ES8701857A1 - Procedimiento para el tratamiento superficial de productos de cobre - Google Patents

Procedimiento para el tratamiento superficial de productos de cobre

Info

Publication number
ES8701857A1
ES8701857A1 ES548541A ES548541A ES8701857A1 ES 8701857 A1 ES8701857 A1 ES 8701857A1 ES 548541 A ES548541 A ES 548541A ES 548541 A ES548541 A ES 548541A ES 8701857 A1 ES8701857 A1 ES 8701857A1
Authority
ES
Spain
Prior art keywords
copper
base material
copper product
nickel
zinc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES548541A
Other languages
English (en)
Other versions
ES548541A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Publication of ES548541A0 publication Critical patent/ES548541A0/es
Publication of ES8701857A1 publication Critical patent/ES8701857A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0335—Layered conductors or foils
    • H05K2201/0355—Metal foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0723—Electroplating, e.g. finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
    • Y10T29/49144—Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Laminated Bodies (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Dental Preparations (AREA)
  • Golf Clubs (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

PROCEDIMIENTO PARA EL TRATAMIENTO SUPERFICIAL DE LAMINAS DE COBRE MEDIANTE LA FORMACION DE UNA ALEACION TERNARIA DE ZINC-COBRE-NIQUEL SOBRE LA SUPERFICIE DE LA LAMINA. CONSISTE EN DEPOSITAR ELECTRICAMENTE UNA ALEACION BINARIA DE 95-20% EN PESO DE ZINC Y 5-80% EN PESO DE NIQUEL, SOBRE LA SUPERFICIE DE UN PRODUCTO DE COBRE, PARA FORMAR UNA CAPA DE REVESTIMIENTO Y LAMINAS O PRENSAR EN CALIENTE EL PRODUCTO DE COBRE SOBRE UN MATERIAL DE BASE, PARA CONVERTIR DICHA ALEACION BINARIA EN UNA ALEACION TERCIARIA DE ZINC-NIQUEL-COBRE. SE UTILIZAN PARA CIRCUITOS IMPRESOS.
ES548541A 1984-11-06 1985-11-05 Procedimiento para el tratamiento superficial de productos de cobre Expired ES8701857A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59233572A JPS61110794A (ja) 1984-11-06 1984-11-06 銅箔の表面処理方法

Publications (2)

Publication Number Publication Date
ES548541A0 ES548541A0 (es) 1986-12-01
ES8701857A1 true ES8701857A1 (es) 1986-12-01

Family

ID=16957172

Family Applications (1)

Application Number Title Priority Date Filing Date
ES548541A Expired ES8701857A1 (es) 1984-11-06 1985-11-05 Procedimiento para el tratamiento superficial de productos de cobre

Country Status (8)

Country Link
US (1) US4640747A (es)
EP (1) EP0180981B1 (es)
JP (1) JPS61110794A (es)
AT (1) ATE41682T1 (es)
DE (1) DE3569001D1 (es)
ES (1) ES8701857A1 (es)
FI (1) FI81130C (es)
NO (1) NO166729C (es)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02228495A (ja) * 1989-03-01 1990-09-11 Furukawa Electric Co Ltd:The 銅製熱交換器用フィン材とその製造方法
JPH0713319B2 (ja) * 1989-01-30 1995-02-15 古河電気工業株式会社 銅製熱交換器用フィン材とその製造方法
JPH0660435B2 (ja) * 1989-03-01 1994-08-10 古河電気工業株式会社 銅製熱交換器用フィン材とその製造方法
US5063117A (en) * 1988-12-27 1991-11-05 The Furukawa Electric Co., Ltd. Copper fin material for heat-exchanger and method of producing the same
US5250363A (en) * 1989-10-13 1993-10-05 Olin Corporation Chromium-zinc anti-tarnish coating for copper foil having a dark color
US5230932A (en) * 1989-10-13 1993-07-27 Olin Corporation Chromium-zinc anti-tarnish coating for copper foil
US5098796A (en) * 1989-10-13 1992-03-24 Olin Corporation Chromium-zinc anti-tarnish coating on copper foil
US5022968A (en) * 1990-09-20 1991-06-11 Olin Corporation Method and composition for depositing a chromium-zinc anti-tarnish coating on copper foil
JPH0819550B2 (ja) * 1990-06-05 1996-02-28 福田金属箔粉工業株式会社 印刷回路用銅箔の表面処理方法
TW230290B (es) * 1991-11-15 1994-09-11 Nikko Guruder Foreer Kk
JP3292774B2 (ja) * 1994-02-15 2002-06-17 三井金属鉱業株式会社 プリント配線板用銅箔およびその製造方法
US5945010A (en) * 1997-09-02 1999-08-31 Composite Concepts Company, Inc. Electrode wire for use in electric discharge machining and process for preparing same
US6015482A (en) * 1997-12-18 2000-01-18 Circuit Research Corp. Printed circuit manufacturing process using tin-nickel plating
JP3142259B2 (ja) 1998-11-30 2001-03-07 三井金属鉱業株式会社 耐薬品性および耐熱性に優れたプリント配線板用銅箔およびその製造方法
US6579568B2 (en) 1999-11-29 2003-06-17 Mitsui Mining & Smelting Co., Ltd. Copper foil for printed wiring board having excellent chemical resistance and heat resistance
JP3743702B2 (ja) * 2000-04-28 2006-02-08 三井金属鉱業株式会社 プリント配線板のセミアディティブ製造法
JP2003051673A (ja) * 2001-08-06 2003-02-21 Mitsui Mining & Smelting Co Ltd プリント配線板用銅箔及びそのプリント配線板用銅箔を用いた銅張積層板
JP4178415B2 (ja) * 2002-07-04 2008-11-12 三井金属鉱業株式会社 キャリア箔付電解銅箔
JP2005344174A (ja) * 2004-06-03 2005-12-15 Mitsui Mining & Smelting Co Ltd 表面処理銅箔及びその表面処理銅箔を用いて製造したフレキシブル銅張積層板並びにフィルムキャリアテープ
JP2006024902A (ja) * 2004-06-07 2006-01-26 Shinko Electric Ind Co Ltd 極細線パターンを有する配線基板の製造方法および配線基板
EP2005343B1 (en) * 2005-12-01 2020-06-03 Thermocompact Edm wire
WO2010010893A1 (ja) * 2008-07-22 2010-01-28 古河電気工業株式会社 表面処理銅箔及び銅張積層板
KR101426038B1 (ko) * 2008-11-13 2014-08-01 주식회사 엠디에스 인쇄회로기판 및 그 제조방법
JP2011162860A (ja) * 2010-02-12 2011-08-25 Furukawa Electric Co Ltd:The 表面粗化銅箔とその製造方法及び銅張積層板
EP2557204A1 (en) 2010-05-07 2013-02-13 JX Nippon Mining & Metals Corp. Copper foil for printed circuit
US9138964B2 (en) * 2010-11-22 2015-09-22 Mitsui Mining & Smelting Co., Ltd Surface-treated copper foil
JP5654416B2 (ja) * 2011-06-07 2015-01-14 Jx日鉱日石金属株式会社 液晶ポリマー銅張積層板及び当該積層板に用いる銅箔

