GB1031978A - Improvements in or relating to photolithographic masks - Google Patents

Improvements in or relating to photolithographic masks

Info

Publication number
GB1031978A
GB1031978A GB4529664A GB4529664A GB1031978A GB 1031978 A GB1031978 A GB 1031978A GB 4529664 A GB4529664 A GB 4529664A GB 4529664 A GB4529664 A GB 4529664A GB 1031978 A GB1031978 A GB 1031978A
Authority
GB
United Kingdom
Prior art keywords
relating
photolithographic masks
lead sulphide
photoresist
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4529664A
Inventor
Robert David Peacock
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB4529664A priority Critical patent/GB1031978A/en
Publication of GB1031978A publication Critical patent/GB1031978A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Abstract

Lead sulphide is evaporated on to one side of a glass plate under reduced pressure at a temperature below the melting point of lead sulphide. The lead sulphide layer is then coated with a photoresist.
GB4529664A 1964-11-06 1964-11-06 Improvements in or relating to photolithographic masks Expired GB1031978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB4529664A GB1031978A (en) 1964-11-06 1964-11-06 Improvements in or relating to photolithographic masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4529664A GB1031978A (en) 1964-11-06 1964-11-06 Improvements in or relating to photolithographic masks

Publications (1)

Publication Number Publication Date
GB1031978A true GB1031978A (en) 1966-06-02

Family

ID=10436669

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4529664A Expired GB1031978A (en) 1964-11-06 1964-11-06 Improvements in or relating to photolithographic masks

Country Status (1)

Country Link
GB (1) GB1031978A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2093930A1 (en) * 1970-06-01 1972-02-04 Ibm
FR2162514A1 (en) * 1971-12-08 1973-07-20 Energy Conversion Devices Inc
FR2162565A1 (en) * 1971-12-08 1973-07-20 Energy Conversion Devices Inc Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2093930A1 (en) * 1970-06-01 1972-02-04 Ibm
FR2162514A1 (en) * 1971-12-08 1973-07-20 Energy Conversion Devices Inc
FR2162565A1 (en) * 1971-12-08 1973-07-20 Energy Conversion Devices Inc Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for

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