EP2233621A1 - Textile tricoté tout comme procédé de fabrication d'un textile tricoté - Google Patents

Textile tricoté tout comme procédé de fabrication d'un textile tricoté Download PDF

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Publication number
EP2233621A1
EP2233621A1 EP10003254A EP10003254A EP2233621A1 EP 2233621 A1 EP2233621 A1 EP 2233621A1 EP 10003254 A EP10003254 A EP 10003254A EP 10003254 A EP10003254 A EP 10003254A EP 2233621 A1 EP2233621 A1 EP 2233621A1
Authority
EP
European Patent Office
Prior art keywords
knitted
knitted fabric
spacer structure
shape
fabric according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10003254A
Other languages
German (de)
English (en)
Inventor
Thomas Braumann
Marko Stephan
Franz Stollberger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobleder Strickmode & Co GmbH
Original Assignee
Kobleder Strickmode & Co GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobleder Strickmode & Co GmbH filed Critical Kobleder Strickmode & Co GmbH
Publication of EP2233621A1 publication Critical patent/EP2233621A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • D—TEXTILES; PAPER
    • D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04B—KNITTING
    • D04B1/00—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes
    • D04B1/22—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes specially adapted for knitting goods of particular configuration
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D31/00—Materials specially adapted for outerwear
    • A41D31/04—Materials specially adapted for outerwear characterised by special function or use
    • A41D31/28—Shock absorbing
    • A41D31/285—Shock absorbing using layered materials
    • D—TEXTILES; PAPER
    • D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04B—KNITTING
    • D04B1/00—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes
    • D04B1/22—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes specially adapted for knitting goods of particular configuration
    • D04B1/24—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes specially adapted for knitting goods of particular configuration wearing apparel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes
    • H01L33/0093—Wafer bonding; Removal of the growth substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/382—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/387—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52—Encapsulations
    • H01L33/56—Materials, e.g. epoxy or silicone resin
    • D—TEXTILES; PAPER
    • D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10B2403/00—Details of fabric structure established in the fabric forming process
    • D10B2403/02—Cross-sectional features
    • D10B2403/022—Lofty fabric with variably spaced front and back plies, e.g. spacer fabrics
    • D10B2403/0222—Lofty fabric with variably spaced front and back plies, e.g. spacer fabrics with at least one baggy or puckered ply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008—Processes
    • H01L2933/0016—Processes relating to electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50—Wavelength conversion elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/64—Heat extraction or cooling elements
    • H01L33/641—Heat extraction or cooling elements characterized by the materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/64—Heat extraction or cooling elements
    • H01L33/642—Heat extraction or cooling elements characterized by the shape

