FI62734C - Foerfarande foer att framkalla en latentreliefbild pao en skiva samt anordning foer att tillaempa foerfarandet - Google Patents
Foerfarande foer att framkalla en latentreliefbild pao en skiva samt anordning foer att tillaempa foerfarandet Download PDFInfo
- Publication number
- FI62734C FI62734C FI2564/73A FI256473A FI62734C FI 62734 C FI62734 C FI 62734C FI 2564/73 A FI2564/73 A FI 2564/73A FI 256473 A FI256473 A FI 256473A FI 62734 C FI62734 C FI 62734C
- Authority
- FI
- Finland
- Prior art keywords
- plate
- blade
- air
- gas
- liquid
- Prior art date
Links
- 101100148710 Clarkia breweri SAMT gene Proteins 0.000 title 1
- 239000007788 liquid Substances 0.000 claims description 49
- 239000000463 material Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- 229920006295 polythiol Polymers 0.000 claims description 12
- 150000004291 polyenes Chemical class 0.000 claims description 11
- 239000010408 film Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 7
- 238000007664 blowing Methods 0.000 claims description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 6
- 230000001154 acute effect Effects 0.000 claims description 4
- 239000000428 dust Substances 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 46
- 238000007639 printing Methods 0.000 description 24
- 238000011161 development Methods 0.000 description 20
- 229920000642 polymer Polymers 0.000 description 13
- 230000005855 radiation Effects 0.000 description 13
- 239000011344 liquid material Substances 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- 230000002745 absorbent Effects 0.000 description 7
- 239000002250 absorbent Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 229910000746 Structural steel Inorganic materials 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000007644 letterpress printing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- JQRRFDWXQOQICD-UHFFFAOYSA-N biphenylen-1-ylboronic acid Chemical compound C12=CC=CC=C2C2=C1C=CC=C2B(O)O JQRRFDWXQOQICD-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 229920001084 poly(chloroprene) Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 150000005672 tetraenes Chemical class 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- NPLABXZRXCRBPI-UHFFFAOYSA-N 2-methylidene-1,3-dioxepine-4,7-dione Chemical compound C=C1OC(=O)C=CC(=O)O1 NPLABXZRXCRBPI-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 241001082241 Lythrum hyssopifolia Species 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- XEEYBQQBJWHFJM-OUBTZVSYSA-N iron-52 Chemical compound [57Fe] XEEYBQQBJWHFJM-OUBTZVSYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D15/00—Apparatus for treating processed material
- G03D15/02—Drying; Glazing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI793956A FI62735C (fi) | 1972-12-18 | 1979-12-17 | Anordning foer framkallning av en latent bild av ett ljushaerdat och med ljus haerdbart material |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31625372A | 1972-12-18 | 1972-12-18 | |
| US31625372 | 1972-12-18 | ||
| US35141573A | 1973-04-16 | 1973-04-16 | |
| US35141573 | 1973-04-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI62734B FI62734B (fi) | 1982-10-29 |
| FI62734C true FI62734C (fi) | 1983-02-10 |
Family
ID=26980326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI2564/73A FI62734C (fi) | 1972-12-18 | 1973-08-15 | Foerfarande foer att framkalla en latentreliefbild pao en skiva samt anordning foer att tillaempa foerfarandet |
Country Status (15)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52105005A (en) * | 1975-05-13 | 1977-09-03 | Yokohama Town | Method of making textile printing plate and screen printing plate |
| DE2913387A1 (de) * | 1978-03-31 | 1979-10-11 | Grace W R & Co | Photopolymere druckplatte mit faseriger traegerschicht fuer den hochdruck |
| EP0410500B1 (en) * | 1989-07-25 | 1995-10-25 | Agfa-Gevaert N.V. | Lithographic aluminium offset printing plate made according to the DTR-process |
| US8895228B2 (en) * | 2011-11-02 | 2014-11-25 | E I Du Pont De Nemours And Company | Method for thermal treatment of relief surface for a relief printing form |
| CN110629573B (zh) * | 2019-10-28 | 2022-04-26 | 孚日集团股份有限公司 | 一种正面平布反面毛圈毛巾的印花方法 |
| CN113448187B (zh) * | 2021-08-31 | 2021-11-23 | 中熵科技(徐州)有限公司 | 一种复合半导体薄膜材料光刻胶去除装置 |
