FR3025936B1 - Procede de recuit par lampes flash - Google Patents
Procede de recuit par lampes flashInfo
- Publication number
- FR3025936B1 FR3025936B1 FR1458520A FR1458520A FR3025936B1 FR 3025936 B1 FR3025936 B1 FR 3025936B1 FR 1458520 A FR1458520 A FR 1458520A FR 1458520 A FR1458520 A FR 1458520A FR 3025936 B1 FR3025936 B1 FR 3025936B1
- Authority
- FR
- France
- Prior art keywords
- flash lamps
- reclaiming
- reclaiming flash
- lamps
- flash
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02565—Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/256—Ag
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Priority Applications (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1458520A FR3025936B1 (fr) | 2014-09-11 | 2014-09-11 | Procede de recuit par lampes flash |
TW104126704A TWI663637B (zh) | 2014-09-11 | 2015-08-17 | 藉由閃光燈退火的方法 |
MX2017002996A MX2017002996A (es) | 2014-09-11 | 2015-08-20 | Método de fijacion termica utilizando lamparas de destello. |
JP2017513808A JP2017536689A (ja) | 2014-09-11 | 2015-08-20 | フラッシュランプを使用するアニーリング方法 |
CN201580048670.3A CN106605290A (zh) | 2014-09-11 | 2015-08-20 | 使用闪光灯的退火方法 |
US15/507,883 US20170291848A1 (en) | 2014-09-11 | 2015-08-20 | Annealing method using flash lamps |
EP15767209.8A EP3192095A1 (fr) | 2014-09-11 | 2015-08-20 | Procédé de recuit par lampes flash |
CA2957845A CA2957845A1 (fr) | 2014-09-11 | 2015-08-20 | Procede de recuit par lampes flash |
EA201790593A EA201790593A1 (ru) | 2014-09-11 | 2015-08-20 | Способ отжига при помощи ламп-вспышек |
BR112017002958A BR112017002958A2 (pt) | 2014-09-11 | 2015-08-20 | processo de recozimento por lâmpadas flash |
KR1020177006735A KR20170051447A (ko) | 2014-09-11 | 2015-08-20 | 플래시 램프를 이용한 어닐링 방법 |
AU2015314079A AU2015314079A1 (en) | 2014-09-11 | 2015-08-20 | Annealing method using flash lamps |
PCT/FR2015/052238 WO2016038269A1 (fr) | 2014-09-11 | 2015-08-20 | Procédé de recuit par lampes flash |
CONC2017/0002325A CO2017002325A2 (es) | 2014-09-11 | 2017-03-09 | Procedimiento de recocción por lámparas flash |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1458520A FR3025936B1 (fr) | 2014-09-11 | 2014-09-11 | Procede de recuit par lampes flash |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3025936A1 FR3025936A1 (fr) | 2016-03-18 |
FR3025936B1 true FR3025936B1 (fr) | 2016-12-02 |
Family
ID=51866184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1458520A Expired - Fee Related FR3025936B1 (fr) | 2014-09-11 | 2014-09-11 | Procede de recuit par lampes flash |
Country Status (14)
Country | Link |
---|---|
US (1) | US20170291848A1 (fr) |
EP (1) | EP3192095A1 (fr) |
JP (1) | JP2017536689A (fr) |
KR (1) | KR20170051447A (fr) |
CN (1) | CN106605290A (fr) |
AU (1) | AU2015314079A1 (fr) |
BR (1) | BR112017002958A2 (fr) |
CA (1) | CA2957845A1 (fr) |
CO (1) | CO2017002325A2 (fr) |
EA (1) | EA201790593A1 (fr) |
FR (1) | FR3025936B1 (fr) |
MX (1) | MX2017002996A (fr) |
TW (1) | TWI663637B (fr) |
WO (1) | WO2016038269A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11220455B2 (en) | 2017-08-04 | 2022-01-11 | Vitro Flat Glass Llc | Flash annealing of silver coatings |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3042492B1 (fr) * | 2015-10-16 | 2018-01-19 | Saint-Gobain Glass France | Procede de recuit rapide d'un empilement de couches minces contenant une surcouche a base d'indium |
KR102118365B1 (ko) | 2017-04-21 | 2020-06-04 | 주식회사 엘지화학 | 유기전자소자 봉지용 조성물 |
US11384425B2 (en) * | 2017-07-13 | 2022-07-12 | Purdue Research Foundation | Method of enhancing electrical conduction in gallium-doped zinc oxide films and films made therefrom |
US20190041550A1 (en) * | 2017-08-04 | 2019-02-07 | Vitro Flat Glass Llc | Flash Annealing of Transparent Conductive Oxide and Semiconductor Coatings |