Definitions

  • the invention relates to a knitted fabric and a method for producing a knitted fabric.
  • stiffening or stiffening usually plastic parts in the form of foams, injection molded parts or extruded parts are used as a filler in the clothing sector. These fillers are placed in pockets, for example. They can also be sewn or applied, for example in the form of rubbers on a garment. The applications range from simple shirt collar stiffening to back protectors in various sportswear. Also elbow or shin guards have such stiffeners.
  • the object of the present invention is to provide a knit fabric which is stiffened or stiffened in a defined manner in an effective manner and, in the case of a garment, at the same time offering improved comfort, offers increased protection or increased absorption capacity against impact and impact.
  • a knitted fabric wherein the fabric has a formally knitted spacer structure (spacer knit fabric) in at least one area.
  • the technical realization of the spacer structure is preferably based on the dimensionally accurate 3D spacer knitting, whereby a spacer structure is created by combining multi-surface knitted fabrics and pile thread systems between these surfaces.
  • the advantage of such a construction lies among other things in the wearing comfort, the breathability and the moisture transport.
  • such a spacer fabric can be easily designed visually. Besides, it can be easily cleaned. Under appropriate knitting is understood that a predetermined three-dimensional shape is produced by knitting, so no post-processing for shaping the knitted fabric is necessary.
  • the knitted fabric may be a garment, a garment part, a seat, a seat part, a furniture part, lamps or generally a component.
  • the formally knitted spacer structure is part of a knitted surface and is seamlessly integrated into this or the remaining fabric.
  • disturbing seams are avoided, on the other accounts for additional operations for attaching the spacer knit to z.
  • a combination of elements, in particular garment parts, a Cutting and packaging can be omitted. Steps in the production of a garment are reduced.
  • a basic structure in particular a garment (part) is designed as a knitted fabric.
  • the spacer knit can be easily knitted into the basic structure, in particular the garment (part). This creates the possibility to produce a part, in particular a garment (part), as a complete article with integrated training or stiffening in one operation. It can be a complete article in one operation without waste and without additional confection required.
  • the shape knitted spacer structure has a predetermined or predetermined height, in particular in the range 0 - 5 cm.
  • the height can be used to adjust and adjust the protective function.
  • the fabric can be knitted flat. As a result, the entire knit can be produced in a predetermined shape or outline (unlike a knitted fabric wherever a tube is made).
  • the fabric in particular, when it is a garment (part) is made in its shape and shape in a desired body shape. This creates an optimal fit of the garment.
  • the compressive rigidity and / or height and / or contour of the dimensionally knitted spacing structure are determined by the thread material used and / or by knitting parameters is set.
  • the pressure stiffness can be suitably selected by selecting the thread material.
  • the spacer fabric if it is to be used for a shinguard, has a different compressive stiffness than when used in a shirt collar.
  • the fabric when used in sports articles, it may be advantageous if the formally knitted spacer structure has areas of different compressive stiffness.
  • a knitted bag for receiving a stiffener may be provided.
  • a filler can be inserted in a conventional manner to realize at this point a further protection.
  • the spacer structure can be combined in a particularly simple manner with such a filler when the spacer fabric is formed as a pocket.
  • predetermined kinks are incorporated in the fabric, in particular in the spacer structure.
  • predetermined kinks can be incorporated in knee protectors, so that the protector supports the movement of the knee joint and leads to no impairment.
  • a spacer structure can be used for clothes, parts of clothing or accessories.
  • the connection of the spacer structure with the rest of the fabric is preferably carried out not in succession, but in a single process. This guarantees maximum effectiveness in handling materials and greatly simplified production processes.
  • the spacer structure can only be used as a visual design agent. Additionally or alternatively, it can be used to increase comfort and protection, for example, as a seat pad cycling pants or as a collar. However, it is also possible to design spacer structures so that they exercise a safety function for joints, shoulders, arms, legs, hips or the like.
  • the spacer structures can thereby replace classic upholstery / protectors made of foam and at the same time bring other positive properties, such as durability, moisture transport, elasticity and missing seams.
  • the distance structures can be used in motor sports for protective clothing with protectors, complete lining for suits, vests or helmets.
  • football boots can be realized with integrated shin guards.
  • sports such as volleyball, polo or hockey knee protectors which are also considered in the context of the invention as a garment, can be realized.
  • Shirts, sweaters or polos can have a spacer structure in the collar and / or on the shoulder, so that when wearing a golf bag, a higher comfort arises.
  • the seat cushion can also be made as part of a garment with a spacer structure and subsequently incorporated into a cycling pants or integrated into an inner pants. Also underpants or inner pants for a conventional cycling pants with integrated spacing structure is conceivable.
  • dimensionally knitted spacer structures in final contoured surfaces which can have almost any desired definable contour and at the same time can have a definable height within the range of 0-5 cm and, moreover, are part of a knitted surface, which in turn is a definable Contour or a definable outline can have. Furthermore, it is possible to deform the entire knit construction by means of the programming from the surface to the third dimension, so that a Nachmodellieren or Nachdrapieren of bodies or volumes is possible.
  • the predetermined height in this context means the thickness of the knitted or knitted part, in particular of the garment or garment part, which is adjustable. The height can be predefined independently of other parameters in yarn selection and construction.
  • the spacer structure is created as a third dimension above the surface and can itself be executed as an art relief in different heights.
  • the scope of the invention also includes a method for producing a knitted fabric in which a spacer structure is knit in a form-fitting manner, at least in one area. Subsequent shaping of the spacer structure is therefore not necessary.
  • the inventive method it is possible with the inventive method to produce a flat-knit garment in parts with a defined contour.
  • the two knitting situations are connected by pile threads together and kept at the same time by this at a distance.
  • the spacer-knitted part is part of a flat piece of knitwear.
  • the preparation of the flat knitted piece and the spacer-knitted component run simultaneously.
  • the defined contour of the spacer-knitted component is created by programming and special handling of the thread materials.
  • the definition of the variable thicknesses (heights) is achieved by the programming and the special handling of the thread materials.
  • the defined contour of the knitted part (knitwear, garment) can be achieved by programming.
  • the formally knitted spacing structure is produced by knitting technical or programmiertechnische deformation of a knitted surface in a third dimension.
  • the area i. H. the planar knitted piece
  • have a predetermined contour in particular be knitted in a predetermined contour or in a predetermined outline.
  • FIG. 1 shows the upper half of a knitted fabric 10 formed as a polo shirt, which has a formed as a form knitted spacer structure 11 collar.
  • the spacer structure 11 is seamlessly connected to the remaining garment 12.
  • the remaining garment 12 is also knitted. Due to the spacer structure 11, the collar has a defined shape and is stabilized. Ironing the collar is not required here.
  • a knitted fabric 20 in the form of a jacket is shown, which has formally knitted spacer structures 21, 22 in the elbows and forearm regions and a shape-wise knitted spacer structure 23 as a back protector in the back region.
  • spacer structure 23 can be seen that defined kinks 24 are provided so as not to affect the mobility of the user. It can also be seen from the knitted fabric 20 that this has already been produced in the desired fit.
  • the areas 25 away from the spacer structures 21 to 23 are thinner, but also flat knit.
  • Fig. 3a shows a knitted fabric 30. It is a knitting technically deformed component in the way that a body or volume can be replicated.
  • a knitted (curved) surface 31 has a defined contour or a defined outline. The surface 31 is not cut to size, but made by (flat) knitting in this shape.
  • the spacer structure 32 has a defined contour and defined different heights. The spacer structure 32 is knit-formed as part of the surface 31. It can be seen that the entire fabric 30 has a three-dimensional shape made by knitting.
  • Fig. 3b shows the spacer structure 32 in sections. It comprises two knitting layers 33, 34, which are connected to pile threads 35 and are held by them at a distance.
EP10003254A 2009-03-27 2010-03-26 Textile tricoté tout comme procédé de fabrication d'un textile tricoté Withdrawn EP2233621A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009015369A DE102009015369A1 (de) 2009-03-27 2009-03-27 Kleidungsstück oder Teil eines Kleidungsstücks

