FI121430B - Het källa - Google Patents

Het källa Download PDF

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Publication number
FI121430B
FI121430B FI20065275A FI20065275A FI121430B FI 121430 B FI121430 B FI 121430B FI 20065275 A FI20065275 A FI 20065275A FI 20065275 A FI20065275 A FI 20065275A FI 121430 B FI121430 B FI 121430B
Authority
FI
Finland
Prior art keywords
source
lid
hot
reactor
spring according
Prior art date
Application number
FI20065275A
Other languages
English (en)
Finnish (fi)
Other versions
FI20065275A0 (sv
FI20065275A (sv
Inventor
Pekka Soininen
Sami Sneck
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20065275A priority Critical patent/FI121430B/sv
Publication of FI20065275A0 publication Critical patent/FI20065275A0/sv
Priority to PCT/FI2007/050232 priority patent/WO2007125174A1/en
Priority to US12/297,342 priority patent/US20090078203A1/en
Priority to EP07730719A priority patent/EP2013377A1/en
Priority to CN2007800187675A priority patent/CN101448972B/zh
Priority to RU2008146103/02A priority patent/RU2439196C2/ru
Priority to JP2009507105A priority patent/JP5053364B2/ja
Publication of FI20065275A publication Critical patent/FI20065275A/sv
Application granted granted Critical
Publication of FI121430B publication Critical patent/FI121430B/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45576—Coaxial inlets for each gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/78—Heating arrangements specially adapted for immersion heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Control Of Resistance Heating (AREA)

Claims (17)