DE102019134818A1 (de) * | 2019-02-16 | 2020-08-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren zum Erhöhen der Festigkeit eines Glassubstrates |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3204986B2 (ja) * | 1996-05-28 | 2001-09-04 | ザ トラスティース オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク | 基板上の半導体膜領域の結晶化処理及びこの方法により製造されたデバイス |
US6555449B1 (en) * | 1996-05-28 | 2003-04-29 | Trustees Of Columbia University In The City Of New York | Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication |
TWI221102B (en) * | 2002-08-30 | 2004-09-21 | Sumitomo Heavy Industries | Laser material processing method and processing device |
KR100906964B1 (ko) * | 2002-09-25 | 2009-07-08 | 삼성전자주식회사 | 유기 전계발광 구동 소자와 이를 갖는 유기 전계발광 표시패널 |
JP2004303792A (ja) * | 2003-03-28 | 2004-10-28 | Seiko Epson Corp | フラッシュランプの照射装置 |
CA2588343C (fr) * | 2004-11-24 | 2011-11-08 | Nanotechnologies, Inc. | Utilisations electriques, de revetement metallique et catalytiques de compositions de nanomateriaux metalliques |
FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
KR101563237B1 (ko) * | 2007-06-01 | 2015-10-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조장치 및 발광장치 제작방법 |
JP5209237B2 (ja) * | 2007-06-19 | 2013-06-12 | 大日本スクリーン製造株式会社 | 熱処理装置 |
US8569155B2 (en) * | 2008-02-29 | 2013-10-29 | The Trustees Of Columbia University In The City Of New York | Flash lamp annealing crystallization for large area thin films |
JP5640890B2 (ja) * | 2011-05-23 | 2014-12-17 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
DE102011089884B4 (de) * | 2011-08-19 | 2016-03-10 | Von Ardenne Gmbh | Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems |
FR2989388B1 (fr) | 2012-04-17 | 2019-10-18 | Saint-Gobain Glass France | Procede d'obtention d'un substrat muni d'un revetement |
JP2014027252A (ja) * | 2012-06-19 | 2014-02-06 | Dainippon Screen Mfg Co Ltd | 熱処理装置および熱処理方法 |
JP2014011256A (ja) * | 2012-06-28 | 2014-01-20 | Dainippon Screen Mfg Co Ltd | 熱処理方法および熱処理装置 |
-
2014
- 2014-09-11 FR FR1458520A patent/FR3025936B1/fr not_active Expired - Fee Related
-
2015
- 2015-08-17 TW TW104126704A patent/TWI663637B/zh not_active IP Right Cessation
- 2015-08-20 JP JP2017513808A patent/JP2017536689A/ja not_active Ceased
- 2015-08-20 KR KR1020177006735A patent/KR20170051447A/ko unknown
- 2015-08-20 AU AU2015314079A patent/AU2015314079A1/en not_active Abandoned
- 2015-08-20 CN CN201580048670.3A patent/CN106605290A/zh active Pending
- 2015-08-20 BR BR112017002958A patent/BR112017002958A2/pt not_active Application Discontinuation
- 2015-08-20 US US15/507,883 patent/US20170291848A1/en not_active Abandoned
- 2015-08-20 MX MX2017002996A patent/MX2017002996A/es unknown
- 2015-08-20 EP EP15767209.8A patent/EP3192095A1/fr not_active Withdrawn
- 2015-08-20 WO PCT/FR2015/052238 patent/WO2016038269A1/fr active Application Filing
- 2015-08-20 EA EA201790593A patent/EA201790593A1/ru unknown
- 2015-08-20 CA CA2957845A patent/CA2957845A1/fr not_active Abandoned
-
2017
- 2017-03-09 CO CONC2017/0002325A patent/CO2017002325A2/es unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11220455B2 (en) | 2017-08-04 | 2022-01-11 | Vitro Flat Glass Llc | Flash annealing of silver coatings |
Also Published As
Publication number | Publication date |
---|---|
TW201616555A (zh) | 2016-05-01 |
AU2015314079A1 (en) | 2017-04-13 |
CN106605290A (zh) | 2017-04-26 |
KR20170051447A (ko) | 2017-05-11 |
US20170291848A1 (en) | 2017-10-12 |
CA2957845A1 (fr) | 2016-03-17 |
WO2016038269A1 (fr) | 2016-03-17 |
TWI663637B (zh) | 2019-06-21 |
CO2017002325A2 (es) | 2017-06-20 |
EA201790593A1 (ru) | 2017-06-30 |
FR3025936A1 (fr) | 2016-03-18 |
EP3192095A1 (fr) | 2017-07-19 |
BR112017002958A2 (pt) | 2017-12-05 |
MX2017002996A (es) | 2017-06-19 |
JP2017536689A (ja) | 2017-12-07 |
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