CN100341928C - 抗静电剂及由其得到的高分子组合物 - Google Patents

抗静电剂及由其得到的高分子组合物 Download PDF

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Publication number
CN100341928C
CN100341928C CNB038236907A CN03823690A CN100341928C CN 100341928 C CN100341928 C CN 100341928C CN B038236907 A CNB038236907 A CN B038236907A CN 03823690 A CN03823690 A CN 03823690A CN 100341928 C CN100341928 C CN 100341928C
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CN
China
Prior art keywords
functional group
replacing
unsubstituted aliphatic
aromatic functional
aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB038236907A
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English (en)
Chinese (zh)
Other versions
CN1688644A (zh
Inventor
桑乔伊·K·乔杜里
西奥多勒斯·L·霍克斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of CN1688644A publication Critical patent/CN1688644A/zh
Application granted granted Critical
Publication of CN100341928C publication Critical patent/CN100341928C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075—Antistatics
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/548—Silicon-containing compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CNB038236907A 2002-08-06 2003-06-17 抗静电剂及由其得到的高分子组合物 Expired - Fee Related CN100341928C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/064,676 2002-08-06
US10/064,676 US6900257B2 (en) 2002-08-06 2002-08-06 Antistatic agents and polymer compositions derived therefrom

Publications (2)

Publication Number Publication Date
CN1688644A CN1688644A (zh) 2005-10-26
CN100341928C true CN100341928C (zh) 2007-10-10

Family

ID=31493933

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038236907A Expired - Fee Related CN100341928C (zh) 2002-08-06 2003-06-17 抗静电剂及由其得到的高分子组合物

Country Status (11)

Country Link
US (1) US6900257B2 (https=)
EP (1) EP1556437B1 (https=)
JP (1) JP2005535690A (https=)
KR (1) KR20050062767A (https=)
CN (1) CN100341928C (https=)
AT (1) ATE402977T1 (https=)
AU (1) AU2003247597A1 (https=)
DE (1) DE60322565D1 (https=)
ES (1) ES2306896T3 (https=)
TW (1) TW200402444A (https=)
WO (1) WO2004013218A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103635479A (zh) * 2011-07-04 2014-03-12 日清纺控股株式会社 离子液体
CN104737256A (zh) * 2012-10-16 2015-06-24 日清纺控股株式会社 蓄电器件用电解质盐和电解液以及蓄电器件

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
US7291566B2 (en) * 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US20080119598A1 (en) * 2005-01-14 2008-05-22 E.I. Du Pont De Nemours And Company Treated Inorganic Metal Containing Powders and Polymer Films Containing Them
US8071667B2 (en) 2005-06-02 2011-12-06 Nalco Company Compositions comprising (poly) alpha olefins
JP6051757B2 (ja) 2012-10-16 2016-12-27 日清紡ホールディングス株式会社 イオン液体
US9493610B2 (en) 2013-06-03 2016-11-15 Polyone Corporation Low molecular weight polyphenylene ether prepared without solvents
CN107532100B (zh) 2015-05-11 2020-10-02 日清纺控股株式会社 包含含有硅的离子液体的润滑剂
JP6582705B2 (ja) * 2015-08-10 2019-10-02 日清紡ホールディングス株式会社 下限臨界共溶温度型の相挙動を示す化合物の利用
JP6601094B2 (ja) 2015-09-25 2019-11-06 日清紡ホールディングス株式会社 電解液用添加剤
JP6651968B2 (ja) * 2016-04-21 2020-02-19 日清紡ホールディングス株式会社 ケイ素含有硫酸エステル塩
JP6958511B2 (ja) * 2018-08-17 2021-11-02 信越化学工業株式会社 オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1030888A (en) * 1963-12-05 1966-05-25 Dow Corning Silanes and siloxanes
EP0363094B1 (en) * 1988-10-04 1993-08-04 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
EP0873986A1 (en) * 1997-04-22 1998-10-28 Altech Company Limited Antistatic agents
WO2001025326A1 (en) * 1999-10-06 2001-04-12 3M Innovative Properties Company Antistatic composition

