FI862041A - Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. - Google Patents
Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. Download PDFInfo
- Publication number
- FI862041A FI862041A FI862041A FI862041A FI862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A FI 862041 A FI862041 A FI 862041A
- Authority
- FI
- Finland
- Prior art keywords
- layer
- foil
- vaermebestaigiga
- strukturerade
- skikt
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/42—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/487—Polyethers containing cyclic groups
- C08G18/4879—Polyethers containing cyclic groups containing aromatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
- C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/36—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of phenols with aldehydes or ketones
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K38/00—Medicinal preparations containing peptides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Laminated Bodies (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Prostheses (AREA)
- Polyurethanes Or Polyureas (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3522507 | 1985-06-24 | ||
DE3522507 | 1985-06-24 |
Publications (4)
Publication Number | Publication Date |
---|---|
FI862041A0 FI862041A0 (fi) | 1986-05-15 |
FI862041A true FI862041A (fi) | 1986-12-25 |
FI82866B FI82866B (fi) | 1991-01-15 |
FI82866C FI82866C (fi) | 1991-04-25 |
Family
ID=6274005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI862041A FI82866C (fi) | 1985-06-24 | 1986-05-15 | Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. |
Country Status (11)
Country | Link |
---|---|
US (1) | US4828948A (fi) |
EP (1) | EP0206159B1 (fi) |
JP (1) | JPS61296353A (fi) |
KR (1) | KR940009022B1 (fi) |
AT (1) | ATE60927T1 (fi) |
CA (1) | CA1309056C (fi) |
DE (1) | DE3677549D1 (fi) |
DK (1) | DK164064C (fi) |
FI (1) | FI82866C (fi) |
HK (1) | HK49192A (fi) |
SG (1) | SG39192G (fi) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0321820A3 (de) * | 1987-12-23 | 1991-01-23 | Siemens Aktiengesellschaft | Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern |
EP0321821A3 (de) * | 1987-12-23 | 1991-01-16 | Siemens Aktiengesellschaft | Flüssiges, strahlenhärtbares Harz zur Sekundärbeschichtung von Lichtwellenleitern |
KR920002258Y1 (ko) * | 1989-12-18 | 1992-04-06 | 구자명 | 제침기(staple remover) |
CA2048164C (en) * | 1990-08-02 | 1998-11-10 | Kurt G. Olson | Photoimageable electrodepositable photoresist composition |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
US5268260A (en) * | 1991-10-22 | 1993-12-07 | International Business Machines Corporation | Photoresist develop and strip solvent compositions and method for their use |
US5849271A (en) * | 1995-06-07 | 1998-12-15 | The Procter & Gamble Company | Oral compositions |
JPH0985489A (ja) * | 1995-09-20 | 1997-03-31 | Sony Corp | はんだ及びはんだ付け法 |
US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
TWI384013B (zh) * | 2008-10-08 | 2013-02-01 | Eternal Chemical Co Ltd | 感光型聚醯亞胺 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3694415A (en) * | 1970-07-15 | 1972-09-26 | Kiyoshi Honda | Coating resinous composition |
US3776889A (en) * | 1971-01-07 | 1973-12-04 | Powers Chemco Inc | Allyl carbamate esters of hydroxy-containing polymers |
JPS573686B2 (fi) * | 1974-02-01 | 1982-01-22 | ||
US4139436A (en) * | 1977-02-07 | 1979-02-13 | The Goodyear Tire & Rubber Company | Polyetherurethane composition and polymer prepared by photopolymerization |
US4233425A (en) * | 1978-11-15 | 1980-11-11 | The Dow Chemical Company | Addition polymerizable polyethers having pendant ethylenically unsaturated urethane groups |
US4228232A (en) * | 1979-02-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing ethylenically unsaturated oligomers |
US4246391A (en) * | 1979-06-26 | 1981-01-20 | Union Carbide Corporation | Procedure for production of lower viscosity radiation-curable acrylated urethanes |
US4320221A (en) * | 1980-12-12 | 1982-03-16 | The Dow Chemical Company | Addition polymerizable isocyanate-polyol anaerobic adhesives |
US4436806A (en) * | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
-
1986
- 1986-05-15 FI FI862041A patent/FI82866C/fi not_active IP Right Cessation
- 1986-06-12 DE DE8686108069T patent/DE3677549D1/de not_active Expired - Fee Related
- 1986-06-12 AT AT86108069T patent/ATE60927T1/de not_active IP Right Cessation
- 1986-06-12 EP EP86108069A patent/EP0206159B1/de not_active Expired - Lifetime
- 1986-06-20 JP JP61144674A patent/JPS61296353A/ja active Pending
- 1986-06-23 DK DK293186A patent/DK164064C/da not_active IP Right Cessation
- 1986-06-23 CA CA000512150A patent/CA1309056C/en not_active Expired - Fee Related
- 1986-06-24 KR KR1019860005026A patent/KR940009022B1/ko active IP Right Grant
- 1986-06-24 US US06/877,872 patent/US4828948A/en not_active Expired - Fee Related
-
1992
- 1992-04-08 SG SG391/92A patent/SG39192G/en unknown
- 1992-07-02 HK HK491/92A patent/HK49192A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
EP0206159A2 (de) | 1986-12-30 |
KR870000177A (ko) | 1987-02-16 |
FI82866C (fi) | 1991-04-25 |
JPS61296353A (ja) | 1986-12-27 |
DK164064C (da) | 1992-09-28 |
DK293186A (da) | 1986-12-25 |
CA1309056C (en) | 1992-10-20 |
DK293186D0 (da) | 1986-06-23 |
FI862041A0 (fi) | 1986-05-15 |
SG39192G (en) | 1992-05-22 |
KR940009022B1 (ko) | 1994-09-29 |
DK164064B (da) | 1992-05-04 |
EP0206159A3 (en) | 1988-05-11 |
HK49192A (en) | 1992-07-10 |
US4828948A (en) | 1989-05-09 |
ATE60927T1 (de) | 1991-03-15 |
EP0206159B1 (de) | 1991-02-20 |
FI82866B (fi) | 1991-01-15 |
DE3677549D1 (de) | 1991-03-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2585209B1 (fr) | Plaquettes a circuits traces par fil et leur procede de fabrication | |
FI862041A0 (fi) | Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning. | |
JPS5635131A (en) | Producing high heattstability relief structure | |
EP0557138A2 (en) | Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed circuit boards | |
US6461527B1 (en) | Method for fabricating a flexible printed circuit board with access on both sides | |
ATE33189T1 (de) | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen. | |
FI873945A (fi) | Foerfarande foer framstaellning av vaermebestaendiga strukturerade skikt. | |
EP0304969A3 (en) | Process for forming a pattern film | |
ATE32957T1 (de) | Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen. | |
JPH0719948B2 (ja) | ガラス基板にパターン状金属膜を被着する方法 | |
KR100434072B1 (ko) | 레이저를 이용한 인쇄회로기판의 관통홀 형성방법 | |
JPH03226392A (ja) | レーザ加工方法 | |
EP0178654A3 (en) | Method of manufacturing a semiconductor device comprising a method of patterning an organic material | |
JPH0241423B2 (fi) | ||
JPH05251864A (ja) | 多層配線基板のパターン形成方法 | |
JP2516142B2 (ja) | 多層基板およびその製造方法 | |
JPS5587148A (en) | Correction method for light shielding mask | |
JPS554706A (en) | Production of magnetic head | |
JPS54134603A (en) | Production of information recording medium | |
JPS5688319A (en) | Method for forming film pattern | |
JPS63169791A (ja) | 配線パタ−ンの形成方法 | |
JPS63261780A (ja) | 印刷配線板の製造方法 | |
JPH04178503A (ja) | 歪センサーの製造方法 | |
JPS56169235A (en) | Manufacture of original optical disk | |
DE3013099A1 (de) | Verfahren zur herstellung von informationstraegern |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM | Patent lapsed | ||
MM | Patent lapsed |
Owner name: SIEMENS AKTIENGESELLSCHAFT |