Publications (1)

Publication Number Publication Date
EP2233621A1 true EP2233621A1 (fr) 2010-09-29

Family

ID=42194796

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10003254A Withdrawn EP2233621A1 (fr) 2009-03-27 2010-03-26 Textile tricoté tout comme procédé de fabrication d'un textile tricoté

Country Status (2)

Country Link
EP (1) EP2233621A1 (fr)
DE (2) DE202009018411U1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2474653A1 (fr) * 2010-12-20 2012-07-11 Shima Seiki Mfg., Ltd Étoffe tricotée tridimensionnelle, son procédé de tricotage et support
EP3175199B1 (fr) 2014-07-28 2019-02-06 Hexonia GmbH Article vestimentaire textile équipé d'une protection balistique

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102864566B (zh) * 2012-09-29 2014-02-12 加宝利服装有限公司 织物制备方法、制备控制方法、制备控制装置和制备系统
DE102021005039A1 (de) 2021-10-07 2023-04-13 Strick Zella GmbH & Co. KG Auxetische textile Verbundsstruktur
DE102022000269A1 (de) 2022-01-25 2023-07-27 Lydia Schweitzer Tragesystem für Säuglinge zur Verhinderung von Erstickungsunfällen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0446583A1 (fr) * 1990-03-14 1991-09-18 H. Stoll GmbH & Co. Produit tricoté
EP0905298A2 (fr) * 1997-09-30 1999-03-31 H. Stoll GmbH & Co. Tricot comportant plusieurs structures tri-dimensionelles passants l'un dans l'autre pendant un procédé de tricotage continu
US6105401A (en) * 1996-06-04 2000-08-22 Commissariat A L'energie Atomique Knitted textile structure with double skin and adjustable binding threads and method of manufacture
WO2009025556A1 (fr) * 2007-08-22 2009-02-26 Innotex Beheer B.V. Article tricoté ayant au moins localement deux couches espacées, et procédé de fabrication d'un tel article tricoté

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202004007911U1 (de) * 2004-05-17 2004-07-15 F+E Gesellschaft für Bekleidungsinnovation mbH & Co. KG Patte für Bekleidungsstücke, insbesondere Büstenhalter, für an der Brust operierte Trägerinnen
US20070144221A1 (en) * 2005-02-23 2007-06-28 Sytz Ronald M 3-D fabric knitted stretch spacer material having molded domed patterns and method of making
DE102005030651A1 (de) * 2005-06-30 2007-01-11 Bst Safety Textiles Gmbh Verfahren zum Herstellen eines Abstandstextils
US7849715B2 (en) * 2006-02-13 2010-12-14 Hbi Branded Apparel Enterprises, Llc Variable power zone spacer fabric

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0446583A1 (fr) * 1990-03-14 1991-09-18 H. Stoll GmbH & Co. Produit tricoté
US6105401A (en) * 1996-06-04 2000-08-22 Commissariat A L'energie Atomique Knitted textile structure with double skin and adjustable binding threads and method of manufacture
EP0905298A2 (fr) * 1997-09-30 1999-03-31 H. Stoll GmbH & Co. Tricot comportant plusieurs structures tri-dimensionelles passants l'un dans l'autre pendant un procédé de tricotage continu
WO2009025556A1 (fr) * 2007-08-22 2009-02-26 Innotex Beheer B.V. Article tricoté ayant au moins localement deux couches espacées, et procédé de fabrication d'un tel article tricoté

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2474653A1 (fr) * 2010-12-20 2012-07-11 Shima Seiki Mfg., Ltd Étoffe tricotée tridimensionnelle, son procédé de tricotage et support
CN102560840A (zh) * 2010-12-20 2012-07-11 株式会社岛精机制作所 立体编织物和其编制方法及运动护身带
CN102560840B (zh) * 2010-12-20 2016-04-27 株式会社岛精机制作所 立体编织物和其编织方法及运动护身带
EP3175199B1 (fr) 2014-07-28 2019-02-06 Hexonia GmbH Article vestimentaire textile équipé d'une protection balistique
EP3388776B1 (fr) 2014-07-28 2020-03-04 Hexonia GmbH Article vestimentaire textile équipé d'une protection balistique

Also Published As

Publication number Publication date
DE102009015369A1 (de) 2010-09-30
DE202009018411U1 (de) 2011-09-07

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