EP3564407A4 - CYANIDE-FREE SUBSTITUTION GOLD PLATING SOLUTION TYPE COMPOSITION - Google Patents
CYANIDE-FREE SUBSTITUTION GOLD PLATING SOLUTION TYPE COMPOSITION Download PDFInfo
- Publication number
- EP3564407A4 EP3564407A4 EP16925513.0A EP16925513A EP3564407A4 EP 3564407 A4 EP3564407 A4 EP 3564407A4 EP 16925513 A EP16925513 A EP 16925513A EP 3564407 A4 EP3564407 A4 EP 3564407A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- cyanide
- plating solution
- gold plating
- solution composition
- substitution gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title 1
- 239000010931 gold Substances 0.000 title 1
- 229910052737 gold Inorganic materials 0.000 title 1
- 238000007747 plating Methods 0.000 title 1
- 238000006467 substitution reaction Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2016/089007 WO2018122989A1 (ja) | 2016-12-27 | 2016-12-27 | シアンフリー置換金めっき液組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3564407A1 EP3564407A1 (en) | 2019-11-06 |
EP3564407A4 true EP3564407A4 (en) | 2020-10-21 |
Family
ID=62708094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16925513.0A Withdrawn EP3564407A4 (en) | 2016-12-27 | 2016-12-27 | CYANIDE-FREE SUBSTITUTION GOLD PLATING SOLUTION TYPE COMPOSITION |
Country Status (6)
Country | Link |
---|---|
US (1) | US20210095378A1 (zh) |
EP (1) | EP3564407A4 (zh) |
JP (1) | JP6842475B2 (zh) |
KR (1) | KR20190096420A (zh) |
CN (1) | CN110114507A (zh) |
WO (1) | WO2018122989A1 (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4978559A (en) * | 1989-11-03 | 1990-12-18 | General Electric Company | Autocatalytic electroless gold plating composition |
US4985076A (en) * | 1989-11-03 | 1991-01-15 | General Electric Company | Autocatalytic electroless gold plating composition |
US5206055A (en) * | 1991-09-03 | 1993-04-27 | General Electric Company | Method for enhancing the uniform electroless deposition of gold onto a palladium substrate |
US20130316082A1 (en) * | 2010-03-19 | 2013-11-28 | Enthone Inc. | Method for direct metallization of non-conductive substrates |
WO2016051667A1 (ja) * | 2014-10-02 | 2016-04-07 | 日本板硝子株式会社 | 無電解めっき下地剤及びその製造方法並びに該無電解めっき下地剤を用いためっき積層体 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6350570A (ja) * | 1986-08-12 | 1988-03-03 | ニツカン工業株式会社 | 金属メツキされたチタン酸アルカリおよびその製造方法 |
JP3227505B2 (ja) * | 1993-07-16 | 2001-11-12 | 奥野製薬工業株式会社 | 置換型無電解金めっき液 |
JP3892730B2 (ja) * | 2002-01-30 | 2007-03-14 | 関東化学株式会社 | 無電解金めっき液 |
JP4603320B2 (ja) * | 2003-10-22 | 2010-12-22 | 関東化学株式会社 | 無電解金めっき液 |
JP5526462B2 (ja) | 2006-04-18 | 2014-06-18 | 日立化成株式会社 | 無電解金めっき液及び無電解金めっき方法 |
JP5026107B2 (ja) * | 2007-02-23 | 2012-09-12 | 関東化学株式会社 | 無電解金めっき液およびそれを用いためっき方法 |
JP4758470B2 (ja) | 2008-12-18 | 2011-08-31 | シャープ株式会社 | 突起電極の形成方法及び置換金めっき液 |
JP5371465B2 (ja) * | 2009-02-09 | 2013-12-18 | メタローテクノロジーズジャパン株式会社 | 非シアン無電解金めっき液及び導体パターンのめっき方法 |
JP5370886B2 (ja) | 2009-03-10 | 2013-12-18 | 関東化学株式会社 | 金微細構造体形成用無電解金めっき液およびこれを用いた金微細構造体形成方法ならびにこれを用いた金微細構造体 |
-
2016
- 2016-12-27 WO PCT/JP2016/089007 patent/WO2018122989A1/ja unknown
- 2016-12-27 US US16/473,764 patent/US20210095378A1/en not_active Abandoned
- 2016-12-27 CN CN201680091924.4A patent/CN110114507A/zh active Pending
- 2016-12-27 JP JP2018558587A patent/JP6842475B2/ja active Active
- 2016-12-27 KR KR1020197021607A patent/KR20190096420A/ko unknown
- 2016-12-27 EP EP16925513.0A patent/EP3564407A4/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4978559A (en) * | 1989-11-03 | 1990-12-18 | General Electric Company | Autocatalytic electroless gold plating composition |
US4985076A (en) * | 1989-11-03 | 1991-01-15 | General Electric Company | Autocatalytic electroless gold plating composition |
US5206055A (en) * | 1991-09-03 | 1993-04-27 | General Electric Company | Method for enhancing the uniform electroless deposition of gold onto a palladium substrate |
US20130316082A1 (en) * | 2010-03-19 | 2013-11-28 | Enthone Inc. | Method for direct metallization of non-conductive substrates |
WO2016051667A1 (ja) * | 2014-10-02 | 2016-04-07 | 日本板硝子株式会社 | 無電解めっき下地剤及びその製造方法並びに該無電解めっき下地剤を用いためっき積層体 |
JP2017210630A (ja) * | 2014-10-02 | 2017-11-30 | 日本板硝子株式会社 | 無電解めっき下地剤及びその製造方法並びに該無電解めっき下地剤を用いためっき積層体 |
Non-Patent Citations (1)
Title |
---|
See also references of WO2018122989A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20210095378A1 (en) | 2021-04-01 |
KR20190096420A (ko) | 2019-08-19 |
JPWO2018122989A1 (ja) | 2019-12-26 |
CN110114507A (zh) | 2019-08-09 |
JP6842475B2 (ja) | 2021-03-17 |
WO2018122989A1 (ja) | 2018-07-05 |
EP3564407A1 (en) | 2019-11-06 |
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Legal Events
Date | Code | Title | Description |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
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17P | Request for examination filed |
Effective date: 20190716 |
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AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20200921 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C23C 18/42 20060101ALI20200915BHEP Ipc: C23C 18/44 20060101AFI20200915BHEP |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20230701 |