FR2162565A1 - Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for - Google Patents

Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for

Info

Publication number
FR2162565A1
FR2162565A1 FR7243666A FR7243666A FR2162565A1 FR 2162565 A1 FR2162565 A1 FR 2162565A1 FR 7243666 A FR7243666 A FR 7243666A FR 7243666 A FR7243666 A FR 7243666A FR 2162565 A1 FR2162565 A1 FR 2162565A1
Authority
FR
France
Prior art keywords
pref
tellurium
diazo resin
sodium hypochlorite
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7243666A
Other languages
English (en)
French (fr)
Other versions
FR2162565B1 (xx
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of FR2162565A1 publication Critical patent/FR2162565A1/fr
Application granted granted Critical
Publication of FR2162565B1 publication Critical patent/FR2162565B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
FR7243666A 1971-12-08 1972-12-07 Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for Granted FR2162565A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20586071A 1971-12-08 1971-12-08

Publications (2)

Publication Number Publication Date
FR2162565A1 true FR2162565A1 (en) 1973-07-20
FR2162565B1 FR2162565B1 (xx) 1977-01-14

Family

ID=22763936

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7243666A Granted FR2162565A1 (en) 1971-12-08 1972-12-07 Photosensitive material - diazo resin on tellurium coated support developed with sodium hypochlorite in fast process for

Country Status (10)

Country Link
JP (1) JPS5729694B2 (xx)
AU (1) AU4971172A (xx)
BE (1) BE792434A (xx)
CA (1) CA976353A (xx)
DD (1) DD102824A5 (xx)
DE (1) DE2259768C2 (xx)
FR (1) FR2162565A1 (xx)
IL (1) IL40940A0 (xx)
IT (1) IT971665B (xx)
NL (1) NL7216710A (xx)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4379827A (en) * 1971-12-08 1983-04-12 Energy Conversion Devices, Inc. Imaging structure with tellurium metal film and energy sensitive material thereon
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
US4357616A (en) * 1979-03-26 1982-11-02 Hitachi, Ltd. Recording medium
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
JPH01122189A (ja) * 1987-11-05 1989-05-15 Kansai Paint Co Ltd プリント配線板フォトレジスト用電着塗料組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (de) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
DE1904789A1 (de) * 1969-01-31 1970-09-10 Licentia Gmbh Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten
DE2016056A1 (de) * 1969-07-28 1971-02-11 Dai Nippon Insatsu Kabushiki Kaisha, Tokio Gefärbte transparente Photomaske

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL280795A (xx) * 1958-11-26
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
JPS5139121B2 (xx) * 1971-10-11 1976-10-26
JPS5520186B2 (xx) * 1972-05-18 1980-05-31

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (de) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
DE1904789A1 (de) * 1969-01-31 1970-09-10 Licentia Gmbh Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten
DE2016056A1 (de) * 1969-07-28 1971-02-11 Dai Nippon Insatsu Kabushiki Kaisha, Tokio Gefärbte transparente Photomaske

Also Published As

Publication number Publication date
BE792434A (fr) 1973-03-30
DD102824A5 (xx) 1973-12-20
DE2259768C2 (de) 1984-01-26
CA976353A (en) 1975-10-21
FR2162565B1 (xx) 1977-01-14
AU4971172A (en) 1974-06-06
JPS4865927A (xx) 1973-09-10
JPS5729694B2 (xx) 1982-06-24
IT971665B (it) 1974-05-10
NL7216710A (xx) 1973-06-13
DE2259768A1 (de) 1973-06-14
IL40940A0 (en) 1973-01-30

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Legal Events

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ST Notification of lapse