EP3312637A4 - Strahlungsdetektor - Google Patents

Strahlungsdetektor Download PDF

Info

Publication number
EP3312637A4
EP3312637A4 EP17821455.7A EP17821455A EP3312637A4 EP 3312637 A4 EP3312637 A4 EP 3312637A4 EP 17821455 A EP17821455 A EP 17821455A EP 3312637 A4 EP3312637 A4 EP 3312637A4
Authority
EP
European Patent Office
Prior art keywords
radiation detector
detector
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17821455.7A
Other languages
English (en)
French (fr)
Other versions
EP3312637A1 (de
EP3312637B1 (de
Inventor
Masanori Kinpara
Toshiyuki ONODERA
Keitaro Hitomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to EP20155808.7A priority Critical patent/EP3675184B1/de
Priority to EP21180810.0A priority patent/EP3907767B1/de
Priority to EP23158768.4A priority patent/EP4213225B1/de
Publication of EP3312637A1 publication Critical patent/EP3312637A1/de
Publication of EP3312637A4 publication Critical patent/EP3312637A4/de
Application granted granted Critical
Publication of EP3312637B1 publication Critical patent/EP3312637B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • G01T1/241Electrode arrangements, e.g. continuous or parallel strips or the like
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • G01T1/249Measuring radiation intensity with semiconductor detectors specially adapted for use in SPECT or PET
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/085Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/115Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation
    • H01L31/118Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation of the surface barrier or shallow PN junction detector type, e.g. surface barrier alpha-particle detectors

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Measurement Of Radiation (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
EP17821455.7A 2016-07-11 2017-06-19 Strahlungsdetektor Active EP3312637B1 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP20155808.7A EP3675184B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP21180810.0A EP3907767B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP23158768.4A EP4213225B1 (de) 2016-07-11 2017-06-19 Verfahren zur herstellung eines strahlungsdetektors

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016136788A JP6242954B1 (ja) 2016-07-11 2016-07-11 放射線検出器
PCT/JP2017/022536 WO2018012209A1 (ja) 2016-07-11 2017-06-19 放射線検出器

Related Child Applications (3)

Application Number Title Priority Date Filing Date
EP23158768.4A Division EP4213225B1 (de) 2016-07-11 2017-06-19 Verfahren zur herstellung eines strahlungsdetektors
EP21180810.0A Division EP3907767B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP20155808.7A Division EP3675184B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor

Publications (3)

Publication Number Publication Date
EP3312637A1 EP3312637A1 (de) 2018-04-25
EP3312637A4 true EP3312637A4 (de) 2018-12-05
EP3312637B1 EP3312637B1 (de) 2020-02-26

Family

ID=60570427

Family Applications (4)

Application Number Title Priority Date Filing Date
EP23158768.4A Active EP4213225B1 (de) 2016-07-11 2017-06-19 Verfahren zur herstellung eines strahlungsdetektors
EP17821455.7A Active EP3312637B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP20155808.7A Active EP3675184B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP21180810.0A Active EP3907767B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP23158768.4A Active EP4213225B1 (de) 2016-07-11 2017-06-19 Verfahren zur herstellung eines strahlungsdetektors

Family Applications After (2)

Application Number Title Priority Date Filing Date
EP20155808.7A Active EP3675184B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor
EP21180810.0A Active EP3907767B1 (de) 2016-07-11 2017-06-19 Strahlungsdetektor

Country Status (8)

Country Link
US (4) US10782427B2 (de)
EP (4) EP4213225B1 (de)
JP (1) JP6242954B1 (de)
KR (1) KR101886596B1 (de)
CN (2) CN107850683B (de)
IL (4) IL256373B (de)
TW (4) TWI667491B (de)
WO (1) WO2018012209A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6688861B1 (ja) * 2018-11-12 2020-04-28 浜松ホトニクス株式会社 放射線検出器及びその製造方法
JP7051928B2 (ja) * 2020-04-06 2022-04-11 浜松ホトニクス株式会社 放射線検出器の製造方法
WO2022132282A1 (en) 2020-12-14 2022-06-23 Clearpoint Neuro, Inc. Surgical base assemblies for trajectory guide systems and associated trajectory guide systems
JP7090145B1 (ja) * 2020-12-14 2022-06-23 浜松ホトニクス株式会社 放射線検出器および放射線検出器製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130026364A1 (en) * 2011-04-26 2013-01-31 Radiation Monitoring Devices Inc. Mixed ionic-electronic conductor-based radiation detectors and methods of fabrication
JP2015102340A (ja) * 2013-11-21 2015-06-04 日立アロカメディカル株式会社 放射線検出素子およびそれを備えた放射線検出器、核医学診断装置ならびに放射線検出素子の製造方法

