EP3239221A4 - Poröses silikonobjekt und verfahren zur herstellung davon - Google Patents

Poröses silikonobjekt und verfahren zur herstellung davon Download PDF

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Publication number
EP3239221A4
EP3239221A4 EP15873330.3A EP15873330A EP3239221A4 EP 3239221 A4 EP3239221 A4 EP 3239221A4 EP 15873330 A EP15873330 A EP 15873330A EP 3239221 A4 EP3239221 A4 EP 3239221A4
Authority
EP
European Patent Office
Prior art keywords
producing same
porous silicone
silicone object
porous
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP15873330.3A
Other languages
English (en)
French (fr)
Other versions
EP3239221A1 (de
Inventor
Hiromoto Haruta
Kozo Nakamura
Kazuki Uwada
Hiroyuki Takemoto
Nao Murakami
Daisuke Hattori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority claimed from PCT/JP2015/086362 external-priority patent/WO2016104762A1/ja
Publication of EP3239221A1 publication Critical patent/EP3239221A1/de
Publication of EP3239221A4 publication Critical patent/EP3239221A4/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/24—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by surface fusion and bonding of particles to form voids, e.g. sintering
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/44—Block-or graft-polymers containing polysiloxane sequences containing only polysiloxane sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/28—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00—Foams characterised by the foaming process
    • C08J2201/02—Foams characterised by the foaming process characterised by mechanical pre- or post-treatments
    • C08J2201/026—Crosslinking before of after foaming
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00—Foams characterised by the foaming process
    • C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
    • C08J2201/05—Elimination by evaporation or heat degradation of a liquid phase
    • C08J2201/0504—Elimination by evaporation or heat degradation of a liquid phase the liquid phase being aqueous
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2205/00—Foams characterised by their properties
    • C08J2205/02—Foams characterised by their properties the finished foam itself being a gel or a gel being temporarily formed when processing the foamable composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2205/00—Foams characterised by their properties
    • C08J2205/04—Foams characterised by their properties characterised by the foam pores
    • C08J2205/05—Open cells, i.e. more than 50% of the pores are open
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Silicon Compounds (AREA)
  • Silicon Polymers (AREA)
EP15873330.3A 2014-12-26 2015-12-25 Poröses silikonobjekt und verfahren zur herstellung davon Pending EP3239221A4 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014266782 2014-12-26
JP2015152967 2015-07-31
JP2015176204A JP6612563B2 (ja) 2014-12-26 2015-09-07 シリコーン多孔体およびその製造方法
PCT/JP2015/086362 WO2016104762A1 (ja) 2014-12-26 2015-12-25 シリコーン多孔体およびその製造方法

Publications (2)

Publication Number Publication Date
EP3239221A1 EP3239221A1 (de) 2017-11-01
EP3239221A4 true EP3239221A4 (de) 2018-07-25

Family

ID=57945440

Family Applications (1)

Application Number Title Priority Date Filing Date
EP15873330.3A Pending EP3239221A4 (de) 2014-12-26 2015-12-25 Poröses silikonobjekt und verfahren zur herstellung davon

Country Status (5)