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141898A (en) * 1961-01-03 1964-07-21 Minnesota Mining & Mfg 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts
US4093589A (en) * 1977-02-03 1978-06-06 General Electric Company Non-opaque flame retardant polycarbonate composition
DE2931172A1 (de) * 1979-08-01 1981-02-19 Bayer Ag Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien
US4570197A (en) 1983-01-03 1986-02-11 Minnesota Mining & Manufacturing Company Static reduction in magnetic recording cassettes
US4943380A (en) * 1987-09-18 1990-07-24 Takemoto Yushi Kabushiki Kaisha Antistatic resin composition with transparency containing phosphonium sulphonate
US4904825A (en) 1988-11-08 1990-02-27 Ppg Industries, Inc. Quaternary ammonium antistatic compounds
US4973616A (en) * 1988-11-14 1990-11-27 Ppg Industries, Inc. Toluene sulfonate salts of 2-alkyl imidazolines
JP2855370B2 (ja) 1990-11-19 1999-02-10 日華化学株式会社 内部練込み型ポリエステル樹脂用帯電防止剤
DE4320920C1 (de) * 1993-06-24 1994-06-16 Goldschmidt Ag Th Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien
JP3427848B2 (ja) * 1993-07-02 2003-07-22 三菱瓦斯化学株式会社 帯電防止性樹脂組成物
DE69431642T2 (de) * 1993-08-26 2003-07-10 Teijin Ltd., Osaka Process for production of stabilized polycarbonate
US5468793A (en) * 1994-07-25 1995-11-21 Wico Corporation Plastic compositions with antistatic properties
US6194497B1 (en) 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
JPH11106635A (ja) 1997-09-30 1999-04-20 Ge Plastics Japan Ltd ポリカーボネート樹脂組成物およびその成形品
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1030888A (en) * 1963-12-05 1966-05-25 Dow Corning Silanes and siloxanes
EP0363094B1 (en) * 1988-10-04 1993-08-04 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
EP0873986A1 (en) * 1997-04-22 1998-10-28 Altech Company Limited Antistatic agents
WO2001025326A1 (en) * 1999-10-06 2001-04-12 3M Innovative Properties Company Antistatic composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103635479A (zh) * 2011-07-04 2014-03-12 日清纺控股株式会社 离子液体
CN103635479B (zh) * 2011-07-04 2015-12-09 日清纺控股株式会社 离子液体
CN104737256A (zh) * 2012-10-16 2015-06-24 日清纺控股株式会社 蓄电器件用电解质盐和电解液以及蓄电器件
CN104737256B (zh) * 2012-10-16 2018-01-30 日清纺控股株式会社 蓄电器件用电解质盐和电解液以及蓄电器件

Also Published As

Publication number Publication date
US20040030015A1 (en) 2004-02-12
US6900257B2 (en) 2005-05-31
EP1556437A1 (en) 2005-07-27
ATE402977T1 (de) 2008-08-15
WO2004013218A1 (en) 2004-02-12
TW200402444A (en) 2004-02-16
AU2003247597A1 (en) 2004-02-23
CN1688644A (zh) 2005-10-26
DE60322565D1 (de) 2008-09-11
JP2005535690A (ja) 2005-11-24
EP1556437B1 (en) 2008-07-30
KR20050062767A (ko) 2005-06-27
ES2306896T3 (es) 2008-11-16

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Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SHABO BASE CREATION PLASTICS INTELLECTUAL PROPERT

Free format text: FORMER OWNER: GENERAL ELECTRIC CO.

Effective date: 20081107

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20081107

Address after: Bergen Op Zoom Holland

Patentee after: Sabic Innovative Plastics Ip

Address before: American New York

Patentee before: General Electric Company

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20071010