FI74156B - Ljuskaensligt skiktoeverfoeringsmaterial, och foerfarande foer framstaellning av ett fotoresistschablon. - Google Patents
Ljuskaensligt skiktoeverfoeringsmaterial, och foerfarande foer framstaellning av ett fotoresistschablon. Download PDFInfo
- Publication number
- FI74156B FI74156B FI833517A FI833517A FI74156B FI 74156 B FI74156 B FI 74156B FI 833517 A FI833517 A FI 833517A FI 833517 A FI833517 A FI 833517A FI 74156 B FI74156 B FI 74156B
- Authority
- FI
- Finland
- Prior art keywords
- film
- layer
- photopolymerizable
- transfer material
- light
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Semiconductor Memories (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Drying Of Semiconductors (AREA)
- Photoreceptors In Electrophotography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Claims (8)
1. Ljuskänsligt skiktöverföringsmaterial med en tem-porär flexibel bärarfolie, ett termoplastiskt fotopolyme- 5 riserbart skikt och en täckfolie pA den yta av det fotopo-lymeriserbara skiktet som är vänd frAn bärarfolien och vilken täckfolie fastnar svagare än bärarfolien vid det polymeriserbara skiktet, kännetecknat därav, att den genomsnittliga grovheten pA den yta av bärarfolien 10 son är vänd mot det fotopolymeriserbara skiktet är 0,5 - 5 mikrometer.
2. Ljuskänsligt skiktöverföringsmaterial enligt pa-tentkravet 1, kännetecknat därav, att bärarfo-lien är transparent.
3. Ljuskänsligt skiktöverföringsmaterial enligt pa- tentkravet 1, kännetecknat därav, att mellan det fotopolymeriserbara skiktet och bärarfolien är anbragt ett tunt mellanskikt, som fastnar starkare vid det fotopolymeriserbara skiktet än vid bärarfolien, som vid uppvärm-20 ning ända tili 150°C inte blir klibbigt och som löser sig i en framkallningsvätska för det fotopolymeriserbara skiktet.
4. Ljuskänsligt skiktöverföringsmaterial enligt pa-tentkravet 3, kännetecknat därav, att mellan- 25 skiktet är 1 - 5 mikrometer tjockt.
5. Ljuskänsligt skiktöverföringsmaterial enligt pa-tentkravet 3, kännetecknat därav, att mellan-skiktet är vattenlösligt.
6. Ljuskänsligt skiktöverföringsmaterial enligt pa-30 tentkravet 3, kännetecknat därav, att mellan- skiktet innehaller en mindre andel av atminstone en be-stAndsdel i det fotopolymeriserbara skiktet.
7. Förfarande för framställning av en fotoresist-schablon, enligt vilket man laminerar ett pA en flexibel 35 bärarfolie pAfört termoplastiskt fotopolymeriserbart skikt med dess fria yta pA en permanent skiktbärare, belyser enligt figuren det fotopolymeriserbara skiktet och efter av- i
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823236560 DE3236560A1 (de) | 1982-10-02 | 1982-10-02 | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
DE3236560 | 1982-10-02 |
Publications (4)
Publication Number | Publication Date |
---|---|
FI833517A0 FI833517A0 (fi) | 1983-09-29 |
FI833517A FI833517A (fi) | 1984-04-03 |
FI74156B true FI74156B (fi) | 1987-08-31 |
FI74156C FI74156C (sv) | 1987-12-10 |
Family
ID=6174792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI833517A FI74156C (sv) | 1982-10-02 | 1983-09-29 | Ljuskänsligt skiktöverföringsmaterial, och förfarande för framställnin g av ett fotoresistschablon |
Country Status (11)
Country | Link |
---|---|
US (1) | US4559292A (sv) |
EP (1) | EP0105421B1 (sv) |
JP (1) | JPH0612413B2 (sv) |
