ES2306204T3 - Componente con una capa reflectora y procedimiento para su produccion. - Google Patents

Componente con una capa reflectora y procedimiento para su produccion. Download PDF

Info

Publication number
ES2306204T3
ES2306204T3 ES05777540T ES05777540T ES2306204T3 ES 2306204 T3 ES2306204 T3 ES 2306204T3 ES 05777540 T ES05777540 T ES 05777540T ES 05777540 T ES05777540 T ES 05777540T ES 2306204 T3 ES2306204 T3 ES 2306204T3
Authority
ES
Spain
Prior art keywords
sio2
layer
covering layer
slip
component according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES05777540T
Other languages
English (en)
Spanish (es)
Inventor
Armin Maul
Thorsten Herbert
Jurgen Weber
Sven Linow
Stefan Fuchs
Andreas Schreiber
Reinhard Sellner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE102005016732A external-priority patent/DE102005016732A1/de
Application filed by Heraeus Quarzglas GmbH and Co KG filed Critical Heraeus Quarzglas GmbH and Co KG
Application granted granted Critical
Publication of ES2306204T3 publication Critical patent/ES2306204T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C03C17/004—Coating the inside
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C03C17/005—Coating the outside
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00—Reflectors for light sources
    • F21V7/22—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • F21V7/24—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors characterised by the material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00—Reflectors for light sources
    • F21V7/22—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • F21V7/28—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors characterised by coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/28—Envelopes; Vessels
    • H01K1/32—Envelopes; Vessels provided with coatings on the walls; Vessels or coatings thereon characterised by the material thereof
    • H01K1/325—Reflecting coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/28—Envelopes; Vessels
    • H01K1/34—Double wall vessels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/009—Heating devices using lamps heating devices not specially adapted for a particular application
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/478—Silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/112—Deposition methods from solutions or suspensions by spraying
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Glass Compositions (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Glass (AREA)
  • Aerials With Secondary Devices (AREA)
  • Laminated Bodies (AREA)
ES05777540T 2004-08-23 2005-08-23 Componente con una capa reflectora y procedimiento para su produccion. Expired - Lifetime ES2306204T3 (es)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DE102004040833 2004-08-23
DE102004040833 2004-08-23
DE102004051846 2004-10-26
DE102004051846A DE102004051846B4 (de) 2004-08-23 2004-10-26 Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung
DE102005016732A DE102005016732A1 (de) 2004-10-26 2005-04-11 Bauteil mit einer Reflektorschicht
DE102005016732 2005-04-11

Publications (1)

Publication Number Publication Date
ES2306204T3 true ES2306204T3 (es) 2008-11-01

Family

ID=35395734

Family Applications (1)

Application Number Title Priority Date Filing Date
ES05777540T Expired - Lifetime ES2306204T3 (es) 2004-08-23 2005-08-23 Componente con una capa reflectora y procedimiento para su produccion.

Country Status (9)

