ES2284972T3 - Procedimiento para la produccion de delgados revestimientos dificilmente solubles. - Google Patents

Procedimiento para la produccion de delgados revestimientos dificilmente solubles. Download PDF

Info

Publication number
ES2284972T3
ES2284972T3 ES02798256T ES02798256T ES2284972T3 ES 2284972 T3 ES2284972 T3 ES 2284972T3 ES 02798256 T ES02798256 T ES 02798256T ES 02798256 T ES02798256 T ES 02798256T ES 2284972 T3 ES2284972 T3 ES 2284972T3
Authority
ES
Spain
Prior art keywords
procedure
production
activation
solid
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES02798256T
Other languages
English (en)
Spanish (es)
Inventor
Hans-Jurgen Muffler
Marcus Bar
Felix Muller
Christian-Herbert Fischer
Martha Christina Lux-Steiner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hahn Meitner Institut Berlin GmbH
Original Assignee
Hahn Meitner Institut Berlin GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahn Meitner Institut Berlin GmbH filed Critical Hahn Meitner Institut Berlin GmbH
Application granted granted Critical
Publication of ES2284972T3 publication Critical patent/ES2284972T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemically Coating (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Compositions Of Oxide Ceramics (AREA)
ES02798256T 2001-11-30 2002-11-29 Procedimiento para la produccion de delgados revestimientos dificilmente solubles. Expired - Lifetime ES2284972T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160504A DE10160504C2 (de) 2001-11-30 2001-11-30 Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen
DE10160504 2001-11-30

Publications (1)

Publication Number Publication Date
ES2284972T3 true ES2284972T3 (es) 2007-11-16

Family

ID=7708607

Family Applications (1)

Application Number Title Priority Date Filing Date
ES02798256T Expired - Lifetime ES2284972T3 (es) 2001-11-30 2002-11-29 Procedimiento para la produccion de delgados revestimientos dificilmente solubles.

Country Status (5)

Country Link
EP (1) EP1448808B1 (de)
AT (1) ATE361380T1 (de)
DE (2) DE10160504C2 (de)
ES (1) ES2284972T3 (de)
WO (1) WO2003048404A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0524066D0 (en) * 2005-11-25 2006-01-04 Chiron Srl 741 ii
DE102009037371B3 (de) * 2009-08-13 2011-03-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Beschichtungsvorrichtung mit Ultraschallzerstäuber
DE102011050684A1 (de) 2011-05-27 2012-11-29 Karlsruher Institut für Technologie Vorrichtung und Verfahren zur Herstellung von hoch porösen, kristallinen Oberflächenbeschichtungen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5908608A (en) * 1996-11-08 1999-06-01 Spectra Science Corporation Synthesis of metal chalcogenide quantum
JPH1167677A (ja) * 1997-08-15 1999-03-09 Star Micronics Co Ltd オキシ硫化錫膜及びその製造方法
DE19831214C2 (de) * 1998-03-19 2003-07-03 Hahn Meitner Inst Berlin Gmbh Verfahren und Anordnung zur Herstellung dünner Metallchalkogenid-Schichten
DE19916403C1 (de) * 1999-04-06 2000-10-12 Hahn Meitner Inst Berlin Gmbh Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen

Also Published As

Publication number Publication date
WO2003048404A3 (de) 2003-11-27
DE50210087D1 (de) 2007-06-14
WO2003048404A2 (de) 2003-06-12
EP1448808A2 (de) 2004-08-25
ATE361380T1 (de) 2007-05-15
DE10160504A1 (de) 2003-06-12
DE10160504C2 (de) 2003-11-13
EP1448808B1 (de) 2007-05-02

Similar Documents

Publication Publication Date Title
JP4304235B2 (ja) 酸化チタン薄膜の製造方法および光分解触媒
US20080207785A1 (en) Process for forming mesostructured material and process for controlling orientation of tubular mesopores
KR880008438A (ko) 수소 실세스퀴옥산으로 부터의 다층 세라믹
ES2906881T3 (es) Método para producir una película de material absorbente de luz con una estructura similar a la perovskita
ES2284972T3 (es) Procedimiento para la produccion de delgados revestimientos dificilmente solubles.
KR20120095422A (ko) 산화인듐 함유 층의 제조 방법, 상기 방법에 의해 제조된 산화인듐 함유 층 및 그의 용도
US10199209B2 (en) Substrate treatment apparatus and substrate treatment method
JP6195916B2 (ja) 酸化インジウム含有層の製造法
JP6853382B2 (ja) ペロブスカイト構造を有する光吸収材料を生成するための方法、及びそれを実施するための可変組成の液体ポリハロゲン化物
CN102985429A (zh) 用于制备含氧化铟层的铟氧桥醇盐
JP2022541992A (ja) ペロブスカイト様構造を有する有機－無機金属－ハロゲン化物化合物の半導体膜の生産方法
ES2745085T3 (es) Método de fabricación de tetrahidrato de paratungstato de amonio y tetrahidrato de paratungstato de amonio de alta pureza
CN111886676A (zh) 晶圆的表面处理方法及用于该方法的组合物
US9142408B2 (en) Liquid precursor for deposition of indium selenide and method of preparing the same
US20130078458A1 (en) Method for the low-temperature preparation of electrically conductive mesostructured coatings
JP2002169303A (ja) パターン形成方法、および、このパターン形成方法により製造された電子デバイス、光学素子、光触媒性部材
US20020041932A1 (en) Method of preparing porous materials
US20170106406A1 (en) Method for manufacturing zinc oxide films
JP7429687B2 (ja) ペロブスカイト様材料の膜を形成するための方法
US20040202789A1 (en) Process for preparing thin film solids
KR101115389B1 (ko) Ⅱ?ⅵ족 화합물 반도체 박막의 용액상 제조방법 및 이에 의해 제조된 ⅱ?ⅵ족 화합물 반도체 박막
RU2001130044A (ru) Способ изготовления тонких, труднорастворимых покрытий (варианты)
KR20010113877A (ko) 잘 녹지 않는 얇은 코팅층 제조 방법
KR100932522B1 (ko) 마이크로 히터를 이용한 금속 산화물 나노 소재의 선택적증착방법 및 이를 이용한 가스센서
KR100308818B1 (ko) 다공성 ＴｉＯ₂박막이 코팅된 친수성 코팅 유리