GB1335517A - Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer - Google Patents

Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer

Info

Publication number
GB1335517A
GB1335517A GB1335517DA GB1335517A GB 1335517 A GB1335517 A GB 1335517A GB 1335517D A GB1335517D A GB 1335517DA GB 1335517 A GB1335517 A GB 1335517A
Authority
GB
United Kingdom
Prior art keywords
light
sensitive
amino acids
sensitised
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of GB1335517A publication Critical patent/GB1335517A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Abstract

1335517 Photoresist materials OCE-VAN DER GRINTEN N V 17 Aug 1972 38446/72 Heading G2C A photoresist material comprises a support and a light-sensitive layer containing a quinone diozide and an aromatic amino acid. Specified quinone diazides are aromatic esters and amides of o-naphth aquinone diazide sulphoric orcarbocyclic acids and specified amino acids are p-aminobenzoic and 1-amino naphthalene- 2, 6-disulphonic acid. The layer may also contain a novolak resin or a polyvinylphenol. The material may be imagewise exposed and developed with alkali to remove exposed areas producing a positive printing plate. The amino acid helps to keep the exposed areas soluble.
GB1335517D 1972-08-17 1972-08-17 Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer Expired GB1335517A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3844672 1972-08-17

Publications (1)

Publication Number Publication Date
GB1335517A true GB1335517A (en) 1973-10-31

Family

ID=10403500

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1335517D Expired GB1335517A (en) 1972-08-17 1972-08-17 Light-sensitive reprographic elements sensitised with quinone diazides containing aromatic amino acids in the light-sensitive layer

Country Status (1)

Country Link
GB (1) GB1335517A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0275147A2 (en) * 1987-01-12 1988-07-20 E.I. du Pont de Nemours and Company Improvements in or relating to printing plate precursors
WO2009085093A1 (en) * 2007-12-19 2009-07-09 Eastman Kodak Company Radiation-sensitive elements with developability-enhancing compounds

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0275147A2 (en) * 1987-01-12 1988-07-20 E.I. du Pont de Nemours and Company Improvements in or relating to printing plate precursors
EP0275147A3 (en) * 1987-01-12 1989-03-29 Vickers Plc Improvements in or relating to printing plate precursors
WO2009085093A1 (en) * 2007-12-19 2009-07-09 Eastman Kodak Company Radiation-sensitive elements with developability-enhancing compounds
US8088549B2 (en) 2007-12-19 2012-01-03 Eastman Kodak Company Radiation-sensitive elements with developability-enhancing compounds

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees