KR20050062767A - 대전 방지제 및 이로부터 유도된 중합체 조성물 - Google Patents

대전 방지제 및 이로부터 유도된 중합체 조성물 Download PDF

Info

Publication number
KR20050062767A
KR20050062767A KR1020057002247A KR20057002247A KR20050062767A KR 20050062767 A KR20050062767 A KR 20050062767A KR 1020057002247 A KR1020057002247 A KR 1020057002247A KR 20057002247 A KR20057002247 A KR 20057002247A KR 20050062767 A KR20050062767 A KR 20050062767A
Authority
KR
South Korea
Prior art keywords
substituted
unsubstituted aliphatic
functional group
aromatic
aromatic functional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020057002247A
Other languages
English (en)
Korean (ko)
Inventor
산조이 쿠마르 초우더리
티오도러스 램버터스 획스
Original Assignee
제너럴 일렉트릭 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제너럴 일렉트릭 캄파니 filed Critical 제너럴 일렉트릭 캄파니
Publication of KR20050062767A publication Critical patent/KR20050062767A/ko
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075Antistatics
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62Quaternary ammonium compounds
    • C07C211/63Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/081Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/548Silicon-containing compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020057002247A 2002-08-06 2003-06-17 대전 방지제 및 이로부터 유도된 중합체 조성물 Ceased KR20050062767A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/064,676 2002-08-06
US10/064,676 US6900257B2 (en) 2002-08-06 2002-08-06 Antistatic agents and polymer compositions derived therefrom

Publications (1)

Publication Number Publication Date
KR20050062767A true KR20050062767A (ko) 2005-06-27

Family

ID=31493933

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057002247A Ceased KR20050062767A (ko) 2002-08-06 2003-06-17 대전 방지제 및 이로부터 유도된 중합체 조성물

Country Status (11)

Country Link
US (1) US6900257B2 (https=)
EP (1) EP1556437B1 (https=)
JP (1) JP2005535690A (https=)
KR (1) KR20050062767A (https=)
CN (1) CN100341928C (https=)
AT (1) ATE402977T1 (https=)
AU (1) AU2003247597A1 (https=)
DE (1) DE60322565D1 (https=)
ES (1) ES2306896T3 (https=)
TW (1) TW200402444A (https=)
WO (1) WO2004013218A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140057534A (ko) * 2011-07-04 2014-05-13 닛신보 홀딩스 가부시키 가이샤 이온 액체

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
US7291566B2 (en) * 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US20080119598A1 (en) * 2005-01-14 2008-05-22 E.I. Du Pont De Nemours And Company Treated Inorganic Metal Containing Powders and Polymer Films Containing Them
US8071667B2 (en) 2005-06-02 2011-12-06 Nalco Company Compositions comprising (poly) alpha olefins
JP6090561B2 (ja) * 2012-10-16 2017-03-08 日清紡ホールディングス株式会社 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス
JP6051757B2 (ja) 2012-10-16 2016-12-27 日清紡ホールディングス株式会社 イオン液体
US9493610B2 (en) 2013-06-03 2016-11-15 Polyone Corporation Low molecular weight polyphenylene ether prepared without solvents
CN107532100B (zh) 2015-05-11 2020-10-02 日清纺控股株式会社 包含含有硅的离子液体的润滑剂
JP6582705B2 (ja) * 2015-08-10 2019-10-02 日清紡ホールディングス株式会社 下限臨界共溶温度型の相挙動を示す化合物の利用
JP6601094B2 (ja) 2015-09-25 2019-11-06 日清紡ホールディングス株式会社 電解液用添加剤
JP6651968B2 (ja) * 2016-04-21 2020-02-19 日清紡ホールディングス株式会社 ケイ素含有硫酸エステル塩
JP6958511B2 (ja) * 2018-08-17 2021-11-02 信越化学工業株式会社 オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141898A (en) * 1961-01-03 1964-07-21 Minnesota Mining & Mfg 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts
US3328449A (en) 1963-12-05 1967-06-27 Dow Corning Sulfopropylated, organofunctional silanes and siloxanes
US4093589A (en) * 1977-02-03 1978-06-06 General Electric Company Non-opaque flame retardant polycarbonate composition
DE2931172A1 (de) * 1979-08-01 1981-02-19 Bayer Ag Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien
US4570197A (en) 1983-01-03 1986-02-11 Minnesota Mining & Manufacturing Company Static reduction in magnetic recording cassettes
US4943380A (en) * 1987-09-18 1990-07-24 Takemoto Yushi Kabushiki Kaisha Antistatic resin composition with transparency containing phosphonium sulphonate
US4873020A (en) 1988-10-04 1989-10-10 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
US4904825A (en) 1988-11-08 1990-02-27 Ppg Industries, Inc. Quaternary ammonium antistatic compounds
US4973616A (en) * 1988-11-14 1990-11-27 Ppg Industries, Inc. Toluene sulfonate salts of 2-alkyl imidazolines
JP2855370B2 (ja) 1990-11-19 1999-02-10 日華化学株式会社 内部練込み型ポリエステル樹脂用帯電防止剤
DE4320920C1 (de) * 1993-06-24 1994-06-16 Goldschmidt Ag Th Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien
JP3427848B2 (ja) * 1993-07-02 2003-07-22 三菱瓦斯化学株式会社 帯電防止性樹脂組成物
DE69431642T2 (de) * 1993-08-26 2003-07-10 Teijin Ltd., Osaka Process for production of stabilized polycarbonate
US5468793A (en) * 1994-07-25 1995-11-21 Wico Corporation Plastic compositions with antistatic properties
JPH10298539A (ja) 1997-04-22 1998-11-10 Arutetsuku Kk 静電防止剤及びこの静電防止剤を用いて成る塗布及び接着剤
US6194497B1 (en) 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
JPH11106635A (ja) 1997-09-30 1999-04-20 Ge Plastics Japan Ltd ポリカーボネート樹脂組成物およびその成形品
US6372829B1 (en) * 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140057534A (ko) * 2011-07-04 2014-05-13 닛신보 홀딩스 가부시키 가이샤 이온 액체

