EP2744764A1 - Procédé de production d'un système de couches à faible émissivité - Google Patents

Procédé de production d'un système de couches à faible émissivité

Info

Publication number
EP2744764A1
EP2744764A1 EP12756405.2A EP12756405A EP2744764A1 EP 2744764 A1 EP2744764 A1 EP 2744764A1 EP 12756405 A EP12756405 A EP 12756405A EP 2744764 A1 EP2744764 A1 EP 2744764A1
Authority
EP
European Patent Office
Prior art keywords
low
layer
electromagnetic radiation
substrate
emitting layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP12756405.2A
Other languages
German (de)
English (en)
Inventor
Jörg NEIDHARDT
Christoph Köckert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne GmbH
Original Assignee
Von Ardenne GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne GmbH filed Critical Von Ardenne GmbH
Publication of EP2744764A1 publication Critical patent/EP2744764A1/fr
Ceased legal-status Critical Current

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/62—Insulation or other protection; Elements or use of specified material therefor
    • E04B1/74—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls
    • E04B1/76—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls specifically with respect to heat only
    • E04B1/78—Heat insulating elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/001—Other surface treatment of glass not in the form of fibres or filaments by irradiation by infrared light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0015—Other surface treatment of glass not in the form of fibres or filaments by irradiation by visible light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment

Definitions

  • the invention relates to a method for producing a low-emitting layer system on at least one
  • the invention relates to the preparation, in particular to the annealing, of low-emitting, thin
  • Layers e.g. Silver coatings, which find application in the field of thermal insulation of window and facade glass.
  • the special low-emissivity coatings also known as low emissivity or short low-e coatings, are used to reduce heat transfer.
  • the low-e coating is characterized by the fact that it has a low thermal emissivity and the
  • the low-e coating is intended to prevent an energy input from outside to inside.
  • the coatings used for this purpose include, for example, transparent, metallic layers, in particular
  • Silver-based multi-layer systems which have a low emissivity and thus a high reflection in the infrared range of the light, with a high transmittance of the entire layer system in the visible spectral range.
  • the transparent metallic layers become the
  • the glasses used On the other hand usually have a high emissivity in the infrared spectral range. This means that they absorb a high proportion of the heat radiation from the environment and at the same time radiate a large amount of heat to the environment according to their temperature.
  • a vacuum method is usually used, such as evaporation method or sputtering technology.
  • the glasses used must be further processed into safety glass in addition to the low-e coating. As is known, they are thermally pre-stressed for this purpose by specially conducted heating and cooling. However, since this means additional costs, usually only the discs to
  • coated substrate remain minimal, at least in such a range that visually no difference can be detected.
  • thermally toughened substrates are no longer manufacturable. This means they can no longer be shaped or otherwise machined by scratching and breaking, as is conventional with glass. Furthermore, microscopic defects such as microcracks in thermally toughened disks can be spontaneous
  • RTP rapid thermal Processing
  • the aim is to match the optical and thermal properties of non-tempered coating systems to tempered systems without the risk of spontaneous glass breakage.
  • thermal layer properties such as
  • low-emissive, conventionally heat-treated layer of a safety glass is a thermal treatment for thermal prestressing in the process of processing a glass to safety glass.
  • Safety glass can be significantly reduced in number.
  • the coated substrate is needed and the substrate at the Short term annealing step is not processed to safety glass.
  • the irradiation of the coated layer takes place from the layer side, in order to absorb the electromagnetic radiation for short-time tempering,
  • the Kurzzeittemperados the low-emitting layer by means of electromagnetic radiation at a
  • Emission wavelength of the electromagnetic radiation in which the electromagnetic radiation is at least partially absorbed by the deposited low-e layer and converted into heat. Due to the at least partial absorption of the electromagnetic radiation, the
  • the low-emitting layer before the flash-tempering her sheet resistance decreases and possibly also their transmission in the visible or the reflection in the Infrared increases.
  • electromagnetic radiation is realized in an absorption region of the low-e layer. This can be a
  • the low-emitting layer in the short-time annealing step at an emission wavelength of the electromagnetic radiation in the range from 250 nm to 1000 nm, advantageously at an emission wavelength of the electromagnetic radiation in the range from 250 nm to less than 500 nm and / or in
  • electromagnetic radiation of 250 nm to 350 nm and / or in the range of 650 nm to 850 nm.
  • emission wavelength ranges of the electromagnetic radiation correspond to the regions of the absorption maxima of the low-emittance layer which are in the range of about 250 to 350 nm and 650 to 850 nm.
  • the range of 250 nm to less than 500 nm is advantageous since in this region the low-e layer absorbs about a factor of two substantially more radiation than in the range of 650 nm to 850 nm lower
  • Power densities are achieved.
  • the range from 250 nm to less than 500 nm is technologically more feasible.
  • deposited layer will receive or absorb a predetermined energy input in the irradiation area.
  • the specifiable energy input is a predetermined
  • Energy input is therefore taking into account the highest possible layer temperature, i.
  • the adjustment of the energy input of the irradiation is preferably carried out both taking into account the parameters of the laser radiation, such as its wavelength, energy density and
  • the low-e layers thus treated in the short-time annealing step offer the advantage of increased reflection in the infrared region of the light and thus reduced emissivity.
  • the energy input via the energy density, i. Power via the energy density, i. Power
  • the electromagnetic radiation for short-term tempering is set such that it is a linear
  • the length corresponds to the
  • linear intensity distribution of the electromagnetic radiation for short time annealing at least the width of the deposited on the substrate layer in the direction of
  • Line width of the intensity distribution would be smaller than the width of the on the substrate in the direction of the longitudinal extent of the linear intensity distribution of the
  • electromagnetic radiation deposited layer or smaller than the overlapping areas at the
  • the electromagnetic radiation of the low-e layer is effected by a line laser. This has the advantage that with a line laser in a simple manner, a linear intensity distribution is achieved.
  • the electromagnetic irradiation of the low-e layer is effected by means of a plurality of lasers, preferably two line lasers.
  • the low-emitting layer by means of two
  • Line laser thermally treated at the same emission wavelength of the radiation or at two different wavelengths of radiation. This allows the energy input to the process parameters, such as the absorption, maximum temperature of the low-emitting layer, energy density of the laser and transport speed of the substrate, to be adjusted and regulated. As a result, the degree of absorption of the
  • Radiation that absorbs the substrate for example, in or near the UV region, be regulated by the arrangement of a second laser with different emission wavelength of the laser radiation, so that heating or excessive heating of the substrate is avoided.
  • the low-emissivity layer may be laser-ablated at one wavelength
  • the irradiation takes place simultaneously or successively, independently in the order.
  • two line lasers are on a line perpendicular to the transport direction aligned.
  • a first line laser is placed on a flat substrate plane, on the side of the low-emitting
  • Coating focused and the second line laser is defocused.
  • Plant varies due to the transport itself or due to the bending of the substrate, the distance between the laser and the surface to be treated of the substrate. This leads to an inhomogeneous treatment of the substrate surface and thus to the different color appearance of the
  • Line laser makes it possible to keep the energy density of the radiation and thus the energy input as constant as possible with small as well as larger variations of the distance up to +/- 5 mm. It's also an arrangement of more than two
  • Line lasers conceivable, some of which are focused and partly defocused.
  • Line laser composed of several lasers with appropriate optics.
  • the individual lasers can be partially focused and partially defocused to a
  • the electromagnetic radiation of the low-e layer is carried out by continuously emitting diode or diodes.
  • This offers the advantage of high efficiency and directional emission, which allows focusing along a line with very low loss at a processing speed of about 10 m / min for laser powers of 500 W / cm.
  • Another positive aspect is the controllability of the performance of these diodes for rapid adaptation to the respective process.
  • the electromagnetic irradiation of the low-e layers takes place by driving past a CW gas discharge lamp (CW - Continuous Wave).
  • At least one low-e layer contains or consists of silver.
  • Silver films in a wetted configuration are transparent in the solar and / or visible spectral region
  • Coatings is very disadvantageous.
  • the subsequent thermal treatment of the layer in the short-time annealing step already takes place by means of electromagnetic radiation and thus independently of the deposition of additional layers due to the temperature increase
  • the low-emitting layer comprises or consists of other materials
  • the substrate is made of glass as the main substrate used by low-e layer systems. Its high absorption in the IR range loses due to the process control as Short term tempering under limitation and possibly with monitoring of the layer and thus substrate temperature in importance, since such a temporal heating of the
  • the method comprises a plurality of layers for forming a low-emittance layer system.
  • the layers can be thermally treated by means of electromagnetic radiation in the short-time heat treatment step of the low-emittance layer and / or in a further short-time heat treatment step.
  • this includes
  • low-emissivity coating system at least two
  • both the coating and the Kurzzeittemper Colour the deposited low-e layer by means of electromagnetic radiation in an inline vacuum coating system means of electromagnetic radiation in an inline vacuum coating system.
  • an "in-line process control" means a physical transport of the substrate from one coating station to another
  • Processing station to apply and treat layers, the substrate during the
  • Coating process and / or laser irradiation is also transported.
  • the substrate is preferably moved with such a transport speed that it does not heat up too much.
  • Substrate tape either an endless substrate and a roll-to-roll coating or a quasi-continuous
  • Fig.l is a schematic representation of the system for the combined coating and subsequent thermal treatment by means of a laser system
  • Fig. 3 is a Table 1 with a quantitative analysis of the results.
  • 1 shows the schematic structure of the system 1 for the combined coating and subsequent thermal treatment by means of a laser system 50. It consists of a longitudinally extending vacuum system 1 with a
  • Substrate transport system 11 by means of which the large-area substrates 10 in a transport direction under different processing stations, u.a. Coating modules 30, are moved through.
  • a low-e layer system 20 is applied to the substrate 10, which has at least one low-e layer. There are also several low-e layers conceivable.
  • Layer system 20 provided substrate 10 in a position for treatment with a laser system 50.
  • Laser system 50 consists of a line laser, so that in a simple way a linear
  • Intensity distribution is achieved perpendicular to the transport direction of the substrate.
  • the length of the linear intensity distribution of the electromagnetic radiation of the laser corresponds to the width of the layer deposited on the substrate in the direction of the longitudinal extent of the linear intensity distribution of the electromagnetic radiation.
  • the system 1 has a control 41 of the
  • the controlled variable corresponds to an energy input, which is necessary to a specifiable
  • the final temperature of the deposited layer system 20 must be achieved within certain limits, by adjusting and thus improving their
  • Reflection and resistance occurs, rather than a destruction of the structure, such as embrittlement, caused due to exceeding the maximum temperature of the deposited layer.
  • the adjustment of the energy input of the irradiation both taking into account the parameters of the laser radiation, such as their wavelength, energy density and
  • Impact surface a1 s also the temperature of the deposited layer or. made of the temperature of the deposited layer and the substrate.
  • a1 s also the temperature of the deposited layer or. made of the temperature of the deposited layer and the substrate.
  • a1 s also the temperature of the deposited layer or. made of the temperature of the deposited layer and the substrate.
  • the determined value of the energy input is determined by the
  • Control device 41 is transmitted to the laser system 50 and serves as a control variable for determining the parameters of
  • Duration type of electromagnetic radiation, be adjusted so that the layer system to be treated receives the determined energy input and thus the low-e layer reaches the predetermined final temperature.
  • a glass substrate with dimensions of 10x10 cm 2 is introduced into a vacuum chamber and tempered
  • Silver layer between two dielectric layers has.
  • the sample represents a commercially available layer system.
  • Line laser system at a wavelength of 980 nm, with a focus of 100 ym and a power density of 375 W / mm 2 irradiated. Its scan speed is set at 9.5 m / min. This results in an exposure time of 570 ys and an energy input of 0.21 J / mm 2 of the laser irradiation is achieved.
  • the surface resistance of the low-e layer stack before and after the irradiation is determined with an eddy current measuring device, since the silver layer can not be directly contacted by the dielectric cover layers.
  • the irradiation of the low-e layer stack results in a reduction of the surface resistance of the low-e layer from 7.5 ohms to 5.6 ohms.
  • the reduction in sheet resistance indicates densification and homogenization of the Silver layer, which is the characteristic feature of the expected improvement of the emissivity.
  • the letter “T” corresponds to the transmission spectrum of the sample before (ac) and after the irradiation (laser) and the letter “R” before the reflection side (Rf) and the glass side (Rg) before (ac) and after the irradiation (laser).
  • the comparison of the given spectra results in a clear increase of the transmission in the visual spectral range and a favorable higher reflection in the infrared
  • the index "ac" in accordance with FIG. 2 designates the determined values of the coating or the coated article before
  • the numbers used are those calculated by the CIE LAB L *, a *, b * coordinate technique.
  • the value "Y" corresponds to the green (and light reference) value in the XYZ color space.
  • Safety glass were tempered or not.
  • a major advantage in addition to the pure cost savings here is the maintenance of the assemblability of the laser-tempered disc and thus the much easier processability.
  • the inventive method is thus more energy efficient and associated with less breakage losses compared to conventional convection ovens.
  • Coating system is congruent to the values observed for conventional heat treatments for substrate thermal stressing, which compensates for visual differences and the parallel mounting of both slices