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3218242A (en) * 1962-01-04 1965-11-16 Union Carbide Corp Measurement of the concentration of dissolved oxygen in liquids
JPS5332941B2 (de) 1973-11-28 1978-09-11
US4290876A (en) * 1980-06-05 1981-09-22 Murata Manufacturing Co., Ltd. Sputtering apparatus
JP2529557B2 (ja) * 1986-10-13 1996-08-28 芳沢機工東部株式会社 鉛合金製不溶性陽極
JPH0834316B2 (ja) * 1987-05-06 1996-03-29 松下電器産業株式会社 半導体放射線検出器
JPH0983008A (ja) * 1995-09-12 1997-03-28 Shimadzu Corp 半導体放射線検出素子
US5985691A (en) * 1997-05-16 1999-11-16 International Solar Electric Technology, Inc. Method of making compound semiconductor films and making related electronic devices
US6437275B1 (en) * 1998-11-10 2002-08-20 Hitachi, Ltd. Vacuum circuit-breaker, vacuum bulb for use therein, and electrodes thereof
KR100443902B1 (ko) * 1999-03-25 2004-08-09 엘지.필립스 엘시디 주식회사 엑스레이 영상 감지소자 및 그 제조방법
KR100310179B1 (ko) * 1999-04-01 2001-10-29 구본준, 론 위라하디락사 엑스레이 영상 감지소자 및 그 제조방법
WO2000065376A1 (en) * 1999-04-26 2000-11-02 Simage Oy Device for imaging radiation
KR100630880B1 (ko) * 1999-12-31 2006-10-02 엘지.필립스 엘시디 주식회사 엑스레이 영상 감지소자 및 그 제조방법
US6399950B1 (en) * 2000-11-27 2002-06-04 Shimadzu Corporation Two-dimensional radiation detector
JP4112800B2 (ja) * 2000-12-05 2008-07-02 富士フイルム株式会社 発光素子及びその製造方法
KR100483314B1 (ko) * 2002-03-23 2005-04-15 학교법인 인제학원 디지털 엑스레이 이미지 디텍터
JP4356613B2 (ja) * 2003-02-10 2009-11-04 株式会社村田製作所 弾性境界波装置
JP2005223009A (ja) 2004-02-03 2005-08-18 Hitachi Ltd 半導体放射線検出器及び放射線検出装置
JP2006049773A (ja) * 2004-08-09 2006-02-16 Toshiba Corp 放射線検出器
JP2006080206A (ja) * 2004-09-08 2006-03-23 Toshiba Corp 放射線検出器
US7884438B2 (en) * 2005-07-29 2011-02-08 Varian Medical Systems, Inc. Megavoltage imaging with a photoconductor based sensor
JP5088459B2 (ja) 2005-08-01 2012-12-05 ライオン株式会社 皮膚洗浄剤組成物
US7482602B2 (en) * 2005-11-16 2009-01-27 Konica Minolta Medical & Graphic, Inc. Scintillator plate for radiation and production method of the same
US7439560B2 (en) * 2005-12-06 2008-10-21 Canon Kabushiki Kaisha Semiconductor device using semiconductor nanowire and display apparatus and image pick-up apparatus using the same
CN100420007C (zh) 2006-02-06 2008-09-17 中芯国际集成电路制造(上海)有限公司 半导体端电极结构及其制造方法
US20070190721A1 (en) * 2006-02-16 2007-08-16 Samsung Electronics Co., Ltd. Semiconductor memory device having an alloy metal gate electrode and method of manufacturing the same
JP4247263B2 (ja) 2006-09-29 2009-04-02 株式会社日立製作所 半導体放射線検出器および放射線検出装置
US9741901B2 (en) * 2006-11-07 2017-08-22 Cbrite Inc. Two-terminal electronic devices and their methods of fabrication
US20090008733A1 (en) * 2007-03-01 2009-01-08 Guilherme Cardoso Electric field steering cap, steering electrode, and modular configurations for a radiation detector
JP5083964B2 (ja) * 2007-12-27 2012-11-28 国立大学法人東北大学 放射線検出器及びこれを備えた陽電子断層撮影装置、単光子放射線コンピュータ断層撮影装置
KR101469979B1 (ko) * 2008-03-24 2014-12-05 엘지이노텍 주식회사 그룹 3족 질화물계 반도체 발광다이오드 소자 및 이의 제조방법
WO2010007807A1 (ja) * 2008-07-18 2010-01-21 コニカミノルタエムジー株式会社 放射線シンチレータおよび放射線画像検出器
JP5343970B2 (ja) * 2008-07-25 2013-11-13 コニカミノルタ株式会社 放射線画像検出装置
JP5155808B2 (ja) * 2008-10-08 2013-03-06 株式会社日立製作所 半導体放射線検出器および核医学診断装置
US8723127B2 (en) * 2009-03-13 2014-05-13 Konica Minolta Business Technologies, Inc. Radiation detector
CN101750409B (zh) * 2009-12-14 2012-05-23 华中科技大学 一种测量溴化铊材料中杂质含量的方法
JP5485197B2 (ja) * 2011-02-10 2014-05-07 株式会社日立製作所 放射線計測装置および核医学診断装置
JP5753802B2 (ja) * 2012-01-27 2015-07-22 株式会社日立製作所 半導体放射線検出器および核医学診断装置
KR102071548B1 (ko) * 2012-02-21 2020-01-30 메사추세츠 인스티튜트 오브 테크놀로지 분광계 장치
JP6049166B2 (ja) * 2012-05-16 2016-12-21 株式会社日立製作所 半導体放射線検出器およびそれを用いた核医学診断装置
JP2014009991A (ja) 2012-06-28 2014-01-20 Fujifilm Corp 放射線画像検出装置及びその製造方法
JP2015072201A (ja) 2013-10-03 2015-04-16 日立アロカメディカル株式会社 半導体放射線検出器、それを用いた核医学診断装置、および半導体放射線検出器の製造方法
KR20160038387A (ko) * 2014-09-30 2016-04-07 주식회사 레이언스 엑스선 디텍터 및 그 구동방법
JP2017062151A (ja) * 2015-09-24 2017-03-30 三井金属鉱業株式会社 放射線検出素子及びその使用方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130026364A1 (en) * 2011-04-26 2013-01-31 Radiation Monitoring Devices Inc. Mixed ionic-electronic conductor-based radiation detectors and methods of fabrication
JP2015102340A (ja) * 2013-11-21 2015-06-04 日立アロカメディカル株式会社 放射線検出素子およびそれを備えた放射線検出器、核医学診断装置ならびに放射線検出素子の製造方法

