ES2041783T3 - Mejoras en o relativas a precursores de placa de impresion. - Google Patents

Mejoras en o relativas a precursores de placa de impresion.

Info

Publication number
ES2041783T3
ES2041783T3 ES198888300083T ES88300083T ES2041783T3 ES 2041783 T3 ES2041783 T3 ES 2041783T3 ES 198888300083 T ES198888300083 T ES 198888300083T ES 88300083 T ES88300083 T ES 88300083T ES 2041783 T3 ES2041783 T3 ES 2041783T3
Authority
ES
Spain
Prior art keywords
printing plate
relative
plate precursors
barrier layer
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888300083T
Other languages
English (en)
Inventor
John Robert Wade
Jeremy Russell Burch
Rodney Martin Potts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of ES2041783T3 publication Critical patent/ES2041783T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electroluminescent Light Sources (AREA)
  • Glass Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Printing Methods (AREA)
  • Steering Control In Accordance With Driving Conditions (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Processing Of Color Television Signals (AREA)
  • Formation Of Insulating Films (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

UN PRECURSOR DE PLACAS DE IMPRESION COMPRENDE UN SUBSTRATO RECUBIERTO CON UN RECUBRIMIENTO DE COMPOSICION SENSIBLE A LA RADIACION CON UNA CAPA PROTECTORA PARA PROTEGER DEL OXIGENO, QUE INHIBE LA FOTOPOLIMERIZACION DE LA COMPOSICION. LA CAPA PROTECTORA COMPRENDE UN POLIMERO Y UN COMPUETO ANFOTERO.
ES198888300083T 1987-01-12 1988-01-07 Mejoras en o relativas a precursores de placa de impresion. Expired - Lifetime ES2041783T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB878700599A GB8700599D0 (en) 1987-01-12 1987-01-12 Printing plate precursors

Publications (1)

Publication Number Publication Date
ES2041783T3 true ES2041783T3 (es) 1993-12-01

Family

ID=10610559

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888300083T Expired - Lifetime ES2041783T3 (es) 1987-01-12 1988-01-07 Mejoras en o relativas a precursores de placa de impresion.

Country Status (15)

