FI84630C - Metylenkloridbaserad komposition och foerfarande foer avlaegsnande av fotoresistfilmer som baserad sig pao anvaendningen av kompositionen. - Google Patents
Metylenkloridbaserad komposition och foerfarande foer avlaegsnande av fotoresistfilmer som baserad sig pao anvaendningen av kompositionen. Download PDFInfo
- Publication number
- FI84630C FI84630C FI873189A FI873189A FI84630C FI 84630 C FI84630 C FI 84630C FI 873189 A FI873189 A FI 873189A FI 873189 A FI873189 A FI 873189A FI 84630 C FI84630 C FI 84630C
- Authority
- FI
- Finland
- Prior art keywords
- mixture
- methylene chloride
- composition
- total amount
- mixture according
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 56
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 32
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 19
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000001298 alcohols Chemical class 0.000 claims description 6
- 150000002924 oxiranes Chemical class 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- -1 aliphatic ketones Chemical class 0.000 claims description 3
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 claims description 3
- 150000002170 ethers Chemical class 0.000 claims description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001256 steam distillation Methods 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- RXKJFZQQPQGTFL-UHFFFAOYSA-N dihydroxyacetone Chemical compound OCC(=O)CO RXKJFZQQPQGTFL-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
- C07C17/42—Use of additives, e.g. for stabilisation
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5018—Halogenated solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02854—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons characterised by the stabilising or corrosion inhibiting additives
- C23G5/02861—Oxygen-containing compounds
- C23G5/0288—Epoxy compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/288—Removal of non-metallic coatings, e.g. for repairing
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/264—Aldehydes; Ketones; Acetals or ketals
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Emergency Medicine (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Metallurgy (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Detergent Compositions (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Paints Or Removers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Dental Preparations (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8610529 | 1986-07-21 | ||
| FR8610529A FR2601703B1 (fr) | 1986-07-21 | 1986-07-21 | Composition a base de chlorure de methylene - son utilisation pour l'enlevement des films photoresist |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| FI873189A0 FI873189A0 (fi) | 1987-07-20 |
| FI873189L FI873189L (fi) | 1988-01-22 |
| FI84630B FI84630B (fi) | 1991-09-13 |
| FI84630C true FI84630C (fi) | 1991-12-27 |
Family
ID=9337579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI873189A FI84630C (fi) | 1986-07-21 | 1987-07-20 | Metylenkloridbaserad komposition och foerfarande foer avlaegsnande av fotoresistfilmer som baserad sig pao anvaendningen av kompositionen. |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP0258079B1 (enExample) |
| JP (1) | JPS6330848A (enExample) |
| AT (1) | ATE72679T1 (enExample) |
| CA (1) | CA1295205C (enExample) |
| DE (1) | DE3776737D1 (enExample) |
| DK (1) | DK170076B1 (enExample) |
| ES (1) | ES2006203A6 (enExample) |
| FI (1) | FI84630C (enExample) |
| FR (1) | FR2601703B1 (enExample) |
| GR (1) | GR3004213T3 (enExample) |
| IE (1) | IE59867B1 (enExample) |
| NO (1) | NO173617C (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3068622B2 (ja) * | 1988-08-30 | 2000-07-24 | キヤノン株式会社 | 画像処理装置 |
| FR2661918B1 (fr) * | 1990-05-10 | 1992-07-17 | Atochem | Composition nettoyante a base de 1,1,1,2,2-pentafluoro-3,3-dichloro-propane et de methyl tert-butyl ether. |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3625763A (en) * | 1968-12-04 | 1971-12-07 | Bunker Ramo | Conformal coating stripping method and composition |
| US3646229A (en) * | 1970-07-13 | 1972-02-29 | Dow Chemical Co | Use of dimethoxymethane to inhibit a methylene chloride-aluminum reaction |
| CA1049567A (en) * | 1973-02-23 | 1979-02-27 | Diamond Shamrock Corporation | Inhibition of aromatic compound degradation of methylene chloride |
| DE2716534A1 (de) * | 1976-05-03 | 1977-12-01 | Solvay | Verfahren zur stabilisierung von methylenchlorid |
| US4438192A (en) * | 1983-02-14 | 1984-03-20 | The Dow Chemical Company | Photoresist stripper composition and method of use |
| JPS6120946A (ja) * | 1984-07-10 | 1986-01-29 | Asahi Glass Co Ltd | フォトレジスト剥離用組成物 |
-
1986
- 1986-07-21 FR FR8610529A patent/FR2601703B1/fr not_active Expired - Fee Related
-
1987
- 1987-07-09 DE DE8787401626T patent/DE3776737D1/de not_active Expired - Fee Related
- 1987-07-09 EP EP19870401626 patent/EP0258079B1/fr not_active Expired - Lifetime
- 1987-07-09 AT AT87401626T patent/ATE72679T1/de not_active IP Right Cessation
- 1987-07-15 JP JP62176958A patent/JPS6330848A/ja active Granted
- 1987-07-20 DK DK376787A patent/DK170076B1/da not_active IP Right Cessation
- 1987-07-20 NO NO873030A patent/NO173617C/no not_active IP Right Cessation
- 1987-07-20 ES ES8702116A patent/ES2006203A6/es not_active Expired
- 1987-07-20 IE IE195887A patent/IE59867B1/en not_active IP Right Cessation
- 1987-07-20 FI FI873189A patent/FI84630C/fi not_active IP Right Cessation
- 1987-07-20 CA CA000542468A patent/CA1295205C/fr not_active Expired - Lifetime
-
1992
- 1992-04-01 GR GR920400583T patent/GR3004213T3/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DK170076B1 (da) | 1995-05-15 |
| FI873189L (fi) | 1988-01-22 |
| ES2006203A6 (es) | 1989-04-16 |
| EP0258079B1 (fr) | 1992-02-19 |
| JPS6330848A (ja) | 1988-02-09 |
| GR3004213T3 (enExample) | 1993-03-31 |
| NO173617C (no) | 1994-01-05 |
| NO873030L (no) | 1988-01-22 |
| FI873189A0 (fi) | 1987-07-20 |
| DK376787D0 (da) | 1987-07-20 |
| DE3776737D1 (de) | 1992-03-26 |
| FR2601703A1 (fr) | 1988-01-22 |
| FR2601703B1 (fr) | 1993-05-07 |
| FI84630B (fi) | 1991-09-13 |
| IE871958L (en) | 1989-01-21 |
| EP0258079A1 (fr) | 1988-03-02 |
| JPH0449939B2 (enExample) | 1992-08-12 |
| NO873030D0 (no) | 1987-07-20 |
| ATE72679T1 (de) | 1992-03-15 |
| CA1295205C (fr) | 1992-02-04 |
| DK376787A (da) | 1988-01-22 |
| NO173617B (no) | 1993-09-27 |
| IE59867B1 (en) | 1994-04-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Patent lapsed |
Owner name: ATOCHEM |