KR (1) | KR910004874B1 (sv) |
AT (1) | ATE35060T1 (sv) |
AU (1) | AU558773B2 (sv) |
CA (1) | CA1242100A (sv) |
DE (2) | DE3236560A1 (sv) |
ES (1) | ES8501539A1 (sv) |
FI (1) | FI74156C (sv) |
IL (1) | IL69876A (sv) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59181342A (ja) * | 1983-03-31 | 1984-10-15 | Nitto Electric Ind Co Ltd | 剥離現像方法 |
US4587199A (en) * | 1983-07-11 | 1986-05-06 | E. I. Du Pont De Nemours And Company | Controlled roughening of a photosensitive composition |
JPS61169829A (ja) * | 1985-01-23 | 1986-07-31 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US4719169A (en) * | 1986-04-18 | 1988-01-12 | Hoechst Celanese Corporation | Protective coating for images |
JPH0623845B2 (ja) * | 1986-06-23 | 1994-03-30 | 富士写真フイルム株式会社 | 感光性受像シート材料及び画像転写方法 |
JPH07101309B2 (ja) * | 1987-05-29 | 1995-11-01 | 富士写真フイルム株式会社 | 感光性転写材料 |
US5213945A (en) * | 1988-02-26 | 1993-05-25 | Morton International, Inc. | Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like |
JPH07107603B2 (ja) * | 1988-10-07 | 1995-11-15 | 曙フォトマスク株式会社 | スクリーン印刷用スクリーン及びその製造方法 |
JPH0345548U (sv) * | 1989-09-08 | 1991-04-26 | ||
DE3931467A1 (de) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske |
JP2613990B2 (ja) * | 1990-08-01 | 1997-05-28 | 矢崎総業株式会社 | 分岐回路構成体 |
EP0471483A1 (en) * | 1990-08-03 | 1992-02-19 | Canon Kabushiki Kaisha | Surface reforming method, process for production of printing plate, printing plate and printing process |
JPH0580503A (ja) * | 1991-06-25 | 1993-04-02 | Fuji Photo Film Co Ltd | 感光性転写材料及び画像形成方法 |
DE4243912A1 (de) * | 1992-04-09 | 1993-10-14 | Fuji Photo Film Co Ltd | Lichtempfindliches Übertragungsmaterial und Bilderzeugungs-Verfahren unter Verwendung desselben |
US5391458A (en) * | 1992-12-18 | 1995-02-21 | Morton International, Inc. | Photoresist processing for improved resolution having a bake step to remove the tackiness of the laminated photosensitive layer prior to contact imagewise exposure |
TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
JP3592827B2 (ja) * | 1996-03-06 | 2004-11-24 | 富士写真フイルム株式会社 | 感光性エレメント及び多層配線基板の製造方法 |
US5993945A (en) * | 1996-05-30 | 1999-11-30 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US5795647A (en) * | 1996-09-11 | 1998-08-18 | Aluminum Company Of America | Printing plate having improved wear resistance |
US6022670A (en) * | 1997-05-08 | 2000-02-08 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US6399270B1 (en) * | 1998-12-04 | 2002-06-04 | Konica Corporation | Support for printing plate and printing plate |
WO2003079114A1 (en) * | 2002-03-14 | 2003-09-25 | E.I. Du Pont De Nemours And Company | Photosensitive element for use as flexographic printing plate |
US20080213570A1 (en) * | 2007-02-16 | 2008-09-04 | Jennifer Hoyt Lalli | Self-assembled conductive deformable films |
US20040234886A1 (en) * | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
JP2015066853A (ja) * | 2013-09-30 | 2015-04-13 | 富士フイルム株式会社 | レーザー彫刻型フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版の製版方法 |
TWI592760B (zh) * | 2014-12-30 | 2017-07-21 | 羅門哈斯電子材料韓國有限公司 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
JP2018014446A (ja) * | 2016-07-22 | 2018-01-25 | イビデン株式会社 | ソルダーレジスト及びプリント配線板 |
CN106498616B (zh) * | 2016-12-26 | 2018-09-21 | 浙江海森纺机科技有限公司 | 手套机机头联动系统及功能驱动夹 |
