FR2162565A1 - Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for - Google Patents
Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process forInfo
- Publication number
- FR2162565A1 FR2162565A1 FR7243666A FR7243666A FR2162565A1 FR 2162565 A1 FR2162565 A1 FR 2162565A1 FR 7243666 A FR7243666 A FR 7243666A FR 7243666 A FR7243666 A FR 7243666A FR 2162565 A1 FR2162565 A1 FR 2162565A1
- Authority
- FR
- France
- Prior art keywords
- pref
- tellurium
- diazo resin
- sodium hypochlorite
- photosensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052714 tellurium Inorganic materials 0.000 title abstract 4
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 title abstract 4
- 239000000463 material Substances 0.000 title abstract 3
- 239000011347 resin Substances 0.000 title abstract 3
- 229920005989 resin Polymers 0.000 title abstract 3
- 239000005708 Sodium hypochlorite Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 title abstract 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20586071A | 1971-12-08 | 1971-12-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2162565A1 true FR2162565A1 (en) | 1973-07-20 |
| FR2162565B1 FR2162565B1 (enrdf_load_stackoverflow) | 1977-01-14 |
Family
ID=22763936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7243666A Granted FR2162565A1 (en) | 1971-12-08 | 1972-12-07 | Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for |
Country Status (10)
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4379827A (en) * | 1971-12-08 | 1983-04-12 | Energy Conversion Devices, Inc. | Imaging structure with tellurium metal film and energy sensitive material thereon |
| GB1566802A (en) * | 1976-06-02 | 1980-05-08 | Agfa Gevaert | Photosensitive imaging material |
| US4357616A (en) * | 1979-03-26 | 1982-11-02 | Hitachi, Ltd. | Recording medium |
| JPS56122130A (en) * | 1980-02-28 | 1981-09-25 | Sharp Corp | Method for forming pattern of thin film transistor |
| US4544622A (en) * | 1984-07-19 | 1985-10-01 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist imaging system |
| JPH01122189A (ja) * | 1987-11-05 | 1989-05-15 | Kansai Paint Co Ltd | プリント配線板フォトレジスト用電着塗料組成物 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE679470C (de) * | 1934-03-15 | 1939-08-07 | Heidenhain Johannes Dr | Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten |
| GB1031978A (en) * | 1964-11-06 | 1966-06-02 | Standard Telephones Cables Ltd | Improvements in or relating to photolithographic masks |
| DE1904789A1 (de) * | 1969-01-31 | 1970-09-10 | Licentia Gmbh | Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten |
| DE2016056A1 (de) * | 1969-07-28 | 1971-02-11 | Dai Nippon Insatsu Kabushiki Kaisha, Tokio | Gefärbte transparente Photomaske |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE620097A (enrdf_load_stackoverflow) * | 1958-11-26 | |||
| US3549373A (en) * | 1966-03-19 | 1970-12-22 | Ricoh Kk | Negative-to-positive reversible copy sheet |
| US3645732A (en) * | 1969-05-19 | 1972-02-29 | Keuffel & Esser Co | Etching alcohol-soluble nylon with aqueous solutions |
| JPS5139121B2 (enrdf_load_stackoverflow) * | 1971-10-11 | 1976-10-26 | ||
| JPS5520186B2 (enrdf_load_stackoverflow) * | 1972-05-18 | 1980-05-31 |
-
0
- BE BE792434D patent/BE792434A/xx not_active IP Right Cessation
-
1972
- 1972-11-27 IL IL40940A patent/IL40940A0/xx unknown
- 1972-11-29 CA CA157,779A patent/CA976353A/en not_active Expired
- 1972-12-06 AU AU49711/72A patent/AU4971172A/en not_active Expired
- 1972-12-06 IT IT32645/72A patent/IT971665B/it active
- 1972-12-06 DE DE2259768A patent/DE2259768C2/de not_active Expired
- 1972-12-07 DD DD167514A patent/DD102824A5/xx unknown
- 1972-12-07 FR FR7243666A patent/FR2162565A1/fr active Granted
- 1972-12-08 NL NL7216710A patent/NL7216710A/xx unknown
- 1972-12-08 JP JP12261172A patent/JPS5729694B2/ja not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE679470C (de) * | 1934-03-15 | 1939-08-07 | Heidenhain Johannes Dr | Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten |
| GB1031978A (en) * | 1964-11-06 | 1966-06-02 | Standard Telephones Cables Ltd | Improvements in or relating to photolithographic masks |
| DE1904789A1 (de) * | 1969-01-31 | 1970-09-10 | Licentia Gmbh | Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten |
| DE2016056A1 (de) * | 1969-07-28 | 1971-02-11 | Dai Nippon Insatsu Kabushiki Kaisha, Tokio | Gefärbte transparente Photomaske |
Also Published As
| Publication number | Publication date |
|---|---|
| IL40940A0 (en) | 1973-01-30 |
| BE792434A (fr) | 1973-03-30 |
| DE2259768C2 (de) | 1984-01-26 |
| CA976353A (en) | 1975-10-21 |
| DD102824A5 (enrdf_load_stackoverflow) | 1973-12-20 |
| AU4971172A (en) | 1974-06-06 |
| NL7216710A (enrdf_load_stackoverflow) | 1973-06-13 |
| JPS4865927A (enrdf_load_stackoverflow) | 1973-09-10 |
| IT971665B (it) | 1974-05-10 |
| DE2259768A1 (de) | 1973-06-14 |
| FR2162565B1 (enrdf_load_stackoverflow) | 1977-01-14 |
| JPS5729694B2 (enrdf_load_stackoverflow) | 1982-06-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES402589A1 (es) | Un procedimiento para la produccion de una copia sobre un soporte. | |
| JPS533215A (en) | Photosensitive material developable by stripping and image formation method using this | |
| GB1286503A (en) | A method for producing images by flash exposure | |
| ES371051A1 (es) | Un procedimiento para formar imagenes. | |
| JPS5217815A (en) | Substrate and material using the same | |
| GB1407998A (en) | Method of producing an image in a layer of imaging material | |
| GB988869A (en) | Heat-copying process | |
| FR2162565A1 (en) | Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for | |
| JPS5225651A (en) | Process for fabricating an optical curved surface using a photopolymer izable adhesive | |
| JPS5546988A (en) | Thermal recording material | |
| SE8104565L (sv) | Forbettrat ljuskensligt material | |
| ES415572A1 (es) | Metodo para fabricar un articulo de pelicula electrofoto- grafica. | |
| GB1297171A (enrdf_load_stackoverflow) | ||
| FR2111356A5 (en) | Photographic material - not requiring a chemical development | |
| EP0297240A3 (en) | Process for the fabrication of a support for light sensitive material with an anti-coiling layer | |
| ES407613A1 (es) | Un procedimiento de formacion de imagen. | |
| US3746448A (en) | Apparatus for producing positive or negative images on a light activatable, thermally developable, diazosulfonate reproduction material | |
| DE3782555D1 (de) | Lichtempfindliches aufzeichnungs-material. | |
| JPS5276343A (en) | Method of manufacturing goods with abrasion resistant film | |
| GB1404837A (en) | Hologram | |
| JPS54153631A (en) | Relief image formation method | |
| GB1160694A (en) | Photographic Recording Methods and Materials | |
| JPS57155535A (en) | Image forming material | |
| JPS5742043A (en) | Photosensitive material | |
| GB1370695A (en) | Reflective elements |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |