EP2188224A1 - Procédé d'application d'un revêtement transparent sur un substrat avec du plasma sous pression atmosphérique - Google Patents
Procédé d'application d'un revêtement transparent sur un substrat avec du plasma sous pression atmosphériqueInfo
- Publication number
- EP2188224A1 EP2188224A1 EP08803253A EP08803253A EP2188224A1 EP 2188224 A1 EP2188224 A1 EP 2188224A1 EP 08803253 A EP08803253 A EP 08803253A EP 08803253 A EP08803253 A EP 08803253A EP 2188224 A1 EP2188224 A1 EP 2188224A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- transparent
- substrate
- plasma treatment
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
Definitions
- the present invention relates to the field of transparent materials, especially the transparent materials whose reflection has been reduced.
- a method for the treatment of transparent coatings is proposed, characterized in that it comprises a plasma treatment.
- plasma treatment in the sense of the present invention means or comprises in particular all processes and / or processes in which ionized molecules, in particular radicals of a gas which have been generated by an energy source such as radio frequency or microwaves, act on the substrate. This is usually associated with a temperature increase. Surprisingly, it has been found that for coatings and / or substrates by plasma treatment in many applications, a substantial improvement in the surface quality and other properties can be achieved without adversely affecting the other properties of the coating or deteriorate only insignificantly.
- the energy input to the coating is limited compared to the methods of the prior art to a level harmless for the substrate.
- plasma treatment within the meaning of the present invention, in particular also a corona treatment falls, even if this is often handled differently in linguistic usage.
- a plasma treatment within the meaning of the present invention thus also explicitly includes a corona treatment; this represents in particular a preferred embodiment of the invention.
- the plasma treatment is carried out as atmospheric pressure plasma. This has proved to be very advantageous in many applications of the present invention.
- atmospheric pressure plasma in the sense of the present invention means or comprises in particular all processes and / or processes in which a plasma is oxidized under atmospheric pressure. spherical environmental conditions is applied to the substrate.
- the treatment by the plasma treatment comprises curing and / or crosslinking.
- curing is understood in particular to mean that the resistance of the coating is increased by plasma-induced reactions (including, in particular, oxidations and / or condensation reactions).
- crosslinking is meant, in particular, that condensation reactions are induced by the plasma treatment on the coating (and / or any precursor materials present).
- the plasma treatment is preferably carried out at a process gas pressure of ⁇ 2 bar to ⁇ 8 bar. This has proven advantageous in many applications of the present invention.
- the process gas pressure is preferably ⁇ 3 bar to ⁇ 6 bar, preferably ⁇ 3.5 bar to ⁇ 5 bar.
- the plasma treatment is preferably carried out such that the energy input to the coating is ⁇ 50 W / cm 2 to ⁇ 250 W / cm 2 .
- the plasma treatment is carried out so that the energy input to the coating is ⁇ IOO W / cm 2 to ⁇ 200 W / cm 2 .
- the plasma treatment is carried out while rotating the nozzle.
- a sol-gel process is performed prior to the plasma treatment.
- sol-gel process or sol-gel process in the sense of the present invention means or comprises in particular all processes and / or processes in which metal prepurcursor materials, in particular metal halides and / or metal alkoxides in solution, are subjected to hydrolysis and subsequent condensation become.
- a preferred embodiment of the invention is characterized in that at least one porosity-causing component is present during at least part of the sol-gel process, which component is removed and / or destroyed after completion of the sol-gel process.
- the porosity-causing component is at least partially removed and / or destroyed by means of the plasma treatment.
- a preferred embodiment of the invention is characterized in that the at least one porosity-causing component is a polymer, the average molar mass of the polymer preferably being ⁇ 10000 Da to ⁇ 10,000 Da, more preferably ⁇ 10,000 Da to ⁇ 50,000 There is.
- a preferred embodiment of the invention is characterized in that the polymer is an organic polymer, preferably selected from the group comprising polyethylene glycol, polypropylene glycol, copolymers of polyethylene glycol and polypropylene glycol, polyvinylpyrrolidone, polyether, alkyl, cycloalkyl and / or aryl-substituted polyethers, polyesters alkyl-, cycloalkyl- and / or aryl-substituted polyesters, in particular polyhydroxybutyric acid or mixtures thereof.
- General Groups / Molecule Definition Within the specification and claims, general groups or molecules such as alkyl, alkoxy, aryl, etc. are claimed and described. Unless otherwise described, the following groups within the generally described groups / molecules are preferably used in the context of the present invention:
- Alkyl linear and branched C 1 -C 8 -alkyls
- long-chain alkyls linear and branched C5-C20 alkyls
- Alkenyl C2-C6-alkenyl
- Cycloalkyl C3-C8-cycloalkyl
- Alkoxide / alkoxy C 1 -C 6 alkoxy, linear and branched
- long-chain alkoxide / alkoxy linear and branched C5-C20 alkoxy
- Aryl selected from aromatics with a molecular weight below 300 Da.
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , Aryl, halogen and n from 1 to 250
- Substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 )) n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from: hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 1 to 250
- Ether The compound Ri-OR 2 , wherein each Ri and R 2 are independently selected from the group consisting of hydrogen, halogen, alkyl, cycloalkyl, aryl, long chain alkyl Unless otherwise stated, the following groups / molecules are more preferred groups / molecules within the general group / molecule definition:
- Alkyl linear and branched C 1 -C 6 -alkyl
- Alkenyl C3-C6 alkenyl
- Cycloalkyl C6-C8-cycloalkyl
- long-chain alkoxy linear and branched C5-C10 alkoxy, preferably linear C6-C8 alkoxy
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , aryl, halogen and n is from 10 to 250.
- Substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 )) n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 10 to 250.
- the present invention also relates to a transparent coating treated according to the method of the invention.
- transparent in the sense of the present invention means or in particular includes a permeability of ⁇ 90% in the respectively used wavelength range, in particular in the visible wavelength range.
- the coating is substantially homogeneous to the human eye and for many applications a single coating is sufficient (unlike the multilayer systems listed above).
- the thickness of the coating produced (or in the case of "multi-layer coatings" of the individual sublayers) is - as will be described below - in many applications in the range of ⁇ 50- ⁇ 500 nanometers. It is therefore largely insensitive to thermal and mechanical stress (in particular bending stress) and affects component dimensions and tolerances only insignificantly.
- the coating is preferably based on metal oxides, preferably SiO 2 / or TiO 2 .
- the term "based on metal oxide” in the sense of the present invention means or comprises in particular that the coating contains this metal oxide (after carrying out the process according to the invention) as the main component. Preference is given to ⁇ 70%, more preferably ⁇ 80% and most preferably ⁇ 90% to ⁇ 1010 of the metal oxide coating.
- the coating comprises a plurality of layers and / or the coating is a multi-layer coating.
- multi-layer coating is meant, in particular, that the coating is applied in layers to a substrate, wherein, if appropriate, plasma application takes place after application of a layer.
- plasma application takes place after application of a layer.
- the plasma treatment is carried out after each application of a layer.
- the coating is preferably a so-called "3-layer coating” or "multi-layer coating".
- a preferred embodiment of the invention is characterized in that the coating is essentially a porous shaped article, in particular a homogeneous porous shaped article or forms such a body.
- the term "essentially” designates in particular ⁇ 90 vol%, preferably ⁇ 95 vol% of the coating.
- a preferred embodiment of the invention is characterized in that the coating has transmission-increasing properties, in particular for light in the visible wavelength range.
- the coating is preferably capable of increasing the transmission of the substrate by ⁇ 2%, preferably by ⁇ 4%, in the respectively used wavelength range, in particular in the visible wavelength range.
- the invention also relates to a transparent coating for a transparent substrate produced by the method according to the invention.
- a preferred embodiment of the invention is characterized in that the substrate is selected from the group comprising glass, transparent plastics, preferably selected from the group comprising polycarbonate, polyacrylic, PET, PEN, COC, PES, PSU, metals, transparent thermosetting materials , in particular epoxides and acrylates and mixtures thereof, and mixtures thereof.
- the invention also relates to an optical component comprising a transparent substrate and a coating applied and / or arranged on the substrate according to the present invention
- the present invention also relates to a method for producing an optical component according to the invention, characterized in that the coating is applied to the substrate by dipping and / or spin-coating and subsequently subjected to a plasma treatment.
- the present invention also relates to the use of a coating according to the invention and / or an optical component according to the invention for
- FIG. 1 shows a polycarbonate substrate coated in half according to Example 1;
- FIG. 2 shows the illustration of a scratch test for measuring the scratch resistance
- Fig. 3 three slides (Comparative Examples 1 and 2 and Inventive Example 2) after performing the scratch test
- FIG. 1 relates to an example according to the invention which, purely illustratively, underlines the advantages of the method according to the invention and of the coating according to the invention on the basis of a 3-layer coating by way of example.
- a 3-layer anti-reflection coating was applied in half on a polycarbonate substrate of about 3 mm thickness.
- the substrate was cleaned (IPA ultrasonically, followed by rinsing with deionized water) and even pretreated with atmospheric pressure plasma to improve the wetting of the coating solution.
- a device from the company Plasmatreat was used with a high-frequency generator FG 3001 and a rotary nozzle RD 1004, which was equipped with a nozzle head type AGR123.
- the sample distance to the nozzle was 8mm. It was set a travel speed of 2 cm / sec.
- a silicon dioxide / titanium dioxide mixed layer (layer 1) was subsequently applied by dip coating, followed by a titanium dioxide layer (layer 2), and finally a silicon dioxide layer (layer 3).
- the coating material used was the silica sol H2000 sold by the company FEW Chemicals and the titanium oxide sol H 9005.
- layer 1 a 1: 1 (vol.) Mixture of both sols was used.
- the application was carried out by dip coating. The mixture was then dried for 20 min at 100 0 C and carried out as described above plasma treatment.
- Fig. 1 shows the polycarbonate substrate with the coating (right half). Clearly the anti-reflective coating can be seen.
- the third slide (Example 2) was first at 100 0 C for 20 min. dried and then subjected to a plasma treatment as described above.
- Fig. 2 shows a photograph while performing this test. The results of the test are shown in Table 1 and in FIG.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Dispersion Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Ceramic Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
La présente invention concerne un procédé permettant d'améliorer les propriétés de revêtements appliqués sur des matériaux transparents, par traitement au plasma, de préférence au moyen d'un plasma sous pression atmosphérique.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007043650A DE102007043650A1 (de) | 2007-09-13 | 2007-09-13 | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
PCT/EP2008/061186 WO2009037073A1 (fr) | 2007-09-13 | 2008-08-27 | Procédé d'application d'un revêtement transparent sur un substrat avec du plasma sous pression atmosphérique |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2188224A1 true EP2188224A1 (fr) | 2010-05-26 |
Family
ID=39970871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08803253A Withdrawn EP2188224A1 (fr) | 2007-09-13 | 2008-08-27 | Procédé d'application d'un revêtement transparent sur un substrat avec du plasma sous pression atmosphérique |
Country Status (6)
Country | Link |
---|---|
US (1) | US8632859B2 (fr) |
EP (1) | EP2188224A1 (fr) |
JP (1) | JP5264914B2 (fr) |
CN (1) | CN101815686A (fr) |
DE (1) | DE102007043650A1 (fr) |
WO (1) | WO2009037073A1 (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007043653A1 (de) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Transparente poröse SiO2-Beschichtung für ein transparentes Substratmaterial mit verbesserten optischen Eigenschaften |