Country Link
EP (1) EP1784368B1 (enExample)
JP (1) JP5008198B2 (enExample)
KR (1) KR101113777B1 (enExample)
AT (1) ATE396155T1 (enExample)
CA (1) CA2575799C (enExample)
DE (2) DE102004051846B4 (enExample)
ES (1) ES2306204T3 (enExample)
PL (1) PL1784368T3 (enExample)
WO (1) WO2006021416A1 (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005058819B4 (de) * 2005-10-13 2009-04-30 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Beschichtung eines Bauteils aus hochkieselsäurehaltigem Glas, mit einer SiO2-haltigen, glasigen Schicht versehenes Bauteil, sowie Verwendung des Bauteils
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
DE102006055397B3 (de) * 2006-11-22 2008-05-15 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Vorrichtung für die Herstellung eines zylinderförmigen Profilelements aus Quarzglas sowie Verwendung desselben
DE102006062166B4 (de) * 2006-12-22 2009-05-14 Heraeus Quarzglas Gmbh & Co. Kg Quarzglas-Bauteil mit Reflektorschicht sowie Verfahren zur Herstellung desselben
DE102007040466A1 (de) * 2007-02-15 2008-08-21 Heraeus Quarzglas Gmbh & Co. Kg Quarzglas-Bauteil als Leitungseinheit für ein UV-Entkeimungsgerät
DE102007008696B3 (de) * 2007-02-20 2008-10-02 Heraeus Noblelight Gmbh Infrarotstrahler mit opakem Reflektor und seine Herstellung
DE102007030698B4 (de) 2007-06-30 2009-06-10 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Verbundkörpers aus einem Basiskörper aus opakem Quarzglas und einer dichten Versiegelungsschicht sowie Verwendung des Verbundkörpers
DE102007048564A1 (de) * 2007-10-09 2009-04-23 Heraeus Noblelight Gmbh Vorrichtung für eine Bestrahlungseinheit
DE102007049930B4 (de) * 2007-10-18 2011-04-28 Universität Hamburg Oberflächenmodifizierte Hohlraumstrukturen, Verfahren zu deren Herstellung sowie deren Verwendung
US20090308315A1 (en) * 2008-06-13 2009-12-17 Asm International N.V. Semiconductor processing apparatus with improved thermal characteristics and method for providing the same
DE102008028233A1 (de) * 2008-06-16 2009-12-17 Heraeus Noblelight Gmbh Kompaktes UV-Bestrahlungsmodul
DE102008063677B4 (de) 2008-12-19 2012-10-04 Heraeus Noblelight Gmbh Infrarotstrahler und Verwendung des Infrarotstrahlers in einer Prozesskammer
JP5441243B2 (ja) * 2009-02-24 2014-03-12 信越石英株式会社 赤外線透過性部材の熱処理用石英ガラス治具
GB2474032B (en) 2009-10-01 2016-07-27 Heraeus Noblelight Gmbh Flash lamp or gas discharge lamp with integrated reflector
DE102009049032B3 (de) * 2009-10-10 2011-03-24 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines beschichteten Bauteils aus Quarzglas
DE102009059015B4 (de) 2009-12-17 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasbauteil mit opaker Innenzone sowie Verfahren zur Herstellung desselben
DE102011012363A1 (de) 2011-02-24 2012-08-30 Heraeus Noblelight Gmbh Infrarot-Flächenstrahler mit hoher Strahlungsleistung und Verfahren für seine Herstellung
DE102012025142A1 (de) * 2012-12-21 2014-06-26 Heraeus Noblelight Gmbh Infrarotstrahler mit hoher Strahlungsleistung
DE202013000527U1 (de) * 2013-01-21 2013-08-27 Kay-Michael Bauer Infrarotstrahler in U-Form mit Keramik-Reflektorbeschichtung
SG11201508512PA (en) * 2013-05-23 2015-12-30 Applied Materials Inc A coated liner assembly for a semiconductor processing chamber
EP2878584B1 (de) 2013-11-28 2017-01-04 Heraeus Quarzglas GmbH & Co. KG Verfahren zur Herstellung eines beschichteten Bauteils aus Quarzglas oder Quarzgut
EP3023162A1 (de) 2014-11-24 2016-05-25 Heraeus Quarzglas GmbH & Co. KG Verfahren zur Herstellung eines mit einer Funktionsschicht versehenen Bauteils aus Glas sowie Vorrichtung zur Herstellung einer derartigen Schicht
DE102015104932B3 (de) * 2015-03-31 2016-06-02 Heraeus Noblelight Gmbh Vorrichtung zur Wärmebehandlung
DE102015119763A1 (de) 2015-11-16 2017-05-18 Heraeus Quarzglas Gmbh & Co. Kg Infrarotstrahler
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
KR20180095616A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
EP3390308B1 (de) 2015-12-18 2024-08-28 Heraeus Quarzglas GmbH & Co. KG Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt
TWI812586B (zh) 2015-12-18 2023-08-21 德商何瑞斯廓格拉斯公司 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點
JP6881776B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 不透明石英ガラス体の調製
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
EP3185057A1 (de) * 2015-12-22 2017-06-28 Heraeus Quarzglas GmbH & Co. KG Faseroptische streueinrichtung und herstellungsverfahren dafür
DE102016111234B4 (de) 2016-06-20 2018-01-25 Heraeus Noblelight Gmbh Vorrichtung für die thermische Behandlung eines Substrats sowie Trägerhorde und Substrat-Trägerelement dafür
DE102016113815A1 (de) 2016-07-27 2018-02-01 Heraeus Noblelight Gmbh Infrarotflächenstrahler und Verfahren zur Herstellung des Infrarotflächenstrahlers
EP3428132B1 (de) * 2017-07-10 2023-08-30 Heraeus Quarzglas GmbH & Co. KG Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben
PL3546431T3 (pl) * 2018-03-28 2024-09-16 Ovivo Inc. Urządzenie i sposób do dostarczania ultraczystej wody
DE102020128337A1 (de) 2020-10-28 2022-04-28 Heraeus Noblelight Gmbh Strahlerbauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung
DE102020131324A1 (de) 2020-11-26 2022-06-02 Heraeus Noblelight Gmbh Infrarotstrahler und Infrarotstrahlung emittierendes Bauelement
DE102022111985A1 (de) 2022-05-12 2023-11-16 Heraeus Noblelight Gmbh Infrarot-Strahler mit einer auf eine Reflektorschicht aus Metall aufgebrachten emissiven Schicht und Verwendung der emissiven Schicht
CN120043073A (zh) * 2023-11-27 2025-05-27 苏州佳世达光电有限公司 反光板及照明装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE587715C (de) * 1932-10-14 1933-11-07 Patra Patent Treuhand Elektrische Gluehlampe oder Leuchtroehre mit einem fuer sichtbare und auch ultraviolette Strahlen durchlaessigen Glasgefaess
JPS56158090U (enExample) * 1980-04-25 1981-11-25
JPS6268101U (enExample) * 1985-10-17 1987-04-28
US5045751A (en) * 1988-10-25 1991-09-03 Asahi Glass Company Ltd. Cathode ray tube of improved breakdown voltage characteristic
KR900007740A (ko) * 1988-11-04 1990-06-01 후루모또 지로 유리보강법과 그에 사용되는 필름 형성 합성물 및 그 강화 유리제품
DE69027590T2 (de) * 1989-08-01 1996-12-05 Asahi Glass Co Ltd Verfahren zur Herstellung von Schichten auf basis von Siliziumdioxyd mittels DC Sputtern und Target dafür
DE4022100C1 (enExample) * 1990-07-11 1991-10-24 Heraeus Quarzglas Gmbh, 6450 Hanau, De
DE4338807C1 (de) * 1993-11-12 1995-01-26 Heraeus Quarzglas Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper
DE4417405A1 (de) * 1994-05-18 1995-11-23 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung von strukturierten anorganischen Schichten
JPH08315965A (ja) * 1994-09-29 1996-11-29 Tokyo Electron Ltd 加熱装置及びその製造方法、並びに処理装置
JP4185194B2 (ja) * 1997-07-31 2008-11-26 コバレントマテリアル株式会社 カーボンヒータ
GB9722020D0 (en) * 1997-10-17 1997-12-17 Tsl Group Plc Production of quartz glass articles having high surface purity
DE19822829A1 (de) * 1998-05-20 1999-11-25 Heraeus Noblelight Gmbh Kurzwelliger Infrarot-Flächenstrahler
DE19962451C1 (de) * 1999-12-22 2001-08-30 Heraeus Quarzglas Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat
GB0011964D0 (en) * 2000-05-18 2000-07-05 Suyal N Thick glass films with controlled refractive indices and their applications
DE10211249B4 (de) * 2002-03-13 2004-06-17 Heraeus Noblelight Gmbh Verwendung eines Glanzedelmetallpräparats
DE10243954B3 (de) * 2002-09-20 2004-07-08 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs sowie Verwendung desselben
JP4444559B2 (ja) * 2002-10-09 2010-03-31 ジャパンスーパークォーツ株式会社 石英ガラスルツボの強化方法とシリコン単結晶の引き上げ方法
DE10253582B3 (de) * 2002-11-15 2004-07-15 Heraeus Noblelight Gmbh Infrarotstrahler, Verfahren zu seiner Herstellung und seine Verwendung

