IL40940A0 - Method and new material for producing microform - Google Patents

Method and new material for producing microform

Info

Publication number
IL40940A0
IL40940A0 IL40940A IL4094072A IL40940A0 IL 40940 A0 IL40940 A0 IL 40940A0 IL 40940 A IL40940 A IL 40940A IL 4094072 A IL4094072 A IL 4094072A IL 40940 A0 IL40940 A0 IL 40940A0
Authority
IL
Israel
Prior art keywords
new material
microform
producing
producing microform
new
Prior art date
Application number
IL40940A
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of IL40940A0 publication Critical patent/IL40940A0/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
IL40940A 1971-12-08 1972-11-27 Method and new material for producing microform IL40940A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20586071A 1971-12-08 1971-12-08

Publications (1)

Publication Number Publication Date
IL40940A0 true IL40940A0 (en) 1973-01-30

Family

ID=22763936

Family Applications (1)

Application Number Title Priority Date Filing Date
IL40940A IL40940A0 (en) 1971-12-08 1972-11-27 Method and new material for producing microform

Country Status (10)

Country Link
JP (1) JPS5729694B2 (en)
AU (1) AU4971172A (en)
BE (1) BE792434A (en)
CA (1) CA976353A (en)
DD (1) DD102824A5 (en)
DE (1) DE2259768C2 (en)
FR (1) FR2162565A1 (en)
IL (1) IL40940A0 (en)
IT (1) IT971665B (en)
NL (1) NL7216710A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4379827A (en) * 1971-12-08 1983-04-12 Energy Conversion Devices, Inc. Imaging structure with tellurium metal film and energy sensitive material thereon
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
US4357616A (en) * 1979-03-26 1982-11-02 Hitachi, Ltd. Recording medium
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
JPH01122189A (en) * 1987-11-05 1989-05-15 Kansai Paint Co Ltd Electrodeposition paint composition for printed wiring board photo-resist

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (en) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Process for the production of washout reliefs by tanning development of halosilver colloid layers
NL280795A (en) * 1958-11-26
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE1904789A1 (en) * 1969-01-31 1970-09-10 Licentia Gmbh Mask for mapping patterns on light-sensitive layers
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
JPS5022877B1 (en) * 1969-07-28 1975-08-02
JPS5139121B2 (en) * 1971-10-11 1976-10-26
JPS5520186B2 (en) * 1972-05-18 1980-05-31

Also Published As

Publication number Publication date
FR2162565B1 (en) 1977-01-14
CA976353A (en) 1975-10-21
NL7216710A (en) 1973-06-13
DE2259768C2 (en) 1984-01-26
JPS5729694B2 (en) 1982-06-24
DD102824A5 (en) 1973-12-20
FR2162565A1 (en) 1973-07-20
IT971665B (en) 1974-05-10
BE792434A (en) 1973-03-30
AU4971172A (en) 1974-06-06
JPS4865927A (en) 1973-09-10
DE2259768A1 (en) 1973-06-14

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