JP5841676B2 (ja) | 2012-11-09 | 2016-01-13 | 三井化学株式会社 | アルデヒド化合物の製造方法 |
DE102012111710B4 (de) * | 2012-12-03 | 2014-12-11 | Ernst-Moritz-Arndt-Universität Greifswald | Verfa zur Plasmabehandlung einer kolloidalen Lösung und Anwendung des Verfahrens |
FR3028778B1 (fr) * | 2014-11-26 | 2019-04-12 | Glass Surface Technology | Procede de fabrication d'une couche de revetement de la face interne d'un recipient et recipient obtenu avec un tel procede |
CN112960910A (zh) * | 2021-01-29 | 2021-06-15 | 深圳市宏海福新材料有限公司 | 一种长效易洁防雾玻璃镜片及其制作方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1077787A (fr) | 1975-11-21 | 1980-05-20 | National Aeronautics And Space Administration | Revetements resistant a l'abrasion pour surfaces de plastique |
JP2698005B2 (ja) | 1991-09-25 | 1998-01-19 | 松下電工株式会社 | 表面の改質方法 |
US5392156A (en) | 1992-03-31 | 1995-02-21 | Canon Kabushiki Kaisha | Optical device |
US6368665B1 (en) | 1998-04-29 | 2002-04-09 | Microcoating Technologies, Inc. | Apparatus and process for controlled atmosphere chemical vapor deposition |
JP2002080970A (ja) | 2000-09-08 | 2002-03-22 | Sekisui Chem Co Ltd | 反射防止層を有する光学物品の製造方法 |
JP4066647B2 (ja) | 2001-11-27 | 2008-03-26 | コニカミノルタホールディングス株式会社 | 反射防止フィルムの製造方法 |
DE10209667B4 (de) | 2002-03-05 | 2005-06-02 | Sächsisches Textilforschungsinstitut e.V. | Verfahren zur Oberflächenmodifizierung textiler Filtermedien durch Sol-Gel-Behandlung |
JP4133353B2 (ja) | 2002-07-26 | 2008-08-13 | 株式会社神戸製鋼所 | シリコン酸化薄膜またはチタン酸化薄膜の製造方法 |
GB0217553D0 (en) | 2002-07-30 | 2002-09-11 | Sheel David W | Titania coatings by CVD at atmospheric pressure |
DE10239875B4 (de) | 2002-08-29 | 2008-11-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen |
TW200415726A (en) * | 2002-12-05 | 2004-08-16 | Adv Lcd Tech Dev Ct Co Ltd | Plasma processing apparatus and plasma processing method |
DE102004029911B4 (de) * | 2003-06-20 | 2006-11-23 | Innovent E.V. Technologieentwicklung | Verfahren und Anordnung zur Herstellung anorganischer Schichten |
US7462678B2 (en) | 2003-09-25 | 2008-12-09 | Jsr Corporation | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
JP2005120355A (ja) | 2003-09-25 | 2005-05-12 | Jsr Corp | 膜形成用組成物、膜の形成方法およびシリカ系膜 |
FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
KR20070057200A (ko) | 2004-09-27 | 2007-06-04 | 다우 글로벌 테크놀로지스 인크. | 플라즈마 강화 화학 기상 증착에 의한 다층 코팅 |
JP4641774B2 (ja) | 2004-09-28 | 2011-03-02 | 大日本印刷株式会社 | パターン形成体の製造方法 |
US20060128563A1 (en) | 2004-12-09 | 2006-06-15 | Flabeg Gmbh & Co., Kg | Method for manufacturing a non-fogging element and device for activating such an element |
DE102005007825B4 (de) | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
DE102005020510A1 (de) * | 2005-04-29 | 2006-11-09 | Basf Ag | Verbundelement, insbesondere Fensterscheibe |
WO2006129461A1 (fr) | 2005-06-01 | 2006-12-07 | Konica Minolta Holdings, Inc. | Procédé de formation de film mince et film conducteur transparent |
JP2007031550A (ja) | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | 大気圧プラズマ表面処理方法 |
JPWO2007023658A1 (ja) | 2005-08-25 | 2009-03-26 | パナソニック株式会社 | ガラス膜およびその製造方法、ならびに光学電子デバイス |
FI20060178L (fi) | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | Pinnoitusmenetelmä |
US8077801B2 (en) | 2007-01-10 | 2011-12-13 | Qualcomm Incorporated | Pilot structure with multiplexed unicast and SFN transmissions |
-
2007
- 2007-09-13 DE DE102007043650A patent/DE102007043650A1/de not_active Ceased
-
2008
- 2008-08-27 WO PCT/EP2008/061186 patent/WO2009037073A1/fr active Application Filing
- 2008-08-27 US US12/733,681 patent/US8632859B2/en not_active Expired - Fee Related
- 2008-08-27 JP JP2010524446A patent/JP5264914B2/ja not_active Expired - Fee Related
- 2008-08-27 EP EP08803253A patent/EP2188224A1/fr not_active Withdrawn