Country Link
US (2) US10472483B2 (de)
EP (1) EP3239221A4 (de)
JP (2) JP6612563B2 (de)
KR (1) KR102477728B1 (de)
CN (1) CN107108944B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6563750B2 (ja) 2014-12-26 2019-08-21 日東電工株式会社 塗料およびその製造方法
JP6604781B2 (ja) 2014-12-26 2019-11-13 日東電工株式会社 積層フィルムロールおよびその製造方法
JP6599699B2 (ja) * 2014-12-26 2019-10-30 日東電工株式会社 触媒作用を介して結合した空隙構造フィルムおよびその製造方法
JP6612563B2 (ja) 2014-12-26 2019-11-27 日東電工株式会社 シリコーン多孔体およびその製造方法
JP6713871B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6713872B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6892744B2 (ja) 2015-08-24 2021-06-23 日東電工株式会社 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置
JP7152130B2 (ja) * 2015-09-07 2022-10-12 日東電工株式会社 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置
TWI761649B (zh) * 2017-12-27 2022-04-21 日商日揮觸媒化成股份有限公司 多孔二氧化矽粒子及其製造方法
WO2020067344A1 (ja) 2018-09-28 2020-04-02 日東電工株式会社 両面粘着剤層付光学積層体
KR102609218B1 (ko) 2018-10-11 2023-12-05 아사히 가세이 가부시키가이샤 리튬 이온 전지용 세퍼레이터
KR102601002B1 (ko) 2018-10-11 2023-11-14 아사히 가세이 가부시키가이샤 가교 세퍼레이터를 사용한 리튬 이온 전지
KR102645752B1 (ko) * 2018-11-02 2024-03-11 주식회사 엘지화학 분리막의 제조 방법
JP7336237B2 (ja) * 2019-03-29 2023-08-31 旭化成株式会社 改質多孔質体、改質多孔質体の製造方法、反射材、多孔質シート
JPWO2021201229A1 (de) * 2020-04-02 2021-10-07
CN114988417B (zh) * 2022-07-15 2024-01-12 中国科学院苏州纳米技术与纳米仿生研究所 一种超白氧化硅气凝胶、制备方法及其应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080290472A1 (en) * 2007-02-16 2008-11-27 Shin Etsu Chemical Co., Ltd. Semiconductor interlayer-insulating film forming composition, preparation method thereof, film forming method, and semiconductor device
EP3239257A1 (de) * 2014-12-26 2017-11-01 Nitto Denko Corporation Beschichtungsmaterial und verfahren zur herstellung davon

