FI82717C - Anordning foer att i vakuum foerse en glasskiva med en reaktiv katodfoerstoftningsbelaeggning. - Google Patents
Anordning foer att i vakuum foerse en glasskiva med en reaktiv katodfoerstoftningsbelaeggning. Download PDFInfo
- Publication number
- FI82717C FI82717C FI874464A FI874464A FI82717C FI 82717 C FI82717 C FI 82717C FI 874464 A FI874464 A FI 874464A FI 874464 A FI874464 A FI 874464A FI 82717 C FI82717 C FI 82717C
- Authority
- FI
- Finland
- Prior art keywords
- coating
- blinds
- cathode
- coating chamber
- substrate
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 42
- 239000011248 coating agent Substances 0.000 title claims description 38
- 239000011521 glass Substances 0.000 title abstract description 17
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 7
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 7
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 3
- 239000004065 semiconductor Substances 0.000 claims abstract description 3
- 238000004544 sputter deposition Methods 0.000 claims abstract description 3
- 230000001154 acute effect Effects 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000002245 particle Substances 0.000 abstract description 8
- 230000001681 protective effect Effects 0.000 abstract description 6
- 238000000151 deposition Methods 0.000 abstract description 4
- 230000008021 deposition Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 23
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013270 controlled release Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Blinds (AREA)
- Surface Treatment Of Glass (AREA)
- Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
- Supports For Plants (AREA)
- Window Of Vehicle (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3634710 | 1986-10-11 | ||
| DE19863634710 DE3634710A1 (de) | 1986-10-11 | 1986-10-11 | Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| FI874464A0 FI874464A0 (fi) | 1987-10-09 |
| FI874464L FI874464L (fi) | 1988-04-12 |
| FI82717B FI82717B (fi) | 1990-12-31 |
| FI82717C true FI82717C (fi) | 1991-04-10 |
Family
ID=6311558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI874464A FI82717C (fi) | 1986-10-11 | 1987-10-09 | Anordning foer att i vakuum foerse en glasskiva med en reaktiv katodfoerstoftningsbelaeggning. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5080774A (enExample) |
| EP (1) | EP0265320B1 (enExample) |
| JP (1) | JPS63105963A (enExample) |
| AT (1) | ATE66966T1 (enExample) |
| DE (2) | DE3634710A1 (enExample) |
| ES (1) | ES2026558T3 (enExample) |
| FI (1) | FI82717C (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01152271A (ja) * | 1987-12-09 | 1989-06-14 | Toshiba Corp | スパッタ装置 |
| FR2698093B1 (fr) * | 1992-11-17 | 1995-01-27 | Saint Gobain Vitrage Int | Vitrage à propriétés de transmission variant avec l'incidence. |
| KR970009828B1 (en) * | 1994-02-23 | 1997-06-18 | Sansung Electronics Co Ltd | Fabrication method of collimator |
| US5614071A (en) * | 1995-06-28 | 1997-03-25 | Hmt Technology Corporation | Sputtering shield |
| JP2001509214A (ja) * | 1997-01-16 | 2001-07-10 | ボトムフィールド，ロジャー，エル． | 蒸気蒸着構成要素及び対応する方法 |
| JP2002105628A (ja) * | 2000-10-03 | 2002-04-10 | Nissin Electric Co Ltd | 真空アーク蒸着装置 |
| DE10132478C1 (de) * | 2001-07-03 | 2003-04-30 | Atotech Deutschland Gmbh | Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung |
| US6495000B1 (en) * | 2001-07-16 | 2002-12-17 | Sharp Laboratories Of America, Inc. | System and method for DC sputtering oxide films with a finned anode |
| US8500965B2 (en) * | 2004-05-06 | 2013-08-06 | Ppg Industries Ohio, Inc. | MSVD coating process |
| KR101165466B1 (ko) * | 2005-08-31 | 2012-07-13 | 엘지디스플레이 주식회사 | 캐리어 및 이를 구비한 공정 장치 |
| US8603250B2 (en) * | 2006-06-27 | 2013-12-10 | First Solar, Inc. | System and method for deposition of a material on a substrate |
| US20080017501A1 (en) * | 2006-07-21 | 2008-01-24 | Makoto Inagawa | Cooled dark space shield for multi-cathode design |
| US20090194414A1 (en) * | 2008-01-31 | 2009-08-06 | Nolander Ira G | Modified sputtering target and deposition components, methods of production and uses thereof |
| EP2354271A1 (en) * | 2010-02-09 | 2011-08-10 | Applied Materials, Inc. | Substrate protection device and method |
| DE102010052761A1 (de) * | 2010-11-30 | 2012-05-31 | Leybold Optics Gmbh | Vorrichtung zum Beschichten eines Substrats |
| KR20140047276A (ko) * | 2012-10-12 | 2014-04-22 | 삼성디스플레이 주식회사 | 스퍼터링 장치 |