- 2008-08-27 CN CN200880106714A patent/CN101815686A/zh active Pending
Non-Patent Citations (1)
Title |
---|
See references of WO2009037073A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2009037073A1 (fr) | 2009-03-26 |
JP5264914B2 (ja) | 2013-08-14 |
JP2010538816A (ja) | 2010-12-16 |
CN101815686A (zh) | 2010-08-25 |
US20100213164A1 (en) | 2010-08-26 |
DE102007043650A1 (de) | 2009-04-02 |
US8632859B2 (en) | 2014-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3011370B1 (fr) | Procédé de fabrication d'une couche antireflet | |
EP1887059B1 (fr) | DISPERSION DE SiO2 CREUX, COMPOSITION D' ENDUCTION, ET SUBSTRAT AVEC FILM D' ENDUCTION ANTIREFLET | |
EP2274641B1 (fr) | Procédé pour la fabrication d'un système de couches d'interférence diminuant la réflexion | |
DE102017009250B4 (de) | Blendschutzfilm-beschichtetes Substrat, Blendschutzfilm-bildende Flüssigkeitszusammensetzung und Verfahren zur Herstellung eines Blendschutzfilm-beschichteten Substrats | |
DE3390170C2 (de) | Verfahren zur Erzeugung eines abriebfesten ]berzugs auf einem festen Substrat sowie dessen Verwendung | |
DE112013003864B4 (de) | Transparente Schichtstruktur und Verfahren zum Herstellen derselben | |
DE69816273T2 (de) | Anorganisches polymermaterial auf der basis von tantaloxyd , insbesondere mit erhöhtem brechungsindex , mechanisch verschleissfest , sein verfahren zur herstellung | |
EP3119848B1 (fr) | Hydrophobisation de surfaces à laquage dur | |
DE102018003998A1 (de) | Transparentes substrat mit antiverschmutzungsfilm und flüssigkristallanzeigevorrichtung des zellinternen kapazitätsberührungsfeldtyps | |
DE102019006762A1 (de) | Glaslaminat, Frontplatte für Anzeigen und Anzeigevorrichtung | |
DE3042770A1 (de) | Verfahren zur herstellung eines transparentenformteils mit verbesserten antireflex-eigenschaften | |
DE2949168A1 (de) | Pigmentfreie beschichtungsmasse | |
DE10336041A1 (de) | Optisches Schichtsystem mit Antireflexeigenschaften | |
DE112011101024T5 (de) | Beschichtungen mit hohem Brechungsindex und ihre Verwendung beim Schutz von Oberflächenreliefstrukturen | |
DE102019004779A1 (de) | Glaslaminat, frontplatte für eine anzeige, anzeigevorrichtung und herstellungsverfahren des glaslaminats | |
DE102011009129A1 (de) | Verfahren zur Herstellung eines Polarisationselements | |
EP2188224A1 (fr) | Procédé d'application d'un revêtement transparent sur un substrat avec du plasma sous pression atmosphérique | |
DE102010009999A1 (de) | Verfahren zur Mehrfachbeschichtung sowie mehrlagig beschichtetes Glas-Substrat | |
DE112018004781T5 (de) | Transparenter Gegenstand | |
DE102007059886B4 (de) | Verfahren zur Herstellung einer reflexionsmindernden Schicht und optisches Element mit einer reflexionsmindernden Schicht | |
WO2009037072A1 (fr) | Couche de silicium/dioxyde de titane présentant des caractéristiques de surface améliorées | |
EP2650703A2 (fr) | Procédé de fabrication d'un système de couche d'interférence réduisant la réflexion et système de couche d'interférence réduisant la réflexion | |
EP2067061A1 (fr) | REVÊTEMENT TRANSPARENT EN SiO2 POREUX POUR UN MATÉRIAU DE SUBSTRAT TRANSPARENT | |
DE69433294T2 (de) | Optischer kunststoff-formkörper und verfahren zu dessen herstellung | |
EP2188328B1 (fr) | REVÊTEMENT SiO2 POREUX TRANSPARENT POUR MATÉRIAU SUBSTRAT TRANSPARENT AYANT DES PROPRIÉTÉS OPTIQUES AMÉLIORÉES |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20100308 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA MK RS |
|
DAX | Request for extension of the european patent (deleted) | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SIEMENS AKTIENGESELLSCHAFT |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20150303 |