Family Cites Families (81)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2870109A (en) * 1954-05-06 1959-01-20 Monsanto Chemicals Coated silica aerogel, silicone rubber reinforced therewith and method of making
US4408009A (en) 1982-02-17 1983-10-04 Union Carbide Corporation Co-condensates of alkyl silicates and alkoxy silanes
JPS61250032A (ja) 1985-04-30 1986-11-07 Hitachi Chem Co Ltd シラノ−ルオリゴマ−液の製造法
CN1221629A (zh) 1990-04-02 1999-07-07 普罗格特-甘布尔公司 包含多孔、有吸收性、聚合的粗视结构物的吸收性制品
US5124188A (en) 1990-04-02 1992-06-23 The Procter & Gamble Company Porous, absorbent, polymeric macrostructures and methods of making the same
US5676938A (en) 1992-09-29 1997-10-14 Toshiba Silicone Co., Ltd. Cosmetic composition
JPH0748527A (ja) 1993-08-06 1995-02-21 Sumitomo Osaka Cement Co Ltd 反射防止層を有する光学材料及びその製造方法
JP3761189B2 (ja) 1993-11-04 2006-03-29 触媒化成工業株式会社 複合酸化物ゾル、その製造方法および基材
DE4437424A1 (de) * 1994-10-20 1996-04-25 Hoechst Ag Aerogelhaltige Zusammensetzung, Verfahren zu ihrer Herstellung sowie ihre Verwendung
US5844060A (en) 1995-07-05 1998-12-01 Shin-Etsu Chemical Co., Ltd. Organopolysiloxane resin, production method thereof, and curable organopolysiloxane resin composition using the same
JPH0924575A (ja) 1995-07-12 1997-01-28 Dainippon Printing Co Ltd 光学機能性膜の製造方法
US5948482A (en) 1995-09-19 1999-09-07 University Of New Mexico Ambient pressure process for preparing aerogel thin films reliquified sols useful in preparing aerogel thin films
JP3851393B2 (ja) * 1996-11-25 2006-11-29 旭化成株式会社 多孔質ケイ素酸化物膜の製造法
WO1999029635A1 (fr) 1997-12-09 1999-06-17 Nippon Sheet Glass Co., Ltd. Plaque de verre antireflet, son procede de production et composition de revetement antireflet
JPH11292568A (ja) 1997-12-09 1999-10-26 Nippon Sheet Glass Co Ltd 反射防止ガラス板、その製造方法および反射防止膜用被覆組成物
JP4107732B2 (ja) 1998-10-20 2008-06-25 松下電器産業株式会社 有機多孔体の製造方法
JP2000248261A (ja) 1999-02-26 2000-09-12 Dow Corning Toray Silicone Co Ltd 防汚添加剤および室温硬化性オルガノポリシロキサン組成物
JP2000256040A (ja) 1999-03-08 2000-09-19 Nippon Sheet Glass Co Ltd 自動車窓用ガラス板
JP2000264620A (ja) 1999-03-16 2000-09-26 Matsushita Electric Works Ltd 疎水性エアロゲルの製造方法
JP4067224B2 (ja) 1999-03-30 2008-03-26 富士フイルム株式会社 反射防止膜、反射防止膜の製造方法および画像表示装置
JP4063464B2 (ja) 1999-12-10 2008-03-19 Ａｇｃエスアイテック株式会社 鱗片状シリカ粒子、硬化性組成物、それからなる硬化体及びその製造方法
US6534176B2 (en) 1999-12-10 2003-03-18 Asahi Glass Company, Limited Scaly silica particles and hardenable composition containing them
US6794448B2 (en) 2000-03-21 2004-09-21 Sekisui Plastics Co., Ltd. Resin particles and process for producing the same
JP4284006B2 (ja) 2001-04-10 2009-06-24 富士フイルム株式会社 反射防止フィルム、偏光板および画像表示装置
KR100906596B1 (ko) 2001-04-10 2009-07-09 후지필름 가부시키가이샤 반사방지 필름, 편광판, 및 이미지 디스플레이용 장치
WO2003027189A1 (fr) 2001-09-04 2003-04-03 Dai Nippon Printing Co., Ltd. Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image
US6743510B2 (en) 2001-11-13 2004-06-01 Sumitomo Chemical Company, Limited Composition comprising a cationic polymerization compound and coating obtained from the same
CN1646947A (zh) 2002-04-08 2005-07-27 日东电工株式会社 光扩散片、光学元件以及图像显示装置
