TW200402444A - Antistatic agents and polymer compositions derived therefrom - Google Patents

Antistatic agents and polymer compositions derived therefrom Download PDF

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Publication number
TW200402444A
TW200402444A TW092120685A TW92120685A TW200402444A TW 200402444 A TW200402444 A TW 200402444A TW 092120685 A TW092120685 A TW 092120685A TW 92120685 A TW92120685 A TW 92120685A TW 200402444 A TW200402444 A TW 200402444A
Authority
TW
Taiwan
Prior art keywords
substituted
aliphatic
aromatic
functional group
unsubstituted
Prior art date
Application number
TW092120685A
Other languages
English (en)
Chinese (zh)
Inventor
Sanjoy Kumar Chowdhury
Theodorus Lambertus Hoeks
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of TW200402444A publication Critical patent/TW200402444A/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075Antistatics
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62Quaternary ammonium compounds
    • C07C211/63Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/081Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/548Silicon-containing compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW092120685A 2002-08-06 2003-07-29 Antistatic agents and polymer compositions derived therefrom TW200402444A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/064,676 US6900257B2 (en) 2002-08-06 2002-08-06 Antistatic agents and polymer compositions derived therefrom

Publications (1)

Publication Number Publication Date
TW200402444A true TW200402444A (en) 2004-02-16

Family

ID=31493933

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092120685A TW200402444A (en) 2002-08-06 2003-07-29 Antistatic agents and polymer compositions derived therefrom

Country Status (11)

Country Link
US (1) US6900257B2 (https=)
EP (1) EP1556437B1 (https=)
JP (1) JP2005535690A (https=)
KR (1) KR20050062767A (https=)
CN (1) CN100341928C (https=)
AT (1) ATE402977T1 (https=)
AU (1) AU2003247597A1 (https=)
DE (1) DE60322565D1 (https=)
ES (1) ES2306896T3 (https=)
TW (1) TW200402444A (https=)
WO (1) WO2004013218A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
US7291566B2 (en) * 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US20080119598A1 (en) * 2005-01-14 2008-05-22 E.I. Du Pont De Nemours And Company Treated Inorganic Metal Containing Powders and Polymer Films Containing Them
US8071667B2 (en) 2005-06-02 2011-12-06 Nalco Company Compositions comprising (poly) alpha olefins
JP5866829B2 (ja) * 2011-07-04 2016-02-24 日清紡ホールディングス株式会社 イオン液体
JP6090561B2 (ja) * 2012-10-16 2017-03-08 日清紡ホールディングス株式会社 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス
JP6051757B2 (ja) 2012-10-16 2016-12-27 日清紡ホールディングス株式会社 イオン液体
US9493610B2 (en) 2013-06-03 2016-11-15 Polyone Corporation Low molecular weight polyphenylene ether prepared without solvents
CN107532100B (zh) 2015-05-11 2020-10-02 日清纺控股株式会社 包含含有硅的离子液体的润滑剂
JP6582705B2 (ja) * 2015-08-10 2019-10-02 日清紡ホールディングス株式会社 下限臨界共溶温度型の相挙動を示す化合物の利用
JP6601094B2 (ja) 2015-09-25 2019-11-06 日清紡ホールディングス株式会社 電解液用添加剤
JP6651968B2 (ja) * 2016-04-21 2020-02-19 日清紡ホールディングス株式会社 ケイ素含有硫酸エステル塩
JP6958511B2 (ja) * 2018-08-17 2021-11-02 信越化学工業株式会社 オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141898A (en) * 1961-01-03 1964-07-21 Minnesota Mining & Mfg 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts
US3328449A (en) 1963-12-05 1967-06-27 Dow Corning Sulfopropylated, organofunctional silanes and siloxanes
US4093589A (en) * 1977-02-03 1978-06-06 General Electric Company Non-opaque flame retardant polycarbonate composition
DE2931172A1 (de) * 1979-08-01 1981-02-19 Bayer Ag Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien
US4570197A (en) 1983-01-03 1986-02-11 Minnesota Mining & Manufacturing Company Static reduction in magnetic recording cassettes
US4943380A (en) * 1987-09-18 1990-07-24 Takemoto Yushi Kabushiki Kaisha Antistatic resin composition with transparency containing phosphonium sulphonate
US4873020A (en) 1988-10-04 1989-10-10 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
US4904825A (en) 1988-11-08 1990-02-27 Ppg Industries, Inc. Quaternary ammonium antistatic compounds
US4973616A (en) * 1988-11-14 1990-11-27 Ppg Industries, Inc. Toluene sulfonate salts of 2-alkyl imidazolines
JP2855370B2 (ja) 1990-11-19 1999-02-10 日華化学株式会社 内部練込み型ポリエステル樹脂用帯電防止剤
DE4320920C1 (de) * 1993-06-24 1994-06-16 Goldschmidt Ag Th Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien
JP3427848B2 (ja) * 1993-07-02 2003-07-22 三菱瓦斯化学株式会社 帯電防止性樹脂組成物
DE69431642T2 (de) * 1993-08-26 2003-07-10 Teijin Ltd., Osaka Process for production of stabilized polycarbonate
US5468793A (en) * 1994-07-25 1995-11-21 Wico Corporation Plastic compositions with antistatic properties
JPH10298539A (ja) 1997-04-22 1998-11-10 Arutetsuku Kk 静電防止剤及びこの静電防止剤を用いて成る塗布及び接着剤
US6194497B1 (en) 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
JPH11106635A (ja) 1997-09-30 1999-04-20 Ge Plastics Japan Ltd ポリカーボネート樹脂組成物およびその成形品
US6372829B1 (en) * 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition

Also Published As

Publication number Publication date
US20040030015A1 (en) 2004-02-12
US6900257B2 (en) 2005-05-31
EP1556437A1 (en) 2005-07-27
ATE402977T1 (de) 2008-08-15
WO2004013218A1 (en) 2004-02-12
CN100341928C (zh) 2007-10-10
AU2003247597A1 (en) 2004-02-23
CN1688644A (zh) 2005-10-26
DE60322565D1 (de) 2008-09-11
JP2005535690A (ja) 2005-11-24
EP1556437B1 (en) 2008-07-30
KR20050062767A (ko) 2005-06-27
ES2306896T3 (es) 2008-11-16

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