JPS4865927A - - Google Patents

Info

Publication number
JPS4865927A
JPS4865927A JP47122611A JP12261172A JPS4865927A JP S4865927 A JPS4865927 A JP S4865927A JP 47122611 A JP47122611 A JP 47122611A JP 12261172 A JP12261172 A JP 12261172A JP S4865927 A JPS4865927 A JP S4865927A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47122611A
Other languages
Japanese (ja)
Other versions
JPS5729694B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4865927A publication Critical patent/JPS4865927A/ja
Publication of JPS5729694B2 publication Critical patent/JPS5729694B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP12261172A 1971-12-08 1972-12-08 Expired JPS5729694B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20586071A 1971-12-08 1971-12-08

Publications (2)

Publication Number Publication Date
JPS4865927A true JPS4865927A (enrdf_load_stackoverflow) 1973-09-10
JPS5729694B2 JPS5729694B2 (enrdf_load_stackoverflow) 1982-06-24

Family

ID=22763936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12261172A Expired JPS5729694B2 (enrdf_load_stackoverflow) 1971-12-08 1972-12-08

Country Status (10)

Country Link
JP (1) JPS5729694B2 (enrdf_load_stackoverflow)
AU (1) AU4971172A (enrdf_load_stackoverflow)
BE (1) BE792434A (enrdf_load_stackoverflow)
CA (1) CA976353A (enrdf_load_stackoverflow)
DD (1) DD102824A5 (enrdf_load_stackoverflow)
DE (1) DE2259768C2 (enrdf_load_stackoverflow)
FR (1) FR2162565A1 (enrdf_load_stackoverflow)
IL (1) IL40940A0 (enrdf_load_stackoverflow)
IT (1) IT971665B (enrdf_load_stackoverflow)
NL (1) NL7216710A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502925A (enrdf_load_stackoverflow) * 1973-04-12 1975-01-13

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
US4357616A (en) * 1979-03-26 1982-11-02 Hitachi, Ltd. Recording medium
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
JPH01122189A (ja) * 1987-11-05 1989-05-15 Kansai Paint Co Ltd プリント配線板フォトレジスト用電着塗料組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2023083A1 (de) * 1969-05-19 1970-11-26 Keuffel & Esser Co Lichtempfindliches aetzfaehiges Kopiermaterial
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
JPS4845302A (enrdf_load_stackoverflow) * 1971-10-11 1973-06-28
JPS4915489A (enrdf_load_stackoverflow) * 1972-05-18 1974-02-09

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (de) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten
BE620097A (enrdf_load_stackoverflow) * 1958-11-26
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
DE1904789A1 (de) * 1969-01-31 1970-09-10 Licentia Gmbh Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten
JPS5022877B1 (enrdf_load_stackoverflow) * 1969-07-28 1975-08-02

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE2023083A1 (de) * 1969-05-19 1970-11-26 Keuffel & Esser Co Lichtempfindliches aetzfaehiges Kopiermaterial
JPS4845302A (enrdf_load_stackoverflow) * 1971-10-11 1973-06-28
JPS4915489A (enrdf_load_stackoverflow) * 1972-05-18 1974-02-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502925A (enrdf_load_stackoverflow) * 1973-04-12 1975-01-13

Also Published As

Publication number Publication date
IL40940A0 (en) 1973-01-30
BE792434A (fr) 1973-03-30
DE2259768C2 (de) 1984-01-26
CA976353A (en) 1975-10-21
DD102824A5 (enrdf_load_stackoverflow) 1973-12-20
AU4971172A (en) 1974-06-06
NL7216710A (enrdf_load_stackoverflow) 1973-06-13
FR2162565A1 (en) 1973-07-20
IT971665B (it) 1974-05-10
DE2259768A1 (de) 1973-06-14
FR2162565B1 (enrdf_load_stackoverflow) 1977-01-14
JPS5729694B2 (enrdf_load_stackoverflow) 1982-06-24

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