| FR3141232B1 (fr) | 2022-10-19 | 2024-09-06 | Psa Automobiles Sa | Bloc optique, pour véhicule, équipé d’un radiateur thermique |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE495502C (de) * | 1927-07-27 | 1930-04-07 | Andre Leon Victor Clement Debr | Vorrichtung zum Trocknen von Baendern, insbesondere von kinematographischen und photographischen Filmbaendern |
| US1955977A (en) * | 1929-08-06 | 1934-04-24 | United Res Corp | Nozzle |
| GB1276552A (en) * | 1968-02-21 | 1972-06-01 | Grace W R & Co | Apparatus for developing a latent image |
| JPS5210337Y1 (enrdf_load_stackoverflow) * | 1970-10-12 | 1977-03-05 | ||
| DE2060828A1 (de) * | 1970-12-10 | 1972-06-22 | Staub Gmbh Wilhelm | Geraet zum Entwickeln,Fixieren,AEtzen und Entschichten graphischer Druckplatten |
-
1973
- 1973-06-30 JP JP48074338A patent/JPS5146442B2/ja not_active Expired
- 1973-07-09 CA CA175,908A patent/CA1021113A/en not_active Expired
- 1973-08-14 IT IT27930/73A patent/IT1007542B/it active
- 1973-08-14 NO NO3231/73A patent/NO139838C/no unknown
- 1973-08-15 FI FI2564/73A patent/FI62734C/fi active
- 1973-08-15 NL NLAANVRAGE7311245,A patent/NL176887C/xx not_active IP Right Cessation
- 1973-08-16 DE DE2341397A patent/DE2341397C2/de not_active Expired
- 1973-08-16 BE BE134645A patent/BE803682A/xx not_active IP Right Cessation
- 1973-08-16 SE SE7311209A patent/SE442683B/xx unknown
- 1973-08-17 CH CH1188473A patent/CH583924A5/xx not_active IP Right Cessation
- 1973-08-21 GB GB3960973A patent/GB1446621A/en not_active Expired
- 1973-08-27 BR BR6565/73A patent/BR7306565D0/pt unknown
- 1973-08-27 FR FR7330938A patent/FR2210780B1/fr not_active Expired
- 1973-08-29 AR AR249829A patent/AR203372A1/es active
- 1973-09-05 MX MX145988A patent/MX144516A/es unknown
-
1977
- 1977-05-26 SE SE7706213A patent/SE436230B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NO139838B (no) | 1979-02-05 |
| BR7306565D0 (pt) | 1974-08-15 |
| MX144516A (es) | 1981-10-22 |
| NL176887C (nl) | 1985-06-17 |
| NL7311245A (enrdf_load_stackoverflow) | 1974-06-20 |
| FI62734B (fi) | 1982-10-29 |
| FR2210780A1 (enrdf_load_stackoverflow) | 1974-07-12 |
| FR2210780B1 (enrdf_load_stackoverflow) | 1976-10-01 |
| CH583924A5 (enrdf_load_stackoverflow) | 1977-01-14 |
| SE442683B (sv) | 1986-01-20 |
| NO139838C (no) | 1979-05-16 |
| IT1007542B (it) | 1976-10-30 |
| AR203372A1 (es) | 1975-09-08 |
| DE2341397A1 (de) | 1974-06-20 |
| GB1446621A (en) | 1976-08-18 |
| SE436230B (sv) | 1984-11-19 |
| SE7706213L (sv) | 1977-05-26 |
| CA1021113A (en) | 1977-11-22 |
| DE2341397C2 (de) | 1986-03-27 |
| AU5967373A (en) | 1975-02-27 |
| JPS4988610A (enrdf_load_stackoverflow) | 1974-08-24 |
| BE803682A (fr) | 1973-12-17 |
| JPS5146442B2 (enrdf_load_stackoverflow) | 1976-12-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4444211B2 (ja) | シームレス印刷用凸版材の製造方法及びシームレス印刷用凸版材の製造装置 | |
| US3448720A (en) | Apparatus for preparing planographic offset printing plates | |
| US3995343A (en) | Apparatus for processing a printing plate | |
| TWI288703B (en) | Method for thermally processing photosensitive printing sleeves | |
| EP1154322A1 (en) | Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. | |
| FI62734C (fi) | Foerfarande foer att framkalla en latentreliefbild pao en skiva samt anordning foer att tillaempa foerfarandet | |
| CN102089714A (zh) | 用于光敏印刷元件的热处理的方法和装置 | |
| DE2020415A1 (de) | Verfahren und Vorrichtung zur Herstellung von Druckplatten | |
| US5223041A (en) | Apparatus and process for processing printing plates | |
| US4197126A (en) | Air etching of polymeric printing plates | |
| CN114434993B (zh) | 表面多抗性装饰纸凹版印刷工艺及设备 | |
| US4214522A (en) | Device for manufacturing a stencil | |
| US4042996A (en) | Air etching of polymeric printing plates | |
| JP6628201B1 (ja) | 樹脂凸版印刷版の製造方法およびその製造システム | |
| CN106179865B (zh) | 一种覆膜涂装工艺及装置 | |
| US3922751A (en) | Air etching of polymeric printing plates | |
| JPH0838969A (ja) | 波形シート材料を被覆するための方法及び装置 | |
| JP2003241397A (ja) | 印刷用シームレススリーブ体の製造方法および装置 | |
| GB2043926A (en) | Electrophotocopier | |
| US4145790A (en) | Air etching of polymeric printing plates | |
| JP4495220B2 (ja) | 感光性印刷要素の高速現像装置 | |
| FI62735B (fi) | Anordning foer framkallning av en latent bild av ett ljushaerdat och med ljus haerbart material | |
| JPH0314334B2 (enrdf_load_stackoverflow) | ||
| IT202000003686A1 (it) | Metodo e dispositivo di finissaggio di lastre di stampa digitali per flessografia | |
| CN213472550U (zh) | 一种对位局部深纹版压铸造装置 |