JP2004010424A (ja) 2002-06-06 2004-01-15 Matsushita Electric Ind Co Ltd 多孔質ゲルの製造方法およびそれを用いた断熱材
US7771609B2 (en) 2002-08-16 2010-08-10 Aerogel Technologies, Llc Methods and compositions for preparing silica aerogels
JP2004161877A (ja) 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP4231329B2 (ja) * 2003-04-25 2009-02-25 パナソニック株式会社 乾燥ゲルを含む成形体およびその製造方法
JP2004354699A (ja) 2003-05-29 2004-12-16 Konica Minolta Opto Inc 反射防止フィルム及び偏光板
CN100375908C (zh) 2003-06-18 2008-03-19 旭化成株式会社 抗反射膜
KR101304381B1 (ko) 2003-08-28 2013-09-11 다이니폰 인사츠 가부시키가이샤 반사 방지 적층체의 제조방법
CN1212268C (zh) * 2003-11-20 2005-07-27 中国科学院上海技术物理研究所 二氧化硅气凝胶薄膜材料的制备方法
JP2005154195A (ja) 2003-11-25 2005-06-16 Matsushita Electric Works Ltd エアロゲル材、及びこのエアロゲル材にて形成される物品
JP4157048B2 (ja) 2004-01-27 2008-09-24 信越化学工業株式会社 多孔質膜形成用組成物、その製造方法、多孔質膜及び半導体装置
KR20060129509A (ko) 2004-03-26 2006-12-15 후지 샤신 필름 가부시기가이샤 반사 방지 필름의 제조방법, 반사 방지 필름, 편광판 및화상 표시 장치
JP2005350519A (ja) 2004-06-08 2005-12-22 Matsushita Electric Ind Co Ltd 多孔体およびその製造方法
JP4448392B2 (ja) 2004-06-28 2010-04-07 Ｈｏｙａ株式会社 反射防止膜を有する光学素子の製造方法
JP2006096019A (ja) 2004-08-31 2006-04-13 Nippon Zeon Co Ltd 積層フィルムの製造方法
JP2006096967A (ja) 2004-08-31 2006-04-13 Nippon Zeon Co Ltd 積層フィルムの製造方法
JP4951237B2 (ja) 2004-12-27 2012-06-13 ペンタックスリコーイメージング株式会社 防曇性反射防止膜の製造方法
JP2006255496A (ja) 2005-03-15 2006-09-28 Nippon Zeon Co Ltd 積層フィルムの製造方法
JP4938994B2 (ja) 2005-04-22 2012-05-23 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜及びその製造方法
US8029871B2 (en) 2005-06-09 2011-10-04 Hoya Corporation Method for producing silica aerogel coating
JP4953426B2 (ja) 2005-06-09 2012-06-13 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜の製造方法
DE602006006071D1 (de) 2005-08-05 2009-05-14 Fujifilm Mfg Europe Bv Poröse membran und aufzeichnungsmedium sowie herstellungsverfahren dafür
JP2008040171A (ja) 2006-08-07 2008-02-21 Pentax Corp セルフクリーニング効果を有する反射防止膜を設けた光学素子及びその製造方法
JP2008139839A (ja) 2006-11-02 2008-06-19 Bridgestone Corp ディスプレイ用光学フィルタ、これを備えたディスプレイ及びプラズマディスプレイパネル
TWI536048B (zh) 2007-02-21 2016-06-01 王子控股股份有限公司 凹凸圖案形成片及其製造方法
JP4997147B2 (ja) 2007-03-08 2012-08-08 富士フイルム株式会社 反射防止積層体、偏光板及び画像表示装置
KR101077274B1 (ko) 2007-05-28 2011-10-27 코오롱인더스트리 주식회사 폴리알킬실세스퀴옥산 미립자 및 그 제조방법
US8586144B2 (en) 2008-03-25 2013-11-19 Pentax Ricoh Imaging Company, Ltd. Method for forming anti-reflection coating and optical element
EP2276796B1 (de) 2008-04-14 2012-12-05 Dow Corning Corporation Emulsionen von borvernetzten organopolysiloxanen und ihre verwendung in körperpflegezusammensetzungen
JP5140525B2 (ja) 2008-09-12 2013-02-06 日東電工株式会社 偏光膜およびその製造方法
EP2164302A1 (de) 2008-09-12 2010-03-17 Ilford Imaging Switzerland Gmbh Optisches Element und Verfahren zu seiner Herstellung
JP2012524381A (ja) 2009-04-15 2012-10-11 スリーエム イノベイティブ プロパティズ カンパニー ボイドを含有する光学フィルムを備える光ガイド及びディスプレイシステム用ブラックライト
TWI605276B (zh) 2009-04-15 2017-11-11 ３Ｍ新設資產公司 光學結構及包含該光學結構之顯示系統
JP5366341B2 (ja) 2010-03-10 2013-12-11 竹本油脂株式会社 有機シリコーン微粒子、有機シリコーン微粒子の製造方法、有機シリコーン微粒子を含有する化粧料、樹脂組成物及び塗料組成物
JP5528296B2 (ja) 2010-10-25 2014-06-25 株式会社トクヤマ エアロゲル