US20220066322A1 (en) * | 2020-08-26 | 2022-03-03 | Tamura Corporation | Photosensitive dry film, and printed wiring board with photosensitive dry film |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1591304A (en) * | 1925-07-16 | 1926-07-06 | Walter W Giveans | Stripping films |
US3010390A (en) * | 1954-06-29 | 1961-11-28 | Buskes Willem Marie | Planographic printing plates |
BE609350A (sv) * | 1960-10-19 | 1900-01-01 | ||
DE1522515C2 (de) | 1965-08-03 | 1980-10-09 | Du Pont | Verfahren zur Herstellung gedruckter Schaltungen |
DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
US4193797A (en) | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
DE2123702B2 (de) | 1971-05-13 | 1979-11-08 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
JPS5236698B2 (sv) * | 1973-01-29 | 1977-09-17 | ||
US3891443A (en) | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
US3909328A (en) | 1973-04-10 | 1975-09-30 | Du Pont | Decoration of substrates by thermal transfer of photosensitive, thermoplastic, dye-imaged film |
JPS5019961A (sv) * | 1973-06-29 | 1975-03-03 | ||
CH621416A5 (sv) | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
DE2718254C3 (de) | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
US4232108A (en) * | 1979-05-01 | 1980-11-04 | E. I. Du Pont De Nemours And Company | Marking transfer sheets |
JPS5642629A (en) * | 1979-09-17 | 1981-04-20 | Diafoil Co Ltd | Biaxially-stretched polyester film for photograph |
DE3036694A1 (de) | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
-
1982
- 1982-10-02 DE DE19823236560 patent/DE3236560A1/de not_active Withdrawn
-
1983
- 1983-09-14 JP JP58168533A patent/JPH0612413B2/ja not_active Expired - Lifetime
- 1983-09-22 EP EP83109447A patent/EP0105421B1/de not_active Expired
- 1983-09-22 DE DE8383109447T patent/DE3377022D1/de not_active Expired
- 1983-09-22 AT AT83109447T patent/ATE35060T1/de not_active IP Right Cessation
- 1983-09-28 CA CA000437782A patent/CA1242100A/en not_active Expired
- 1983-09-29 US US06/537,000 patent/US4559292A/en not_active Expired - Lifetime
- 1983-09-29 FI FI833517A patent/FI74156C/sv not_active IP Right Cessation
- 1983-09-30 ES ES526181A patent/ES8501539A1/es not_active Expired
- 1983-09-30 IL IL69876A patent/IL69876A/xx not_active IP Right Cessation
- 1983-09-30 KR KR1019830004643A patent/KR910004874B1/ko not_active IP Right Cessation
- 1983-10-04 AU AU19862/83A patent/AU558773B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
ATE35060T1 (de) | 1988-06-15 |
FI833517A (fi) | 1984-04-03 |
AU1986283A (en) | 1984-04-05 |
JPH0612413B2 (ja) | 1994-02-16 |
IL69876A0 (en) | 1983-12-30 |
ES526181A0 (es) | 1984-11-16 |
EP0105421A1 (de) | 1984-04-18 |
DE3377022D1 (en) | 1988-07-14 |
FI74156C (sv) | 1987-12-10 |
CA1242100A (en) | 1988-09-20 |
ES8501539A1 (es) | 1984-11-16 |
AU558773B2 (en) | 1987-02-05 |
KR910004874B1 (ko) | 1991-07-15 |
DE3236560A1 (de) | 1984-04-05 |
US4559292A (en) | 1985-12-17 |
IL69876A (en) | 1987-02-27 |
EP0105421B1 (de) | 1988-06-08 |
KR840006419A (ko) | 1984-11-29 |
JPS5975245A (ja) | 1984-04-27 |
FI833517A0 (fi) | 1983-09-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Transfer of assignment of patent |
Owner name: MORTON INTERNATIONAL, INC. |
|
MM | Patent lapsed | ||
MM | Patent lapsed |
Owner name: MORTON INTERNATIONAL, INC. |