968-12-24 Du Pont Polymers and their preparation
DE1572062C3 (de) * 1966-01-07 1974-11-07 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopierschicht
DE1572060C3 (de) * 1966-01-07 1974-10-24 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopierschicht
DE1618729A1 (de) * 1966-03-10 1972-03-30 North American Aviation Inc Verfahren zur Herstellung eines photopolymerisierbaren Epoxydharzes
NL6809002A (fr) * 1967-07-06 1969-01-08
FR2041471A5 (en) * 1969-04-25 1971-01-29 Cii Multi-layer circuits with thermosetting - dielectric
DE1937508C3 (de) * 1969-07-23 1974-01-10 Siemens Ag, 1000 Berlin U. 8000 Muenchen Verfahren zur Herstellung eines mit elektrischen Leitungsbahnen und/oder elektrischen Durchkontaktierungen versehenen Isolierstoffträgers
DE2059425A1 (de) * 1970-12-02 1972-06-22 Siemens Ag Partieller Aufbau von gedruckten Mehrlagenschaltungen
US3776729A (en) * 1971-02-22 1973-12-04 Ibm Photosensitive dielectric composition and process of using the same
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
JPS51447A (ja) * 1974-06-21 1976-01-06 Janome Sewing Machine Co Ltd Hitoharinuisochikakudokiko

Also Published As

Publication number Publication date
DE2342407B2 (de) 1978-11-23
AU5932073A (en) 1975-02-20
DD105906A5 (fr) 1974-05-12
AU524785B2 (en) 1982-10-07
NL7311716A (fr) 1974-02-27
SU634699A3 (ru) 1978-11-25
SE403879B (sv) 1978-09-04
DE2342407A1 (de) 1974-03-07
US3956043A (en) 1976-05-11
DE2342407C3 (de) 1981-10-29
NL170485B (nl) 1982-06-01
ZA735831B (en) 1974-10-30
BE804003A (fr) 1974-02-25
FR2197301A1 (fr) 1974-03-22
CH576739A5 (fr) 1976-06-15
GB1446322A (en) 1976-08-18
IL42978A (en) 1976-05-31
NL170485C (nl) 1982-11-01
JPS4959971A (fr) 1974-06-11
GB1446321A (en) 1976-08-18
IL42978A0 (en) 1973-11-28
JPS5513437B2 (fr) 1980-04-09
CA1007098A (en) 1977-03-22

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