NL7216710A - - Google Patents
Info
- Publication number
- NL7216710A NL7216710A NL7216710A NL7216710A NL7216710A NL 7216710 A NL7216710 A NL 7216710A NL 7216710 A NL7216710 A NL 7216710A NL 7216710 A NL7216710 A NL 7216710A NL 7216710 A NL7216710 A NL 7216710A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20586071A | 1971-12-08 | 1971-12-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7216710A true NL7216710A (xx) | 1973-06-13 |
Family
ID=22763936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7216710A NL7216710A (xx) | 1971-12-08 | 1972-12-08 |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5729694B2 (xx) |
| AU (1) | AU4971172A (xx) |
| BE (1) | BE792434A (xx) |
| CA (1) | CA976353A (xx) |
| DD (1) | DD102824A5 (xx) |
| DE (1) | DE2259768C2 (xx) |
| FR (1) | FR2162565A1 (xx) |
| IL (1) | IL40940A0 (xx) |
| IT (1) | IT971665B (xx) |
| NL (1) | NL7216710A (xx) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4379827A (en) * | 1971-12-08 | 1983-04-12 | Energy Conversion Devices, Inc. | Imaging structure with tellurium metal film and energy sensitive material thereon |
| GB1566802A (en) * | 1976-06-02 | 1980-05-08 | Agfa Gevaert | Photosensitive imaging material |
| US4357616A (en) * | 1979-03-26 | 1982-11-02 | Hitachi, Ltd. | Recording medium |
| JPS56122130A (en) * | 1980-02-28 | 1981-09-25 | Sharp Corp | Method for forming pattern of thin film transistor |
| US4544622A (en) * | 1984-07-19 | 1985-10-01 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist imaging system |
| JPH01122189A (ja) * | 1987-11-05 | 1989-05-15 | Kansai Paint Co Ltd | プリント配線板フォトレジスト用電着塗料組成物 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE679470C (de) * | 1934-03-15 | 1939-08-07 | Heidenhain Johannes Dr | Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten |
| NL280795A (xx) * | 1958-11-26 | |||
| GB1031978A (en) * | 1964-11-06 | 1966-06-02 | Standard Telephones Cables Ltd | Improvements in or relating to photolithographic masks |
| US3549373A (en) * | 1966-03-19 | 1970-12-22 | Ricoh Kk | Negative-to-positive reversible copy sheet |
| DE1904789A1 (de) * | 1969-01-31 | 1970-09-10 | Licentia Gmbh | Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten |
| US3645732A (en) * | 1969-05-19 | 1972-02-29 | Keuffel & Esser Co | Etching alcohol-soluble nylon with aqueous solutions |
| JPS5022877B1 (xx) * | 1969-07-28 | 1975-08-02 | ||
| JPS5139121B2 (xx) * | 1971-10-11 | 1976-10-26 | ||
| JPS5520186B2 (xx) * | 1972-05-18 | 1980-05-31 |
-
0
- BE BE792434D patent/BE792434A/xx not_active IP Right Cessation
-
1972
- 1972-11-27 IL IL40940A patent/IL40940A0/xx unknown
- 1972-11-29 CA CA157,779A patent/CA976353A/en not_active Expired
- 1972-12-06 AU AU49711/72A patent/AU4971172A/en not_active Expired
- 1972-12-06 IT IT32645/72A patent/IT971665B/it active
- 1972-12-06 DE DE2259768A patent/DE2259768C2/de not_active Expired
- 1972-12-07 FR FR7243666A patent/FR2162565A1/fr active Granted
- 1972-12-07 DD DD167514A patent/DD102824A5/xx unknown
- 1972-12-08 NL NL7216710A patent/NL7216710A/xx unknown
- 1972-12-08 JP JP12261172A patent/JPS5729694B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2259768A1 (de) | 1973-06-14 |
| DD102824A5 (xx) | 1973-12-20 |
| BE792434A (fr) | 1973-03-30 |
| CA976353A (en) | 1975-10-21 |
| JPS5729694B2 (xx) | 1982-06-24 |
| IT971665B (it) | 1974-05-10 |
| DE2259768C2 (de) | 1984-01-26 |
| AU4971172A (en) | 1974-06-06 |
| IL40940A0 (en) | 1973-01-30 |
| JPS4865927A (xx) | 1973-09-10 |
| FR2162565B1 (xx) | 1977-01-14 |
| FR2162565A1 (en) | 1973-07-20 |