EP2679645B1 (de) 2011-02-21 2021-04-14 Asahi Kasei Kabushiki Kaisha Beschichtungsmaterial mit einer organisch/anorganischen zusammensetzung, organisch/anorganischer film und reflexionsminderndes element
JP2012189802A (ja) 2011-03-10 2012-10-04 Asahi Kasei Chemicals Corp 反射防止フィルム、偏光板及び表示装置
KR101569599B1 (ko) 2011-03-14 2015-11-16 아사히 가세이 케미칼즈 가부시키가이샤 유기 무기 복합체와 그 제조 방법, 유기 무기 복합막과 그 제조 방법, 포토닉 결정, 코팅재, 열가소성 조성물, 미세 구조체, 광학 재료, 반사 방지 부재 및 광학 렌즈
JP5889067B2 (ja) 2011-03-29 2016-03-22 住友化学株式会社 光学フィルムの製造方法
JP5880238B2 (ja) 2011-04-15 2016-03-08 日本化成株式会社 ラミネート部材及びその製造方法並びに積層体
JP2013060309A (ja) 2011-09-12 2013-04-04 Achilles Corp 疎水性に優れるナノ構造多孔質体
EP2811986A1 (de) 2012-02-08 2014-12-17 Dow Corning Corporation Silikonemulsionen zur freisetzung von wirkstoffen im gesundheitswesen
JP5830419B2 (ja) * 2012-03-21 2015-12-09 古河電気工業株式会社 多孔質シリコン粒子及び多孔質シリコン複合体粒子並びにこれらの製造方法
JP5629042B2 (ja) 2012-08-27 2014-11-19 信和化工株式会社 多孔質シリカ粉末
JP5907839B2 (ja) 2012-08-30 2016-04-26 旭化成ケミカルズ株式会社 積層体、偏光板、光学材料、表示装置及びタッチパネル
JP5859942B2 (ja) 2012-09-26 2016-02-16 藤森工業株式会社 積層体の製造方法
JP6000839B2 (ja) 2012-12-21 2016-10-05 メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 ケイ素酸化物ナノ粒子とシルセスキオキサンポリマーとの複合体およびその製造方法、ならびにその複合体を用いて製造した複合材料
CN103213996B (zh) 2013-04-12 2015-12-23 北京科技大学 一种多级孔二氧化硅基复合气凝胶的制备方法
JP2014206702A (ja) 2013-04-16 2014-10-30 富士フイルム株式会社 偏光板及び画像表示装置
JP6371502B2 (ja) 2013-07-30 2018-08-08 大日本印刷株式会社 光学フィルムの製造方法
JP6540158B2 (ja) 2014-11-21 2019-07-10 三菱ケミカル株式会社 多孔質積層体
JP6599699B2 (ja) 2014-12-26 2019-10-30 日東電工株式会社 触媒作用を介して結合した空隙構造フィルムおよびその製造方法
JP6612563B2 (ja) 2014-12-26 2019-11-27 日東電工株式会社 シリコーン多孔体およびその製造方法
JP6604781B2 (ja) 2014-12-26 2019-11-13 日東電工株式会社 積層フィルムロールおよびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080290472A1 (en) * 2007-02-16 2008-11-27 Shin Etsu Chemical Co., Ltd. Semiconductor interlayer-insulating film forming composition, preparation method thereof, film forming method, and semiconductor device
EP3239257A1 (de) * 2014-12-26 2017-11-01 Nitto Denko Corporation Beschichtungsmaterial und verfahren zur herstellung davon

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BARIS R. MUTLU ET AL: "Silicon alkoxide cross-linked silica nanoparticle gels for encapsulation of bacterial biocatalysts", JOURNAL OF MATERIALS CHEMISTRY A, vol. 1, no. 36, 1 January 2013 (2013-01-01), GB, pages 11051, XP055484768, ISSN: 2050-7488, DOI: 10.1039/c3ta12303k *
MARKUS BÖRNER ET AL: "Cross-Linked Monolithic Xerogels Based on Silica Nanoparticles", CHEMISTRY OF MATERIALS, vol. 25, no. 18, 24 September 2013 (2013-09-24), pages 3648 - 3653, XP055484736, ISSN: 0897-4756, DOI: 10.1021/cm401717q *
See also references of WO2016104762A1 *

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JP6976299B2 (ja) 2021-12-08
JP6612563B2 (ja) 2019-11-27
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JP2020023718A (ja) 2020-02-13
US20170342232A1 (en) 2017-11-30
JP2017025275A (ja) 2017-02-02
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US10472483B2 (en) 2019-11-12
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