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
KIM KI HYUN ET AL: "Electro-migration of impurities in TlBr", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 114, no. 13, 7 October 2013 (2013-10-07), XP012175473, ISSN: 0021-8979, [retrieved on 19010101], DOI: 10.1063/1.4823781 *
See also references of WO2018012209A1 *
SIMANOVSKIS A ET AL: "Ageing effects in Me/TlBr-TlI systems", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, vol. 232, no. 1, 10 September 1993 (1993-09-10), pages 87 - 93, XP025732501, ISSN: 0040-6090, [retrieved on 19930910], DOI: 10.1016/0040-6090(93)90767-J *
STOLYAROVA S ET AL: "Ambient-induced interface reactions and adhesion failure in the Ag/TlBr-TlI system", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, vol. 177, no. 1-2, October 1989 (1989-10-01), pages 181 - 188, XP025852078, ISSN: 0040-6090, [retrieved on 19891001], DOI: 10.1016/0040-6090(89)90566-X *
VASILIJ KOZLOV: "TlBr raw material purification, crystal growth, annealing, detector fabrication and characterisation for gamma-ray detector applications", 12 March 2010 (2010-03-12), XP055516102, Retrieved from the Internet <URL:https://core.ac.uk/download/pdf/14916638.pdf> *

Also Published As

Publication number Publication date
TWI667491B (zh) 2019-08-01
EP4213225B1 (de) 2023-12-27
US11555934B2 (en) 2023-01-17
US20220179107A1 (en) 2022-06-09
IL256373B (en) 2018-06-28
EP3675184A1 (de) 2020-07-01
EP3312637A1 (de) 2018-04-25
US11307315B2 (en) 2022-04-19
EP4213225A1 (de) 2023-07-19
EP3907767A1 (de) 2021-11-10
KR101886596B1 (ko) 2018-08-07
US20190346576A1 (en) 2019-11-14
WO2018012209A1 (ja) 2018-01-18
TWI709759B (zh) 2020-11-11
TW201839425A (zh) 2018-11-01
TWI638181B (zh) 2018-10-11
JP2018009801A (ja) 2018-01-18
IL284812B2 (en) 2023-04-01
CN110133707A (zh) 2019-08-16
CN110133707B (zh) 2023-04-14
TWI754403B (zh) 2022-02-01
IL284812A (en) 2021-08-31
TW201944097A (zh) 2019-11-16
EP3675184B1 (de) 2021-11-10
US20210041585A1 (en) 2021-02-11
IL256373A (en) 2018-01-31
US20200264324A1 (en) 2020-08-20
US10859717B2 (en) 2020-12-08
IL278383B (en) 2021-08-31
TW202115428A (zh) 2021-04-16
TW201807836A (zh) 2018-03-01
JP6242954B1 (ja) 2017-12-06
CN107850683B (zh) 2019-07-02
IL284812B (en) 2022-12-01
EP3312637B1 (de) 2020-02-26
CN107850683A (zh) 2018-03-27
US10782427B2 (en) 2020-09-22
IL259536B (en) 2020-11-30
IL259536A (en) 2018-07-31
EP3907767B1 (de) 2023-05-24

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