Also Published As

Publication number Publication date
WO2006021416A1 (de) 2006-03-02
PL1784368T3 (pl) 2008-10-31
KR101113777B1 (ko) 2012-02-27
EP1784368A1 (de) 2007-05-16
CA2575799C (en) 2013-01-08
DE502005004213D1 (de) 2008-07-03
JP2008510677A (ja) 2008-04-10
DE102004051846B4 (de) 2009-11-05
EP1784368B1 (de) 2008-05-21
ATE396155T1 (de) 2008-06-15
KR20070054686A (ko) 2007-05-29
CA2575799A1 (en) 2006-03-02
JP5008198B2 (ja) 2012-08-22
DE102004051846A1 (de) 2006-03-02

Similar Documents

Publication Publication Date Title
ES2306204T3 (es) Componente con una capa reflectora y procedimiento para su produccion.
JP2008510677A5 (enExample)
US7563512B2 (en) Component with a reflector layer and method for producing the same
US8209998B2 (en) SiO2 slurry for the production of quartz glass as well as the application of the slurry
ES2634506T3 (es) Filtro óptico de conversión descendente conmutado térmicamente
KR960705742A (ko) 석영유리 성형체 및 그 제조방법
CN101052599B (zh) 用于接合部件的接合剂、用于接合由硅酸含量高的材料制备的部件的方法，和根据该方法获得的部件组件
JP4955419B2 (ja) 白色光励起レーザー装置
TWI480921B (zh) 介電質屏蔽放電燈、包含該燈的紫外線照射裝置以及介電質屏蔽放電燈的點燈方法
CN109429533A (zh) 荧光构件及发光模块
KR20090100229A (ko) 엑시머 램프
PT2401234E (pt) Folha de vidro
JP6840765B2 (ja) 合成により製造された石英ガラスのディフューザー材料及びその全体又は一部を構成する成形体の製造方法
Son et al. Efficient daytime radiative cooling cover sheet with dual‐modal optical properties
CN101023041B (zh) 具有反射体层的组件及其生产方法
KR101373943B1 (ko) 형광 램프
CN108409148B (zh) 红外非相干LED激发的上转换NaLuF4玻璃陶瓷及其制备方法
CN1913097B (zh) 受激准分子灯及制法
CN106927685B (zh) 一种具有长余辉发光的微晶玻璃光纤及其制备方法
JP4029548B2 (ja) 建材用ガラス物品及びその製造方法
ES2206681T3 (es) Material revelador de color, fotosensible y elemento termosensible que emplea dicho material.
ES2981349T3 (es) Cuerpo moldeado cerámico cocido y procedimiento para la fabricación de un cuerpo moldeado cerámico cocido utilizando radiación electromagnética con una frecuencia máxima de 300 GHZ
JPH05190142A (ja) 電球およびその製造方法
Lin et al. Cellular Inorganic Ceramic for Highly Efficient Daytime Passive Radiative Cooling
JP2010192159A (ja) 低圧水銀ランプ