ES2306896T3 - Agentes antiestaticos y composiciones polimericas derivadas de los misos. - Google Patents

Agentes antiestaticos y composiciones polimericas derivadas de los misos. Download PDF

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Publication number
ES2306896T3
ES2306896T3 ES03766822T ES03766822T ES2306896T3 ES 2306896 T3 ES2306896 T3 ES 2306896T3 ES 03766822 T ES03766822 T ES 03766822T ES 03766822 T ES03766822 T ES 03766822T ES 2306896 T3 ES2306896 T3 ES 2306896T3
Authority
ES
Spain
Prior art keywords
aliphatic
independently
unsubstituted
group substituted
aromatic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES03766822T
Other languages
English (en)
Spanish (es)
Inventor
Sanjoy Kumar Chowdhury
Theodorus Lambertus Hoeks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
SABIC Innovative Plastics IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SABIC Innovative Plastics IP BV filed Critical SABIC Innovative Plastics IP BV
Application granted granted Critical
Publication of ES2306896T3 publication Critical patent/ES2306896T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075—Antistatics
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/548—Silicon-containing compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ES03766822T 2002-08-06 2003-06-17 Agentes antiestaticos y composiciones polimericas derivadas de los misos. Expired - Lifetime ES2306896T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64676 2002-08-06
US10/064,676 US6900257B2 (en) 2002-08-06 2002-08-06 Antistatic agents and polymer compositions derived therefrom

Publications (1)

Publication Number Publication Date
ES2306896T3 true ES2306896T3 (es) 2008-11-16

Family

ID=31493933

Family Applications (1)

Application Number Title Priority Date Filing Date
ES03766822T Expired - Lifetime ES2306896T3 (es) 2002-08-06 2003-06-17 Agentes antiestaticos y composiciones polimericas derivadas de los misos.

Country Status (11)

Country Link
US (1) US6900257B2 (https=)
EP (1) EP1556437B1 (https=)
JP (1) JP2005535690A (https=)
KR (1) KR20050062767A (https=)
CN (1) CN100341928C (https=)
AT (1) ATE402977T1 (https=)
AU (1) AU2003247597A1 (https=)
DE (1) DE60322565D1 (https=)
ES (1) ES2306896T3 (https=)
TW (1) TW200402444A (https=)
WO (1) WO2004013218A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
KR101016913B1 (ko) * 2003-03-31 2011-02-22 도쿄엘렉트론가부시키가이샤 처리요소용 배리어층 및 그의 형성방법
EP1856189A4 (en) * 2005-01-14 2010-12-29 Du Pont ANTISTATIC AGENT FOR POLYMERS
US8071667B2 (en) 2005-06-02 2011-12-06 Nalco Company Compositions comprising (poly) alpha olefins
JP5866829B2 (ja) 2011-07-04 2016-02-24 日清紡ホールディングス株式会社 イオン液体
JP6090561B2 (ja) * 2012-10-16 2017-03-08 日清紡ホールディングス株式会社 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス
JP6051757B2 (ja) 2012-10-16 2016-12-27 日清紡ホールディングス株式会社 イオン液体
WO2014197458A1 (en) 2013-06-03 2014-12-11 Polyone Corporation Low molecular weight polyphenylene ether prepared without solvents
CN107532100B (zh) * 2015-05-11 2020-10-02 日清纺控股株式会社 包含含有硅的离子液体的润滑剂
JP6582705B2 (ja) * 2015-08-10 2019-10-02 日清紡ホールディングス株式会社 下限臨界共溶温度型の相挙動を示す化合物の利用
JP6601094B2 (ja) * 2015-09-25 2019-11-06 日清紡ホールディングス株式会社 電解液用添加剤
JP6651968B2 (ja) 2016-04-21 2020-02-19 日清紡ホールディングス株式会社 ケイ素含有硫酸エステル塩
JP6958511B2 (ja) * 2018-08-17 2021-11-02 信越化学工業株式会社 オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141898A (en) * 1961-01-03 1964-07-21 Minnesota Mining & Mfg 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts
US3328449A (en) 1963-12-05 1967-06-27 Dow Corning Sulfopropylated, organofunctional silanes and siloxanes
US4093589A (en) 1977-02-03 1978-06-06 General Electric Company Non-opaque flame retardant polycarbonate composition
DE2931172A1 (de) 1979-08-01 1981-02-19 Bayer Ag Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien
US4570197A (en) 1983-01-03 1986-02-11 Minnesota Mining & Manufacturing Company Static reduction in magnetic recording cassettes
US4943380A (en) 1987-09-18 1990-07-24 Takemoto Yushi Kabushiki Kaisha Antistatic resin composition with transparency containing phosphonium sulphonate
US4873020A (en) 1988-10-04 1989-10-10 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
US4904825A (en) 1988-11-08 1990-02-27 Ppg Industries, Inc. Quaternary ammonium antistatic compounds
US4973616A (en) 1988-11-14 1990-11-27 Ppg Industries, Inc. Toluene sulfonate salts of 2-alkyl imidazolines
JP2855370B2 (ja) 1990-11-19 1999-02-10 日華化学株式会社 内部練込み型ポリエステル樹脂用帯電防止剤
DE4320920C1 (de) * 1993-06-24 1994-06-16 Goldschmidt Ag Th Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien
JP3427848B2 (ja) 1993-07-02 2003-07-22 三菱瓦斯化学株式会社 帯電防止性樹脂組成物
EP0640646B1 (en) 1993-08-26 2002-11-06 Teijin Limited Process for production of stabilized polycarnonate
US5468793A (en) 1994-07-25 1995-11-21 Wico Corporation Plastic compositions with antistatic properties
JPH10298539A (ja) 1997-04-22 1998-11-10 Arutetsuku Kk 静電防止剤及びこの静電防止剤を用いて成る塗布及び接着剤
US6194497B1 (en) 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
JPH11106635A (ja) 1997-09-30 1999-04-20 Ge Plastics Japan Ltd ポリカーボネート樹脂組成物およびその成形品
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition

Also Published As

Publication number Publication date
EP1556437A1 (en) 2005-07-27
JP2005535690A (ja) 2005-11-24
KR20050062767A (ko) 2005-06-27
WO2004013218A1 (en) 2004-02-12
CN100341928C (zh) 2007-10-10
US20040030015A1 (en) 2004-02-12
AU2003247597A1 (en) 2004-02-23
TW200402444A (en) 2004-02-16
US6900257B2 (en) 2005-05-31
DE60322565D1 (de) 2008-09-11
CN1688644A (zh) 2005-10-26
ATE402977T1 (de) 2008-08-15
EP1556437B1 (en) 2008-07-30

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