Country Link
US (1) US4942111A (es)
EP (1) EP0275147B1 (es)
JP (1) JP2588557B2 (es)
AT (1) ATE90798T1 (es)
AU (1) AU604822B2 (es)
BR (1) BR8800093A (es)
CA (1) CA1317149C (es)
DE (1) DE3881710T2 (es)
DK (1) DK10688A (es)
ES (1) ES2041783T3 (es)
FI (1) FI880104A (es)
GB (1) GB8700599D0 (es)
NO (1) NO880092L (es)
NZ (1) NZ223162A (es)
ZA (1) ZA88132B (es)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8903691D0 (en) * 1989-02-17 1989-04-05 Cookson Graphics Plc Lithographic printing plate
JP2977265B2 (ja) * 1990-11-19 1999-11-15 旭化成工業株式会社 感光性エラストマー構成体
US5308390A (en) * 1992-09-17 1994-05-03 Deluxe Corporation Ink composition and method of making and using such composition
US5454956A (en) * 1993-04-01 1995-10-03 Deluxe Corporation Method of cleaning waste water and recovery of contaminants therefrom
US5431721A (en) 1992-09-17 1995-07-11 Deluxe Corporation Ink varnish and composition and method of making the same
US5411596A (en) * 1993-04-01 1995-05-02 Deluxe Corporation Oil based composition clean up method and composition for use therein
US5549741A (en) 1992-09-17 1996-08-27 Deluxe Corporation Ink varnish composition
EP0672941A1 (en) * 1994-03-15 1995-09-20 Minnesota Mining And Manufacturing Company Silver halide photographic elements containing biocides
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
US5821030A (en) * 1995-07-20 1998-10-13 Kodak Polychrome Graphics Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
JP3384534B2 (ja) * 1996-04-15 2003-03-10 信越化学工業株式会社 反射防止膜材料
ES2181120T3 (es) * 1996-04-23 2003-02-16 Kodak Polychrome Graphics Co Compuestos termosensibles para precursores de forma para impresion litografica positiva.
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
EP0851296B1 (en) * 1996-12-23 2002-06-26 Agfa-Gevaert Thermally imageable material
US5912105A (en) * 1996-12-23 1999-06-15 Agfa-Gevaert Thermally imageable material
JPH10282681A (ja) * 1997-04-04 1998-10-23 Fuji Photo Film Co Ltd 感光性印刷版材用合紙
DE19732902A1 (de) 1997-07-30 1999-02-04 Sun Chemical Corp Deckschicht für lichtempfindliche Materialien umfassend ein (1-Vinylimidazol)-Polymer oder -Copolymer
GB9722862D0 (en) * 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
DE10022786B4 (de) 1999-05-12 2008-04-10 Kodak Graphic Communications Gmbh Auf der Druckmaschine entwickelbare Druckplatte
KR100401116B1 (ko) * 1999-06-03 2003-10-10 주식회사 하이닉스반도체 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법
US6984482B2 (en) 1999-06-03 2006-01-10 Hynix Semiconductor Inc. Top-coating composition for photoresist and process for forming fine pattern using the same
US6723493B2 (en) * 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
KR100942485B1 (ko) * 2002-04-02 2010-02-12 도요 보세키 가부시키가이샤 감광성 인쇄 원판
US6764813B2 (en) 2002-05-17 2004-07-20 Eastman Kodak Company Lamination of emissions prevention layer in photothermographic materials
RU2327195C1 (ru) * 2004-01-27 2008-06-20 Асахи Касеи Кемикалз Корпорейшн Фоточувствительная смола для гравируемой лазером печатной матрицы
CN1938162B (zh) * 2004-03-30 2011-06-01 旭化成电子材料株式会社 中空圆柱状印刷元件及其生产方法、中空圆柱状芯材料
JP4774318B2 (ja) * 2006-03-24 2011-09-14 住友化学株式会社 カラーフィルタの製造方法
JP4911455B2 (ja) * 2006-09-27 2012-04-04 富士フイルム株式会社 光重合型感光性平版印刷版原版
US8236479B2 (en) * 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US20090191482A1 (en) * 2008-01-30 2009-07-30 E.I. Du Pont De Nemours And Company Device and method for preparing relief printing form
US8241835B2 (en) * 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
JP2009214428A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8899148B2 (en) 2009-07-02 2014-12-02 E I Du Pont De Nemours And Company Method for printing a material onto a substrate
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
US9069252B2 (en) 2011-08-26 2015-06-30 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
GB1188921A (en) * 1968-01-31 1970-04-22 Du Pont Photopolymerizable Elements
AU2908771A (en) * 1970-06-08 1972-11-23 E. I. Dupont De Nemours And Company Photopolymerizable elements having an oxygen barrier polymer layer embodying polyfluoroethylene polymer particles
GB1335517A (en) * 1972-08-17 1973-10-31 Oce Van Der Grinten Nv Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer
US4072527A (en) * 1972-09-27 1978-02-07 E. I. Du Pont De Nemours And Company Oxygen barrier layers for photopolymerizable elements
US4072528A (en) * 1972-09-27 1978-02-07 E. I. Du Pont De Nemours And Company Oxygen barrier layers for photopolymerizable elements
JPS5549729B2 (es) * 1973-02-07 1980-12-13
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
JPS5719735A (en) * 1980-07-10 1982-02-02 Fuji Photo Film Co Ltd Photographic sensitive material
US4631246A (en) * 1982-04-14 1986-12-23 E. I. Du Pont De Nemours And Company Uniform cover sheet with rough surface in a photosensitive element
JPS58190941A (ja) * 1982-04-14 1983-11-08 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 光感受性エレメント
US4599299A (en) * 1982-04-22 1986-07-08 E. I. Du Pont De Nemours And Company Process for preparing overcoated photohardenable element having surface protuberances
US4507385A (en) * 1983-03-25 1985-03-26 Eastman Kodak Company Acrylonitrile copolymers as protective overcoats in photographic elements
JPS6064345A (ja) * 1983-09-20 1985-04-12 Toyobo Co Ltd 耐スクラツチ性向上用処理液および耐スクラツチ性画像複製材料の製造方法
JPS6095430A (ja) * 1983-10-29 1985-05-28 Toyobo Co Ltd 画像複製材料
JPS60138922A (ja) * 1983-12-27 1985-07-23 Hitachi Chem Co Ltd レジスト像の製造法
JPS60263141A (ja) * 1984-06-12 1985-12-26 Fuji Photo Film Co Ltd 光重合性感光材料
JPS61285444A (ja) * 1985-06-13 1986-12-16 Fuji Photo Film Co Ltd 光重合性感光材料
US9072528B2 (en) * 2012-12-05 2015-07-07 Depuy Mitek, Llc Instrument and method to enhance articular cartilage regeneration

Also Published As

Publication number Publication date
ZA88132B (en) 1989-02-22
FI880104A (fi) 1988-07-13
DK10688A (da) 1988-07-13
DE3881710D1 (de) 1993-07-22
NO880092L (no) 1988-07-13
DK10688D0 (da) 1988-01-11
GB8700599D0 (en) 1987-02-18
NO880092D0 (no) 1988-01-11
ATE90798T1 (de) 1993-07-15
AU1017688A (en) 1988-07-14
FI880104A0 (fi) 1988-01-11
DE3881710T2 (de) 1993-09-30
EP0275147B1 (en) 1993-06-16
JP2588557B2 (ja) 1997-03-05
AU604822B2 (en) 1991-01-03
CA1317149C (en) 1993-05-04
EP0275147A2 (en) 1988-07-20
BR8800093A (pt) 1988-08-16
EP0275147A3 (en) 1989-03-29
NZ223162A (en) 1989-09-27
JPS63247747A (ja) 1988-10-14
US4942111A (en) 1990-07-17

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