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3377259A (en) * 1965-03-15 1968-04-09 Gen Dynamics Corp Method for preventing oxidation degradation of copper by interposing barrier betweencopper and polypropylene
US3585010A (en) * 1968-10-03 1971-06-15 Clevite Corp Printed circuit board and method of making same
US3857681A (en) * 1971-08-03 1974-12-31 Yates Industries Copper foil treatment and products produced therefrom
JPS5856758B2 (ja) * 1975-12-17 1983-12-16 ミツイアナコンダドウハク カブシキガイシヤ ドウハクヒヨウメンシヨリホウホウ
US4104134A (en) * 1977-08-31 1978-08-01 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method for making an aluminum or copper substrate panel for selective absorption of solar energy
US4189331A (en) * 1978-06-22 1980-02-19 Canada Wire And Cable Limited Oxidation resistant barrier coated copper based substrate and method for producing the same
JPS55145396A (en) * 1979-04-27 1980-11-12 Furukawa Circuit Foil Copper foil for printed circuit and method of fabricating same
US4388160A (en) * 1980-02-20 1983-06-14 Rynne George B Zinc-nickel alloy electroplating process
US4268364A (en) * 1980-03-18 1981-05-19 Inco Research & Development Center Inc. Nickel-zinc alloy deposition from a sulfamate bath
EP0072830B2 (en) * 1981-02-26 1989-04-19 Electrofoils Technology Limited Treatment of copper foil
JPS6012434B2 (ja) * 1981-08-21 1985-04-01 荏原ユ−ジライト株式会社 亜鉛−ニツケル合金電気めつき液
WO1983002538A1 (en) * 1982-01-04 1983-07-21 Gen Electric Electroplated augmentative replacement processed conductors and manufacture thereof
EP0100777A1 (en) * 1982-08-10 1984-02-22 The Dow Chemical Company Process for electroplating metal parts
DE3371096D1 (en) * 1982-12-01 1987-05-27 Electrofoils Techn Ltd Treatment of copper foil
US4572768A (en) * 1985-06-28 1986-02-25 Square D Company Treatment for copper foil

Also Published As

Publication number Publication date
US4640747A (en) 1987-02-03
FI854281A0 (fi) 1985-10-31
FI81130B (fi) 1990-05-31
FI81130C (fi) 1990-09-10
NO166729C (no) 1991-08-28
JPH0447038B2 (es) 1992-07-31
JPS61110794A (ja) 1986-05-29
NO854402L (no) 1986-05-07
EP0180981B1 (en) 1989-03-22
ES548541A0 (es) 1986-12-01
ATE41682T1 (de) 1989-04-15
FI854281A (fi) 1986-05-07
NO166729B (no) 1991-05-21
DE3569001D1 (en) 1989-04-27
EP0180981A1 (en) 1986-05-14

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