| CN106756780B (zh) * | 2017-01-23 | 2019-03-05 | 京东方科技集团股份有限公司 | 一种用于溅射成膜工艺的掩膜板及溅射装置 |
| CH715877A1 (de) * | 2019-02-26 | 2020-08-31 | Oerlikon Surface Solutions Ag Pfaeffikon | Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen. |
| DE102022103180A1 (de) | 2022-02-10 | 2023-08-10 | Voestalpine Stahl Gmbh | Verfahren zum Erzeugen von beschichtetem perforiertem Stahlband |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3514391A (en) * | 1967-05-05 | 1970-05-26 | Nat Res Corp | Sputtering apparatus with finned anode |
| US4094763A (en) * | 1970-07-31 | 1978-06-13 | Ppg Industries, Inc. | Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof |
| US3945911A (en) * | 1974-08-28 | 1976-03-23 | Shatterproof Glass Corporation | Cathodes for sputter-coating glass sheets or other substrates |
| US4100055A (en) * | 1977-06-10 | 1978-07-11 | Varian Associates, Inc. | Target profile for sputtering apparatus |
| US4313815A (en) * | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| DD140481A1 (de) * | 1978-11-20 | 1980-03-05 | Juergen Salm | Verfahren und vorrichtung zum aufbringen von isolatorschichten |
| NL8202092A (nl) * | 1982-05-21 | 1983-12-16 | Philips Nv | Magnetronkathodesputtersysteem. |
| US4545882A (en) * | 1983-09-02 | 1985-10-08 | Shatterproof Glass Corporation | Method and apparatus for detecting sputtering target depletion |
| DE3331707A1 (de) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern |
| GB2194965B (en) * | 1986-09-12 | 1991-01-09 | Sharp Kk | A process for preparing a soft magnetic film of ni-fe based alloy |
-
1986
- 1986-10-11 DE DE19863634710 patent/DE3634710A1/de active Granted
-
1987
- 1987-10-08 AT AT87402242T patent/ATE66966T1/de not_active IP Right Cessation
- 1987-10-08 ES ES198787402242T patent/ES2026558T3/es not_active Expired - Lifetime
- 1987-10-08 DE DE8787402242T patent/DE3772706D1/de not_active Expired - Fee Related
- 1987-10-08 EP EP87402242A patent/EP0265320B1/fr not_active Expired - Lifetime
- 1987-10-09 FI FI874464A patent/FI82717C/fi not_active IP Right Cessation
- 1987-10-09 JP JP62253939A patent/JPS63105963A/ja active Pending
-
1990
- 1990-02-08 US US07/477,160 patent/US5080774A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FI874464A0 (fi) | 1987-10-09 |
| DE3634710C2 (enExample) | 1989-01-12 |
| EP0265320A1 (fr) | 1988-04-27 |
| FI82717B (fi) | 1990-12-31 |
| EP0265320B1 (fr) | 1991-09-04 |
| US5080774A (en) | 1992-01-14 |
| JPS63105963A (ja) | 1988-05-11 |
| ATE66966T1 (de) | 1991-09-15 |
| FI874464L (fi) | 1988-04-12 |
| DE3634710A1 (de) | 1988-04-21 |
| DE3772706D1 (de) | 1991-10-10 |
| ES2026558T3 (es) | 1992-05-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| FI82717C (fi) | Anordning foer att i vakuum foerse en glasskiva med en reaktiv katodfoerstoftningsbelaeggning. | |
| CA1321772C (en) | Apparatus for the application of thin layers to a substrate by means of cathode sputtering | |
| US20180258519A1 (en) | Apparatus for vacuum deposition on a substrate and method for masking the substrate during vacuum deposition | |
| KR102469559B1 (ko) | 스퍼터링 소스 | |
| US20020046945A1 (en) | High performance magnetron for DC sputtering systems | |
| TWI502091B (zh) | Sputtering device | |
| KR19980070371A (ko) | 백-스퍼터링 시일드 | |
| TWI363807B (en) | Cooled anodes assembly and physical vapor deposition apparatus and method using the same | |
| JP2004315931A (ja) | スパッタリングターゲット | |
| JP5003667B2 (ja) | 薄膜の製造方法および薄膜製造装置 | |
| US20130316079A1 (en) | Device and Process for Coating a Substrate | |
| US3491992A (en) | Vaporizing crucible | |
| KR20180057704A (ko) | 재료 증착 프로세스에서 기판을 운반하기 위한 캐리어 및 기판을 운반하기 위한 방법 | |
| JP2001348663A (ja) | スパッタリング装置 | |
| US9567666B2 (en) | Apparatus and method for making sputtered films with reduced stress asymmetry | |
| JP3808148B2 (ja) | 複合スパッタリングカソード、そのカソードを用いたスパッタリング装置 | |
| JP2001131743A (ja) | 平板型マグネトロンスパッタリング装置 | |
| WO2010082106A1 (en) | Charged particle beam pvd device, shielding device, coating chamber for coating substrates, and method of coating | |
| CN201154985Y (zh) | 应用于平板电器的单块溅射靶组件及使用其的溅射装置 | |
| US20080067058A1 (en) | Monolithic target for flat panel application | |
| NL9201938A (nl) | Inrichting voor het ionenetsen over een groot oppervlak. | |
| KR101250237B1 (ko) | 서셉터 및 이를 적용한 스퍼터링 장치 | |
| CN115404437A (zh) | 溅射方法和溅射设备 | |
| JP2010174344A (ja) | 成膜装置 | |
| KR20090043861A (ko) | 마그네트론 스퍼터링 장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Patent lapsed | ||
| MM | Patent lapsed |
Owner name: SAINT-GOBAIN VITRAGE |