FI862041A - Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. - Google Patents

Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. Download PDF

Info

Publication number
FI862041A
FI862041A FI862041A FI862041A FI862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A
Authority
FI
Finland
Prior art keywords
layer
foil
vaermebestaigiga
strukturerade
skikt
Prior art date
Application number
FI862041A
Other languages
English (en)
Other versions
FI82866C (fi
FI862041A0 (fi
FI82866B (fi
Inventor
Hellmut Ahne
Winfried Plundrich
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of FI862041A0 publication Critical patent/FI862041A0/fi
Publication of FI862041A publication Critical patent/FI862041A/fi
Application granted granted Critical
Publication of FI82866B publication Critical patent/FI82866B/fi
Publication of FI82866C publication Critical patent/FI82866C/fi

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/42—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/487—Polyethers containing cyclic groups
    • C08G18/4879—Polyethers containing cyclic groups containing aromatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/36—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of phenols with aldehydes or ketones
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K38/00—Medicinal preparations containing peptides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Prostheses (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FI862041A 1985-06-24 1986-05-15 Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. FI82866C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3522507 1985-06-24
DE3522507 1985-06-24

Publications (4)

Publication Number Publication Date
FI862041A0 FI862041A0 (fi) 1986-05-15
FI862041A true FI862041A (fi) 1986-12-25
FI82866B FI82866B (fi) 1991-01-15
FI82866C FI82866C (fi) 1991-04-25

Family

ID=6274005

Family Applications (1)

Application Number Title Priority Date Filing Date
FI862041A FI82866C (fi) 1985-06-24 1986-05-15 Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning.

Country Status (11)

Country Link
US (1) US4828948A (fi)
EP (1) EP0206159B1 (fi)
JP (1) JPS61296353A (fi)
KR (1) KR940009022B1 (fi)
AT (1) ATE60927T1 (fi)
CA (1) CA1309056C (fi)
DE (1) DE3677549D1 (fi)
DK (1) DK164064C (fi)
FI (1) FI82866C (fi)
HK (1) HK49192A (fi)
SG (1) SG39192G (fi)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0321820A3 (de) * 1987-12-23 1991-01-23 Siemens Aktiengesellschaft Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern
EP0321821A3 (de) * 1987-12-23 1991-01-16 Siemens Aktiengesellschaft Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern
KR920002258Y1 (ko) * 1989-12-18 1992-04-06 구자명 제침기(staple remover)
CA2048164C (en) * 1990-08-02 1998-11-10 Kurt G. Olson Photoimageable electrodepositable photoresist composition
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
US5268260A (en) * 1991-10-22 1993-12-07 International Business Machines Corporation Photoresist develop and strip solvent compositions and method for their use
US5849271A (en) * 1995-06-07 1998-12-15 The Procter & Gamble Company Oral compositions
JPH0985489A (ja) * 1995-09-20 1997-03-31 Sony Corp はんだ及びはんだ付け法
US6048375A (en) * 1998-12-16 2000-04-11 Norton Company Coated abrasive
TWI384013B (zh) * 2008-10-08 2013-02-01 Eternal Chemical Co Ltd 感光型聚醯亞胺

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3694415A (en) * 1970-07-15 1972-09-26 Kiyoshi Honda Coating resinous composition
US3776889A (en) * 1971-01-07 1973-12-04 Powers Chemco Inc Allyl carbamate esters of hydroxy-containing polymers
JPS573686B2 (fi) * 1974-02-01 1982-01-22
US4139436A (en) * 1977-02-07 1979-02-13 The Goodyear Tire & Rubber Company Polyetherurethane composition and polymer prepared by photopolymerization
US4233425A (en) * 1978-11-15 1980-11-11 The Dow Chemical Company Addition polymerizable polyethers having pendant ethylenically unsaturated urethane groups
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4246391A (en) * 1979-06-26 1981-01-20 Union Carbide Corporation Procedure for production of lower viscosity radiation-curable acrylated urethanes
US4320221A (en) * 1980-12-12 1982-03-16 The Dow Chemical Company Addition polymerizable isocyanate-polyol anaerobic adhesives
US4436806A (en) * 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups

Also Published As

Publication number Publication date
EP0206159A2 (de) 1986-12-30
KR870000177A (ko) 1987-02-16
FI82866C (fi) 1991-04-25
JPS61296353A (ja) 1986-12-27
DK164064C (da) 1992-09-28
DK293186A (da) 1986-12-25
CA1309056C (en) 1992-10-20
DK293186D0 (da) 1986-06-23
FI862041A0 (fi) 1986-05-15
SG39192G (en) 1992-05-22
KR940009022B1 (ko) 1994-09-29
DK164064B (da) 1992-05-04
EP0206159A3 (en) 1988-05-11
HK49192A (en) 1992-07-10
US4828948A (en) 1989-05-09
ATE60927T1 (de) 1991-03-15
EP0206159B1 (de) 1991-02-20
FI82866B (fi) 1991-01-15
DE3677549D1 (de) 1991-03-28

Similar Documents

Publication Publication Date Title
FR2585209B1 (fr) Plaquettes a circuits traces par fil et leur procede de fabrication
FI862041A0 (fi) Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning.
JPS5635131A (en) Producing high heattstability relief structure
EP0557138A2 (en) Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed circuit boards
US6461527B1 (en) Method for fabricating a flexible printed circuit board with access on both sides
ATE33189T1 (de) Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen.
FI873945A (fi) Foerfarande foer framstaellning av vaermebestaendiga strukturerade skikt.
EP0304969A3 (en) Process for forming a pattern film
ATE32957T1 (de) Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen.
JPH0719948B2 (ja) ガラス基板にパターン状金属膜を被着する方法
KR100434072B1 (ko) 레이저를 이용한 인쇄회로기판의 관통홀 형성방법
JPH03226392A (ja) レーザ加工方法
EP0178654A3 (en) Method of manufacturing a semiconductor device comprising a method of patterning an organic material
JPH0241423B2 (fi)
JPH05251864A (ja) 多層配線基板のパターン形成方法
JP2516142B2 (ja) 多層基板およびその製造方法
JPS5587148A (en) Correction method for light shielding mask
JPS554706A (en) Production of magnetic head
JPS54134603A (en) Production of information recording medium
JPS5688319A (en) Method for forming film pattern
JPS63169791A (ja) 配線パタ−ンの形成方法
JPS63261780A (ja) 印刷配線板の製造方法
JPH04178503A (ja) 歪センサーの製造方法
JPS56169235A (en) Manufacture of original optical disk
DE3013099A1 (de) Verfahren zur herstellung von informationstraegern

Legal Events

Date Code Title Description
MM Patent lapsed
MM Patent lapsed

Owner name: SIEMENS AKTIENGESELLSCHAFT