Also Published As

Publication number Publication date
US20040030015A1 (en) 2004-02-12
US6900257B2 (en) 2005-05-31
EP1556437A1 (en) 2005-07-27
ATE402977T1 (de) 2008-08-15
WO2004013218A1 (en) 2004-02-12
CN100341928C (zh) 2007-10-10
TW200402444A (en) 2004-02-16
AU2003247597A1 (en) 2004-02-23
CN1688644A (zh) 2005-10-26
DE60322565D1 (de) 2008-09-11
JP2005535690A (ja) 2005-11-24
EP1556437B1 (en) 2008-07-30
ES2306896T3 (es) 2008-11-16

Similar Documents

Publication Publication Date Title
US7851524B2 (en) Antistatic agents, compositions thereof, and methods of manufacture
KR20050062767A (ko) 대전 방지제 및 이로부터 유도된 중합체 조성물
EP0897950B1 (en) Anti-static resin composition
TWI791629B (zh) 硬化性組成物、硬化膜,及硬化物之製造方法
US7169333B2 (en) Antistatic agent
JP2924357B2 (ja) 亜リン酸エステル化合物、その製法および用途
US2488449A (en) Organo-silicon-phosphorus condensation products
CN111233947A (zh) 一类呋喃糖环状磷酸酯阻燃剂的结构及其制备方法
EP0049166B1 (en) Hydrolytically stable diphosphites useful as antioxidants
CN100410306C (zh) 合成高分子材料用抗静电剂、其制法及该材料组合物
US4146530A (en) Dicyclophosphites and organic polymers stabilized with said phosphites and their use as stabilizers
USRE38530E1 (en) Anti-static resin composition containing fluorinated phosphonium sulfonates
KR101176669B1 (ko) 정전기 방지제의 제조방법
US3630991A (en) Oxidation inhibitor
JPS63146855A (ja) 3‐第三ブチル‐ あるいは 3‐ 第三ブチル‐5‐ アルキル‐4‐ ヒドロキシフエニル‐(アルカン) カルボン酸とポリチオール類のオキシエチラートとのエステル、その製造方法および安定剤としてのその用途
JPH01153651A (ja) 紫外線安定剤
CN121712861A (zh) 阻燃化合物和使用其的阻燃树脂组合物、阻燃产品
KR20080061726A (ko) 대전방지용 수지 조성물
MXPA97010165A (en) Absorbers of ultraviolet light silicadosmejorados that have resistance to the hume

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20050207

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20080516

Comment text: Request for Examination of Application

N231 Notification of change of applicant
PN2301 Change of applicant

Patent event date: 20080808

Comment text: Notification of Change of Applicant

Patent event code: PN23011R01D

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20090921

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20100112

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20090921

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I