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Optics & Photonics (AREA)
  • Acoustics & Sound (AREA)
  • Electromagnetism (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Thermal Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un procédé de production d'un système de couches à faible émissivité sur au moins une face du substrat, comprenant les étapes qui consistent : à fournir le substrat, à former au moins une couche de faible émissivité sur au moins une face du substrat, par dépôt et recuit rapide d'au moins une couche déposée. L'invention a pour but de diminuer la résistance de surface et, de ce fait, l'émissivité du revêtement à faible émissivité, ainsi que l'utilisation de matériau de revêtement à réflexion IR coûteux. Pour atteindre ce but, selon l'invention, le rayonnement électromagnétique pour le recuit rapide d'une couche à faible émissivité est réglé de telle façon que la couche recuite présente des propriétés de couche, comparables à une couche d'un verre de sécurité à faible émissivité, soumise à un traitement thermique classique.
EP12756405.2A 2011-08-19 2012-08-20 Procédé de production d'un système de couches à faible émissivité Ceased EP2744764A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011081281 2011-08-19
DE102011089884.0A DE102011089884B4 (de) 2011-08-19 2011-12-23 Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems
PCT/EP2012/066174 WO2013026819A1 (fr) 2011-08-19 2012-08-20 Procédé de production d'un système de couches à faible émissivité