1. Het kalla för gasfasdeponeringsanordningar för introducering av ett källmaterial i en reaktor, vilken kalla (1) omfattar ett källkärl (2) med ett käll- 5 utrymme (4) för källmaterialet, samt ett lock (6) som kan monteras löstagbart tili källkärlet (2) med första värmningsmedel (8) för värmning av locket (6), sä att värmen överförs genom ledning tili källkärlet (2) och vidare tili källutrymmet (4) för värmning av källmaterialet, kännetecknad av att locket (6) dess-utom omfattar en värmningsbar matarkanal (14) i strömningsförbindelse med 10 källutrymmet (4) för att föra källmaterialet frän källutrymmet (4) tili reaktorn, sa att mellan källkärlet (2) och reaktorn kan astadkommas en stigande tempera-turgradient.
2. Het kalla enligt patentkrav 1, k ä n n e t e c k n a d av att de första värmningsmedlen (8) omfattar en eller flera värmepatroner som kan monte- 15 ras utbytbart i locket (6).
3. Het kalla enligt patentkrav 1, k ä n n e t e c k n a d av att de första värmningsmedlen (8) omfattar ett eller flera i locket (6) monterade värm-ningsmotständ.
4. Het källa enligt nagot av de föregäende patentkraven 1 - 3, 20 kännetecknad av att locket (6) dessutom omfattar en termometer (10) för mätning och regiering av lockets (6) temperatur för att reglera källkärlets (2) och källutrymmets (4) temperatur tili önskad.
5. Het källa enligt nagot av de föregäende patentkraven 1 - 4, kännetecknad av att locket (6) dessutom omfattar ett eller flera ytfogs- 25 medel och/eller ytfogsventiler (12) för att koppia manövreringsorgan eller in-loppsskarvkopplingar tili källan (1).
6. Het källa enligt nagot av de föregäende patentkraven 1 - 5, kännetecknad av att locket (6) omfattar rörsystem, via vilka källmaterialet kan mätäs frän källutrymmet (4) till den i locket (6) monterade matarkanalen 30 (14) och vidare tili reaktorn.
7. Het källa enligt patentkrav 6, k ä n n e t e c k n a d av att ätmin-stone en del av lockets (6) rörsystem har ästadkommits i locket (6) genom borrning eller annars genom bearbetning.
8. Het källa enligt patentkrav 6 eller 7, k ä n n e t e c k n a d av att 35 matarkanalen (14) omfattar andra värmningsmedel (16) för uppvärmning av matarkanalen (14) och medlet som strömmar i denna.
9. Het kalla enligt nagot av de föregaende patentkraven 6-8, kännetecknad avatt matarkanalen omfattar en första rörliknande ka-naldel (14) för att föra källmaterialet tili reaktorn samt en eller flera runt den första kanaldelen (14) monterade rörliknande extra kanaldelar (20) för introdu- 5 cering av bärgas eller annan processgas.
10. Het kalla enligt patentkrav 8, k ä n n e te c k n a d av att de andra värmningsmedlen (16) är utformade längsträckta, sä att de kan monte-ras inuti matarkanalen (14).
11. Het kalla enligt patentkrav 9 eller 10, kännetecknad av 10 att de andra värmningsmedlen (16) är försedda med ett skyddsrör (18) som placerats pä dem.
12. Het kalla enligt nagot av de föregaende patentkraven 8-11, kännetecknad av att de andra värmningsmedlen (16) har ästadkommits reglerbara, sä att med hjälp av de första och de andra värmningsmedlen (8, 15 16) mellan källkärlet (2) och reaktorn via locket (6) och matarkanalen (14) kan ästadkommas en stigande temperaturgradient.
13. Het källa enligt nagot av de föregaende patentkraven 1 - 12, kännetecknad av att kallan (1) är försedd med snabbläsningsmedel för att fästa källkärlet (2) vid och lösgöra det frän locket (6).
14. Het källa enligt nagot av de föregaende patentkraven 1-13, kännetecknad av att den omfattar anslutningsmedel för koppling av tvä eller flera motsvarande heta källor (1) i serie eller parallellt.
15. Het källa enligt nagot av de föregaende patentkraven 1 - 14, kännetecknad av att källkärlet (2) är försett med ett fönster eller en 25 motsvarande genomskinlig del för optisk observering av mängden källmaterial och dess beteende.
16. Het källa enligt nagot av de föregaende patentkraven 1-15, kännetecknad av att källkärlet (2) är tillverkat av aluminium eller nagot annat material med god värmeledningsförmäga.
17. Het källa enligt nagot av de föregaende patentkraven 1-16, kännetecknad av att locket (6) är tillverkat av aluminium eller en bland-ning av rostfritt stal och aluminium.
FI20065275A 2006-04-28 2006-04-28 Het källa FI121430B (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FI20065275A FI121430B (sv) 2006-04-28 2006-04-28 Het källa
PCT/FI2007/050232 WO2007125174A1 (en) 2006-04-28 2007-04-26 Hot source
US12/297,342 US20090078203A1 (en) 2006-04-28 2007-04-26 Hot source
EP07730719A EP2013377A1 (en) 2006-04-28 2007-04-26 Hot source
CN2007800187675A CN101448972B (zh) 2006-04-28 2007-04-26 热源
RU2008146103/02A RU2439196C2 (ru) 2006-04-28 2007-04-26 Термоисточник
JP2009507105A JP5053364B2 (ja) 2006-04-28 2007-04-26 熱源装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20065275 2006-04-28
FI20065275A FI121430B (sv) 2006-04-28 2006-04-28 Het källa

Publications (3)

Publication Number Publication Date
FI20065275A0 FI20065275A0 (sv) 2006-04-28
FI20065275A FI20065275A (sv) 2007-10-29
FI121430B true FI121430B (sv) 2010-11-15

Family

ID=36293869

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20065275A FI121430B (sv) 2006-04-28 2006-04-28 Het källa

Country Status (7)

Country Link
US (1) US20090078203A1 (sv)
EP (1) EP2013377A1 (sv)
JP (1) JP5053364B2 (sv)
CN (1) CN101448972B (sv)
FI (1) FI121430B (sv)
RU (1) RU2439196C2 (sv)
WO (1) WO2007125174A1 (sv)

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US9598766B2 (en) 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
CN114044626B (zh) * 2021-12-10 2023-05-02 中国电子科技集团公司第四十六研究所 一种基于fcvd的光纤预制棒稀土汽相掺杂方法

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Also Published As

Publication number Publication date
CN101448972A (zh) 2009-06-03
RU2008146103A (ru) 2010-06-10
US20090078203A1 (en) 2009-03-26
JP5053364B2 (ja) 2012-10-17
EP2013377A1 (en) 2009-01-14
FI20065275A0 (sv) 2006-04-28
JP2009535502A (ja) 2009-10-01
CN101448972B (zh) 2011-11-16
FI20065275A (sv) 2007-10-29
WO2007125174A1 (en) 2007-11-08
RU2439196C2 (ru) 2012-01-10

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