Publications (1)

Publication Number Publication Date
EP2744764A1 true EP2744764A1 (fr) 2014-06-25

Family

ID=47625162

Family Applications (2)

Application Number Title Priority Date Filing Date
EP12756404.5A Withdrawn EP2744763A1 (fr) 2011-08-19 2012-08-20 Procédé et dispositif de production d'un système de couches à faible émissivité
EP12756405.2A Ceased EP2744764A1 (fr) 2011-08-19 2012-08-20 Procédé de production d'un système de couches à faible émissivité

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP12756404.5A Withdrawn EP2744763A1 (fr) 2011-08-19 2012-08-20 Procédé et dispositif de production d'un système de couches à faible émissivité

Country Status (7)

Country Link
US (2) US20140197350A1 (fr)
EP (2) EP2744763A1 (fr)
CN (2) CN103987674A (fr)
DE (2) DE102011089884B4 (fr)
EA (1) EA201400222A1 (fr)
RU (1) RU2577562C2 (fr)
WO (2) WO2013026819A1 (fr)

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FR3022904B1 (fr) 2014-06-27 2016-07-01 Saint Gobain Procede d'activation de couche sur substrat verrier
DE102014116244A1 (de) * 2014-07-07 2016-01-07 Von Ardenne Gmbh Beschichtungsanordnung
FR3025936B1 (fr) * 2014-09-11 2016-12-02 Saint Gobain Procede de recuit par lampes flash
US20170226631A1 (en) * 2014-10-22 2017-08-10 Agc Glass Europe Manufacturing of substrates coated with a conductive layer
DE102015105203A1 (de) * 2015-04-07 2016-10-13 Von Ardenne Gmbh Verfahren zum Bearbeiten einer Schichtenstruktur und Verfahren zum Herstellen einer elektrisch hochleitfähigen Kupferschicht auf einem lichtdurchlässigen Substrat
US10011524B2 (en) 2015-06-19 2018-07-03 Guardian Glass, LLC Coated article with sequentially activated low-E coating, and/or method of making the same
US11220455B2 (en) 2017-08-04 2022-01-11 Vitro Flat Glass Llc Flash annealing of silver coatings
AU2018310989B2 (en) * 2017-08-04 2023-06-22 Vitro Flat Glass Llc Flash annealing of transparent conductive oxide and semiconductor coatings
FR3070387A1 (fr) * 2017-08-30 2019-03-01 Saint-Gobain Glass France Dispositif de traitement thermique ameliore
US10822270B2 (en) * 2018-08-01 2020-11-03 Guardian Glass, LLC Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
DE102019134818A1 (de) * 2019-02-16 2020-08-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren zum Erhöhen der Festigkeit eines Glassubstrates
FR3105212A1 (fr) 2019-12-20 2021-06-25 Saint-Gobain Glass France Procédé de traitement thermique rapide de couches minces sur substrats en verre trempé
FR3111842A1 (fr) 2020-06-26 2021-12-31 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede d’elaboration et de controle de la qualite d’un empilement oxyde/metal/oxyde

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DE102012200665A1 (de) 2013-02-21
EA201400222A1 (ru) 2014-08-29
US20140199496A1 (en) 2014-07-17
RU2577562C2 (ru) 2016-03-20
US20140197350A1 (en) 2014-07-17
WO2013026817A1 (fr) 2013-02-28
RU2014110367A (ru) 2015-09-27
US9453334B2 (en) 2016-09-27
CN103987674A (zh) 2014-08-13
DE102011089884B4 (de) 2016-03-10
EP2744763A1 (fr) 2014-06-25
WO2013026819A1 (fr) 2013-02-28
DE102011089884A1 (de) 2013-02-21
DE102012200665B4 (de) 2016-06-02

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